JPS63307733A - Developing device - Google Patents

Abstract

PURPOSE:To contrive the improvement of a yield in a developing process by a method wherein a developing device is provided with a nozzle for feeding a foglike liquid chemical into a chamber. CONSTITUTION:A wafer 1 is placed on a turntable 2 to rotate at low speed and a pretreatment liquid is atomized through a nozzle 4. The interior of a chamber 3 is filled with the liquid brought in a foggy state and the solution is adhered uniformly on the wafer 1. A valve 9 for exhaust is shut at the time of pretreatment. A developing solution is discharged at a position just over the wafer 1 and the valve 9 is opened at the same time as a developing treatment is started to exclude forcibly the foglike pretreatment liquid in the chamber 3. In the developing of a photo resist, a developing device; which has the chamber, wherein a developing treatment is executed, and has the nozzle for feeding the foglike liquid chemical into the chamber; is used like this. Thereby, the generation of defectives in a developing process is almost eliminated and a yield in the process is improved.

Description

[Detailed description of the invention] [Industrial application field] The present invention relates to a mechanism of a photoresist developing device.

(Prior Art) A conventional developing device has a structure as shown in Fig. 2.The developing process usually proceeds in the order described below.

l) Pretreatment: Pure water or developer cloth FJ solution is discharged onto the wafer 1 from the nozzle 10 and spread over the entire surface of the wafer 1.

2) Development Process After preprocessing for a certain period of time, a developer is discharged from the nozzle 7, and development processing is performed for a certain period of time.

3) Stop/cleaning process: After the development process for a certain period of time, pure water is discharged from the nozzle 8 to stop the development and wash the wafer 1. After a certain period of time, the discharge is stopped and the turntable 2 is moved at high speed. The wafer 1 is dried by rotating it.

[Problem that the invention seeks to solve]

However, the above-mentioned conventional technology has the following problems. In other words, since the convex surface of the sea urchin coated with photoresist is extremely water-repellent, there is a time lag in some parts during the pre-treatment and development treatment described above, resulting in uneven processing and areas that are not properly IA-imaged. was occurring. When a dilute developer solution is used as the pretreatment liquid, the incidence of defective products is somewhat reduced compared to when pure water is used, but in any case, defective products occur and the yield is reduced.

The present invention is intended to solve these problems, and its purpose is to improve the yield in the developing process.

[Means for solving problems]

The developing device of the present invention is characterized in that it has a chamber in which a developing process is performed, and a nozzle for supplying a chemical solution into the chamber.

〔Example〕

FIG. 1 is a sectional view of a developing device in an embodiment of the present invention. The nozzle 4 is a nozzle for spraying a pretreatment chemical solution, the developer is discharged from a nozzle 7, and the pure water for stopping development is discharged from a nozzle 8. A tube 5 for supplying a chemical solution and a tube 6 for supplying N and gas for spraying are connected to the nozzle 4. Although the nozzle 4 is fixed in the chamber 3 above the wafer 1, the spray angle is sufficiently small, so that the entire surface of the wafer 1 can be uniformly pretreated. The development process in this example is as follows.

1) Pretreatment: Place the wafer 1 on the turntable 2 and rotate it at low speed. The pretreatment liquid is sprayed from the nozzle 4. The atomized pretreatment liquid fills the chamber 3 and is uniformly deposited on the wafer 1. During the 1iif process, the exhaust valve 9 is closed.

2) Development processing: The developer is discharged at a position immediately above the wafer 1, as in the conventional case. At the same time as the development process begins, the exhaust valve 9 is opened to forcibly remove the atomized pretreatment liquid from the chamber 3.

3) Stopping/cleaning process: As in the conventional case, after a certain period of developing process, pure water is discharged to stop development and wash. After a certain period of time, the discharge is stopped and the tar/table 2 is rotated at high speed to dry the wafer 1. - It is preferable to use a diluted developer solution as the pre-treatment liquid because it has a lower incidence of development defects. When developing a wafer using the development process described above, the pre-treatment liquid becomes a fine mist and is deposited on the wafer. Even if the wafer is water repellent, the pretreatment is performed uniformly over the entire surface of the wafer, so there are almost no development defects (and the yield of the same process is improved).

〔Effect of the invention〕

As described above, according to the present invention, in developing a photoresist, a developing apparatus having a chamber in which the developing process is performed and a nozzle for supplying a chemical solution of ``gi'' in the chamber is used. This has the effect that the occurrence of defects in the process is almost eliminated and the yield is improved.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional view of a developing device according to the present invention, and FIG. 2 is a cross-sectional view of a conventional developing device. Wafer 2 Turntable 3 Chamber 4 Spray nozzle 5.・Pre-treatment chemical supply tube 6... N for spraying, gas supply tube 7... Developer nozzle 8... Pure water nozzle 9 for stopping development... Valve 10 for exhausting the chamber... Front Processing nozzle or more

Claims (1)

[Claims] A developing device for developing photoresist, comprising a chamber in which a developing process is performed, and a nozzle for supplying a mist of a chemical into the chamber.