CN104714376B - A kind of developing apparatus and developing method - Google Patents
A kind of developing apparatus and developing method Download PDFInfo
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- CN104714376B CN104714376B CN201510154683.0A CN201510154683A CN104714376B CN 104714376 B CN104714376 B CN 104714376B CN 201510154683 A CN201510154683 A CN 201510154683A CN 104714376 B CN104714376 B CN 104714376B
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- 238000000034 method Methods 0.000 title claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 207
- 238000007605 air drying Methods 0.000 claims abstract description 56
- 230000005540 biological transmission Effects 0.000 claims description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 238000001514 detection method Methods 0.000 claims description 6
- 230000006698 induction Effects 0.000 claims description 2
- 230000008569 process Effects 0.000 abstract description 10
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 9
- 238000010586 diagram Methods 0.000 description 13
- 239000011521 glass Substances 0.000 description 8
- 239000007921 spray Substances 0.000 description 7
- 238000004590 computer program Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 230000006870 function Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Cleaning Or Drying Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The invention discloses a kind of developing apparatus and developing methods, the development zone of the developing apparatus is provided with signal processing system, mobile air drying system and multiple sensors, it is that signal processing system in the developing apparatus can be generated according to multiple sensors with the relevant location sensitive information of substrate that is developing, determine whether the substrate stops in development zone, and determining the substrate when development zone stops and determines that the development duration of the substrate reaches the development duration of setting, the mobile air drying system of control is removed the developer solution on the substrate, the problem of so as to avoid excessively being developed due to photoresist of substrate caused by developing cell stops on substrate, improve pdm substrate quality, shorten process cycle.
Description
Technical field
The present invention relates to technical field of liquid crystal display more particularly to a kind of developing apparatuses and developing method.
Background technology
(Thin film Transistor Liquid Crystal Display, tft liquid crystal are aobvious by TFT-LCD
Show device) have the characteristics that small size, low power consumption, no radiation, occupy dominant position in current flat panel display market.Wherein, by
In tft array substrate be the pith of TFT-LCD displays, therefore improve tft array substrate yield, reduce tft array base
Operations number can carry high display quality to plate preparation process again.
During preparing tft array substrate, the processes such as gluing, exposure, development will be largely carried out.Wherein, it shows
Shadow equipment is mainly used to the photoresist on the glass substrate after removal exposure, is pre-formed required figure to carry out next step quarter
Lose process.At present in the preparation of large scale tft array substrate, developing apparatus mostly uses fountain.As shown in Figure 1, it is existing
It includes substrate holding areas 11, development to have the structural schematic diagram of fountain developing apparatus, the existing fountain developing apparatus 10
Area 12, water wash zone 13 and 14 4, the areas Feng Xi region, wherein be provided in development zone 12 close to the aobvious of 11 side of substrate holding areas
Shadow liquid spray equipment 121 and delivery roller 122；Multiple purification water spray systems 131 are provided in water wash zone 13；The areas Feng Xi
Fixed air knife 141 is provided in 14.
The operation principle of the existing fountain developing apparatus 10 is, first by developer solution spray equipment 121, such as to develop
Nozzle for liquid uniformly sprays developer solution on the glass substrate, then develops certain time in the development zone of developing apparatus 12, finally leads to
The fixed air knife 141 for crossing the purification water spray system 131 of the water wash zone 13 of developing apparatus and the areas Feng Xi 14 of developing apparatus is gone
Except the developer solution on glass substrate and cleaning is carried out to glass substrate to air-dry.
As shown in the above, in developing process, lead to glass base if there is equipment alarm or other phenomena of the failure
Plate is stopped in the development zone of developing apparatus, then easily causes the photoresist on glass substrate excessively to develop, directly affect glass base
Plate film layer it is graphical, formed it is bad；And due to glass substrate needs progress operation again at this time, thus can also exist and increase work
The problem of skill period, reduction production capacity.
Invention content
An embodiment of the present invention provides a kind of developing apparatus and developing methods, to solve to go out in developing cell due to substrate
Now stopping causes the photoresist on substrate excessively to develop so that the problem of pdm substrate quality is bad and process cycle extends.
An embodiment of the present invention provides a kind of developing apparatus, signal processing system is provided in the development zone of the developing apparatus
System, mobile air drying system and multiple sensors；
The multiple sensor, the relevant location sensitive information of substrate for generating Yu developing；
The signal processing system, for being generated according to the multiple sensor and the relevant location sensitive of the substrate
Information determines whether the substrate stops in development zone；If so, reaching the aobvious of setting in the development duration for determining the substrate
When shadow duration, the control mobile air drying system starts；
The mobile air drying system, for removing the development on the substrate according to the control of the signal processing system
Liquid.
Further, the multiple sensor is according to the far and near described of the substrate holding areas apart from the developing apparatus
The development zone of developing apparatus is arranged in order, and, the adjacent sensor of any two is spaced the horizontal distance of setting between each other；
The signal processing system, specifically for from the time of n-th sensor primary detection is to the substrate, if really
The substrate is not detected in the N+1 adjacent sensor being positioned at after the n-th sensor within the set duration, then
Determine that the substrate is stopped in development zone, wherein the N is positive integer.
Further, the signal processing system is specifically used for being generated according to the multiple sensor with the substrate
Relevant location sensitive information determines the substrate in the stop place of development zone, and is moved controlling the mobile air drying system
After moving the stop place, start the mobile air drying system.
Further, the mobile air drying system includes mobile air knife and mobile air knife transmission device, wherein the movement
Air knife is located at development zone close to water wash zone side, and the mobile air knife transmission device is located at development zone both sides up and down；
The signal processing system is specifically used for controlling the movement in the stop place of development zone according to the substrate
After the mobile air knife is moved to the stop place by air knife transmission device, start the mobile air knife.
Further, the signal processing system is specifically used for being generated according to the multiple sensor with the substrate
Relevant location sensitive information determines in the development duration for determining substrate substrate at the time of development zone stops,
And the duration that do not develop of the substrate is determined according to the development duration of the setting and the duration that developed, and, from determination
From the substrate is at the time of development zone stops, however, it is determined that have been subjected to the duration that do not develop, then control the movement and air-dry system
System starts.
Further, the embodiment of the present invention additionally provides a kind of developing method corresponding with the developing apparatus, including：
It is that signal processing system is generated according to multiple sensors with the relevant location sensitive information of substrate that is developing, really
Whether the fixed substrate stops in development zone；
If so, when the development duration for determining the substrate reaches the development duration of setting, mobile air drying system is controlled
Start.
Further, the multiple sensor is according to the far and near described of the substrate holding areas apart from the developing apparatus
The development zone of developing apparatus is arranged in order, and, the adjacent sensor of any two is spaced the horizontal distance of setting between each other；Root
Generated according to multiple sensors with the relevant location sensitive information of substrate developed, determine the substrate whether in development zone
It stops, including：
From at the time of n-th sensor primary detection is to the substrate, however, it is determined that be located at after the n-th sensor
The N+1 adjacent sensor the substrate is not detected within the set duration, it is determined that the substrate development zone stop,
Wherein, the N is positive integer.
Further, mobile air drying system is controlled to start, including：
According to the generation of the multiple sensor and the relevant location sensitive information of the substrate, determine the substrate aobvious
The stop place in shadow zone, and after controlling the mobile air drying system and being moved to the stop place, start the movement and air-dry
System.
Further, the mobile air drying system includes mobile air knife and mobile air knife transmission device, wherein the movement
Air knife is located at development zone close to water wash zone side, and the mobile air knife transmission device is located at development zone both sides up and down；
The mobile air drying system of control starts, including：
According to the substrate in the stop place of development zone, the mobile air knife transmission dress in the mobile air drying system is controlled
It sets after the mobile air knife in the mobile air drying system is moved to the stop place, starts the mobile air knife.
Further, it when the development duration for determining the substrate reaches the development duration of setting, controls movement and air-dries system
System starts, including：
According to the generation of the multiple sensor and the relevant location sensitive information of the substrate, determination is determining the base
The development duration of plate substrate at the time of development zone stops, and according to the development duration of the setting and described developed
Duration determines the duration that do not develop of the substrate, and, from the determination substrate is at the time of development zone stops, however, it is determined that
After the duration that do not develop, then controls the mobile air drying system and start.
The present invention has the beneficial effect that：
An embodiment of the present invention provides a kind of developing apparatus and developing method, the development zone of the developing apparatus is provided with letter
Number processing system, mobile air drying system and multiple sensors, the signal processing system in the developing apparatus can be according to more
It is that a sensor generates with the relevant location sensitive information of substrate that is developing, determine whether the substrate stops in development zone
It stays, and is determining the substrate when development zone stops and determines that the development duration of the substrate reaches the development duration of setting,
The mobile air drying system of control is removed the developer solution on the substrate, occurs in developing cell so as to avoid due to substrate
The problem of photoresist caused by stop on substrate excessively develops improves pdm substrate quality, shortens process cycle.
Description of the drawings
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly introduced, it should be apparent that, drawings in the following description are only some embodiments of the invention, for this
For the those of ordinary skill in field, without creative efforts, other are can also be obtained according to these attached drawings
Attached drawing.
Fig. 1 show the structural schematic diagram of existing fountain developing apparatus；
Fig. 2 show the structural schematic diagram of the developing apparatus described in the embodiment of the present invention one；
Fig. 3 show the flow diagram of the developing method described in the embodiment of the present invention two.
Reference numeral：
The existing fountain developing apparatus 11- substrates holding areas 12- development zones of 10-
The water wash zones 13- 14- Feng Xi area 121- developer solution spray equipments
122- delivery rollers 131- purifies the fixed air knives of water spray system 141-
20- developing apparatus 21- signal processing systems 22- moves air drying system
23- sensor 24- substrates 221- moves air knife
222- moves air knife transmission device
Specific implementation mode
To make the objectives, technical solutions, and advantages of the present invention clearer, below in conjunction with attached drawing to the present invention make into
It is described in detail to one step, it is clear that described embodiments are only a part of the embodiments of the present invention, rather than whole implementation
Example.Based on the embodiments of the present invention, obtained by those of ordinary skill in the art without making creative efforts
All other embodiment, shall fall within the protection scope of the present invention.
Embodiment one：
The embodiment of the present invention one provides a kind of developing apparatus 20, as shown in Fig. 2, it is described in the embodiment of the present invention
The structural schematic diagram of developing apparatus 20, wherein, the developing apparatus similar with existing fountain developing apparatus 10 shown in FIG. 1
20 may include substrate holding areas 11, development zone 12, water wash zone 13 and 14 4, the areas Feng Xi region, wherein：
Signal processing system 21, mobile air drying system 22 and multiple sensors 23 are provided in the development zone 12；
The multiple sensor 23, the 24 relevant location sensitive information of substrate that can be used for generating with developing；For example,
For any sensor 23, the sensor 23 is when sensing substrate 24, you can generates and the 24 relevant location sensitive of substrate
Information；
The signal processing system 21 can be used for being generated according to the multiple sensor 23 relevant with the substrate 24
Location sensitive information determines whether the substrate 24 stops in development zone 12；If so, when determining the development of the substrate 24
When the long development duration for reaching setting, controls the mobile air drying system 22 and start；Wherein, the development duration of the setting can root
It is set and can be adjusted accordingly according to actual conditions according to total development duration needed for substrate 24；
The mobile air drying system 22 can be used for being removed on the substrate 24 according to the control of the signal processing system 21
Developer solution.
That is, in developing apparatus described in the embodiment of the present invention, increased newly added with signal processing system in development zone
System, mobile air drying system and multiple sensors, and the signal processing system can be generated according to multiple sensors with
The relevant location sensitive information of substrate developed, determines whether the substrate stops in development zone, and is determining the base
Plate controls mobile air drying system pair when development zone stops and determines that the development duration of the substrate reaches the development duration of setting
Developer solution on the substrate is removed, so as to avoid since substrate is caused by developing cell stops on substrate
Photoresist the problem of excessively developing, improve pdm substrate quality, shorten process cycle.
Optionally, the multiple sensor 23 can be according to the distance of the substrate holding areas 11 apart from the developing apparatus 20
It is arranged in order in the development zone 12 of the developing apparatus 20, and, the adjacent sensor 23 of any two can be spaced between each other to be set
Fixed horizontal distance.
Correspondingly, the signal processing system 21 can be specifically used for from 23 primary detection of n-th sensor to the substrate
From at the time of 24, however, it is determined that the N+1 adjacent sensor 23 after the n-th sensor 23 is within the set duration
The substrate 24 is not detected, it is determined that the substrate 24 is stopped in development zone 12, wherein the N is positive integer.
It should be noted that the number of the multiple sensor 23 can be according to the distance of development zone 12 and the development of setting
Duration is set, and the horizontal distance of the setting can be set according to the distance of development zone 12 and the number of the multiple sensor 23
Fixed, the setting duration can be set according to the development duration of the horizontal distance of the setting, the distance of development zone 12 and setting
It is fixed.For example, it is assumed that the distance of development zone 12 is 5m, when development of setting a length of 200s, then the number that sensor 23 can be arranged is
50, correspondingly, the horizontal distance of the setting may be configured as 0.1m, the setting duration may be configured as 4s.Correspondingly, may be used
Have, if from the time of the 14th sensor 23 detects the substrate 24, after have passed through 4s, determines the 15th sensor 23 still
The substrate 24 is not detected, then can determine that the substrate 24 is stopped in development zone 12.
It is further to note that the multiple sensor 23 can be distributed in the upside and/or downside of the development zone 12,
Wherein, the structural schematic diagram for being distributed in the upside of the development zone 12 can be as shown in Figure 2.
Further, the signal processing system 21, can be specifically for generating and institute according to the multiple sensor 23
24 relevant location sensitive information of substrate is stated, determines the substrate 24 in the stop place of development zone 12, and is controlling the shifting
After dynamic air drying system 22 is moved to the stop place, start the mobile air drying system 22.
Optionally, as shown in Figure 2, however, it is determined that B is the stop place of the substrate 24, it is determined that the mistake of the specific location of B
Cheng Kewei：Assuming that the distance of development zone 12 is 5m, when development of setting a length of 200s, the number of sensor 23 is 50 and uniformly
Be distributed in the upside of development zone 12, the horizontal distance set as 0.1m, when setting a length of 4s, and sensed from the 14th
From at the time of device 23 detects the substrate 24, after have passed through 4s, determine that the substrate is still not detected in the 15th sensor 23
24, then it can determine the position of B at a certain position between the 14th sensor 23 and the 15th sensor 23 (including the 14th
Position where sensor 23, but do not include the position where the 15th sensor 23), it can also determine otherwise certainly
The stop place of the substrate 24, the embodiment of the present invention do not repeat this.It should be noted that when the sensor 23 being arranged
When number is more, the position of identified B is more accurate.
Further, the mobile air drying system 22 may include mobile air knife 221 and mobile air knife transmission device 222,
In, the mobile air knife 221 is located at development zone 12 close to 13 side of water wash zone, and the mobile air knife transmission device 222 (specifically may be used
For two mobile air knife conveyer belts) it is located at about 12 both sides of development zone；
The signal processing system 21 can be specifically used for according to the substrate 24 in the stop place of development zone 12, control
After the mobile air knife 221 is moved to the stop place by the mobile air knife transmission device 222, start the mobile air knife
221。
Specifically, as shown in Figure 2, however, it is determined that B is the stop place of the substrate 24, and C is the first of the mobile air knife 221
Beginning position then can control the mobile air knife transmission device 222 that the mobile air knife 221 is quickly moved to B from initial position C
Behind position, starts the mobile air knife 221 and the developer solution on the substrate 24 is removed.Certainly can also first start described
Mobile air knife 221, then control the mobile air knife transmission device 222 and move the mobile air knife 221 rapidly from initial position C
To the B location, the embodiment of the present invention is not construed as limiting this.
It should be noted that after by the developer solution removal on the substrate 24, also controllable mobile air knife transmission device
222 move back to the mobile air knife 221 the initial position C of the mobile air knife 221, and the embodiment of the present invention does not go to live in the household of one's in-laws on getting married to this
It states.
Further, the signal processing system 21, can be specifically for generating and institute according to the multiple sensor 23
24 relevant location sensitive information of substrate is stated, determination is determining the substrate 24 at the time of development zone 12 stops of the substrate 24
Development duration, and when not developing of the substrate 24 is determined according to the development duration and the duration that developed of the setting
It is long, and, from the determination substrate 24 is at the time of development zone 12 stops, however, it is determined that have been subjected to the duration that do not develop, then
The mobile air drying system 22 is controlled to start.
Specifically, it is assumed that the distance of development zone 12 is 5m, when development of setting a length of 200s, the number of sensor 23 is
50 and it is uniformly distributed in the upside of development zone 12 and first sensor 23 is located at the original position of development zone 12, it is described to set
Periodically a length of 4s, and from the time of the 14th sensor 23 detects the substrate 24, after have passed through 4s, the 15th sensor
23 are still not detected the substrate 24, then can determine a length of 60s when the development of the substrate 24, a length of when not developing accordingly
140s then can determine the aobvious of the substrate 24 if the substrate 24 have passed through 140s from determining development zone 12 stops the moment
Shadow duration reaches the development duration of setting, and controls the mobile air drying system 22 and start, certainly also can be otherwise
Determine that the development duration of the substrate 24, the embodiment of the present invention do not repeat this.
The embodiment of the present invention one provides a kind of developing apparatus, and the development zone of the developing apparatus is provided with signal processing system
System moves air drying system and multiple sensors, and the signal processing system in the developing apparatus can be according to multiple sensors
Generate with the relevant location sensitive information of substrate developed, determine whether the substrate stops in development zone, and true
The fixed substrate controls mobile wind when development zone stops and determines that the development duration of the substrate reaches the development duration of setting
Dry systems are removed the developer solution on the substrate, so as to avoid since substrate occurs stopping in developing cell and causes
Substrate on photoresist the problem of excessively developing, improve pdm substrate quality, shorten process cycle.
Embodiment two：
Second embodiment of the present invention provides a kind of developing methods, as shown in figure 3, it is to develop described in the embodiment of the present invention two
The flow diagram of method, the method may include following steps：
Step 301：It is that signal processing system is generated according to multiple sensors to feel with the relevant position of substrate that is developing
Information is answered, determines whether the substrate stops in development zone.
Step 302：Signal processing system is determining that the substrate stops in the development zone and determine the aobvious of the substrate
When shadow duration reaches the development duration of setting, controls mobile air drying system and start.
That is, in the technical solution described in the embodiment of the present invention, the signal processing system can be according to multiple biographies
Sensor generate with the relevant location sensitive information of substrate developed, determine whether the substrate stops in development zone, and
The substrate is being determined when development zone stops and determines that the development duration of the substrate reaches the development duration of setting, control moves
Dynamic air drying system is removed the developer solution on the substrate, so as to avoid occurring stopping in developing cell due to substrate
The problem of photoresist on caused substrate excessively develops improves pdm substrate quality, shortens process cycle.
Optionally, the multiple sensor can be according to the distance of the substrate holding areas apart from the developing apparatus described
The development zone of developing apparatus is arranged in order, and, the adjacent sensor of any two can be spaced the horizontal distance of setting between each other.
Correspondingly, generated according to multiple sensors with the relevant location sensitive information of substrate developed, determine institute
It states whether substrate stops in development zone, can be embodied as：
From at the time of n-th sensor primary detection is to the substrate, however, it is determined that be located at after the n-th sensor
The N+1 adjacent sensor the substrate is not detected within the set duration, it is determined that the substrate development zone stop,
Wherein, the N is positive integer.
For example, the setting duration may be configured as 4s, and 50 sensors are evenly arranged on the upside of the development zone.Phase
Ying Di can have, if from the time of the 14th sensor detects the substrate, after have passed through 4s, determine the 15th sensor
The substrate is still not detected, then can determine that the substrate is stopped in development zone.Institute can certainly be determined otherwise
State whether substrate stops in the development zone, the present invention does not repeat this.
Further, in step 302, it controls mobile air drying system to start, can be embodied as：
According to the generation of the multiple sensor and the relevant location sensitive information of the substrate, determine the substrate aobvious
The stop place in shadow zone, and after controlling the mobile air drying system and being moved to the stop place, start the movement and air-dry
System.
Wherein, the mobile air drying system may include mobile air knife and mobile air knife transmission device, wherein the mobile wind
Cutter spacing is in development zone close to water wash zone side, mobile air knife transmission device (the concretely two mobile air knife conveyer belts) position
The both sides above and below development zone then specifically control mobile air drying system and start, can be embodied as in step 302：
According to the substrate in the stop place of development zone, the mobile air knife transmission dress in the mobile air drying system is controlled
It sets after the mobile air knife in the mobile air drying system is moved to the stop place, starts the mobile air knife.
Specifically, as shown in Figure 2, however, it is determined that B is the stop place of the substrate, and C is the initial bit of the mobile air knife
It sets, then can control the mobile air knife transmission device after initial position C is quickly moved to B location, to open the mobile air knife
The mobile air knife is moved to be removed the developer solution on the substrate.Certainly it can also first start the mobile air knife, then control
It makes the mobile air knife transmission device and the mobile air knife is quickly moved to the B location from initial position C, the present invention is implemented
Example is not construed as limiting this.
It should be noted that after by the developer solution removal on the substrate, also controllable mobile air knife transmission device will
The mobile air knife moves back to the initial position of the mobile air knife, and the embodiment of the present invention does not repeat this.
Further, in step 302 when the development duration for determining the substrate reaches the development duration of setting, control
Mobile air drying system starts, and can be embodied as：
According to the generation of the multiple sensor and the relevant location sensitive information of the substrate, determination is determining the base
The development duration of plate substrate at the time of development zone stops, and according to the development duration of the setting and described developed
Duration determines the duration that do not develop of the substrate, and, from the determination substrate is at the time of development zone stops, however, it is determined that
After the duration that do not develop, then controls the mobile air drying system and start.
Developing method described in the embodiment of the present invention is described in detail with a specific embodiment below.
As shown in Fig. 2, A, which is substrate, enters the initial position of development zone, B is substrate in the stop place of development zone, and C is to move
The initial position of dynamic air knife, wherein the distance of development zone is 5m, when development of setting a length of 200s, the number of sensor is 50
Upside that is a and being uniformly distributed in development zone and first sensor are located at the original position of development zone, and when setting is a length of
4s, then the developing method may include following steps：
Step S1：Signal processing system receives that multiple sensors generate with the relevant location sensitive of substrate that is developing
Information.
Step S2：It is that signal processing system is generated according to the multiple sensor with the relevant position of substrate that is developing
Induction information is determined from the time of the 14th sensor detects the substrate, have passed through 4s, the 15th sensor is not yet
Detect the substrate, it is determined that go out the substrate and stopped in the development zone, and determine that stop place is to be passed at the 14th
At a certain position between sensor and the 15th sensor (including the position where the 14th sensor, but do not include the 15th
Position where sensor), and determine a length of 60s when the development of the substrate, a length of 140s when not developing.
Step S3：Signal processing system determines that the substrate from determining development zone stops the moment, have passed through 140s,
It then can determine that the development duration of the substrate reaches the development duration of setting, control the mobile air knife transmission device by institute
Mobile air knife is stated behind the stop place that initial position is quickly moved to the substrate, starts the mobile air knife to the substrate
On developer solution be removed, the mobile air knife is then moved back to by the mobile air knife by mobile air knife transmission device again
Initial position.
Second embodiment of the present invention provides a kind of developing method, the signal processing system can give birth to according to multiple sensors
At with the relevant location sensitive information of substrate developed, determine whether the substrate stops in development zone, and in determination
The substrate controls mobile air-dry when development zone stops and determines that the development duration of the substrate reaches the development duration of setting
System is removed the developer solution on the substrate, so as to avoid since substrate is caused by developing cell stops
The problem of photoresist on substrate excessively develops improves pdm substrate quality, shortens process cycle.
It will be understood by those skilled in the art that the embodiment of the present invention can be provided as method, apparatus (equipment) or computer journey
Sequence product.Therefore, complete hardware embodiment, complete software embodiment or combining software and hardware aspects can be used in the present invention
The form of embodiment.Moreover, the present invention can be used in one or more wherein include computer usable program code calculating
The computer program implemented in machine usable storage medium (including but not limited to magnetic disk storage, CD-ROM, optical memory etc.)
The form of product.
The present invention be with reference to according to the method for the embodiment of the present invention, the flow chart of device (equipment) and computer program product
And/or block diagram describes.It should be understood that each flow in flowchart and/or the block diagram can be realized by computer program instructions
And/or the combination of the flow and/or box in box and flowchart and/or the block diagram.These computer programs can be provided to refer to
Enable the processor of all-purpose computer, special purpose computer, Embedded Processor or other programmable data processing devices to generate
One machine so that by the instruction that computer or the processor of other programmable data processing devices execute generate for realizing
The device for the function of being specified in one flow of flow chart or multiple flows and/or one box of block diagram or multiple boxes.
These computer program instructions, which may also be stored in, can guide computer or other programmable data processing devices with spy
Determine in the computer-readable memory that mode works so that instruction generation stored in the computer readable memory includes referring to
Enable the manufacture of device, the command device realize in one flow of flow chart or multiple flows and/or one box of block diagram or
The function of being specified in multiple boxes.
These computer program instructions also can be loaded onto a computer or other programmable data processing device so that count
Series of operation steps are executed on calculation machine or other programmable devices to generate computer implemented processing, in computer or
The instruction executed on other programmable devices is provided for realizing in one flow of flow chart or multiple flows and/or block diagram one
The step of function of being specified in a box or multiple boxes.
Although preferred embodiments of the present invention have been described, it is created once a person skilled in the art knows basic
Property concept, then additional changes and modifications may be made to these embodiments.So it includes excellent that the following claims are intended to be interpreted as
It selects embodiment and falls into all change and modification of the scope of the invention.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art
God and range.In this way, if these modifications and changes of the present invention belongs to the range of the claims in the present invention and its equivalent technologies
Within, then the present invention is also intended to include these modifications and variations.
Claims (10)
1. a kind of developing apparatus, which is characterized in that be provided with signal processing system, mobile wind in the development zone of the developing apparatus
Dry systems and multiple sensors；
The multiple sensor, the relevant location sensitive information of substrate for generating Yu developing；
The signal processing system, for being generated according to the multiple sensor and the relevant location sensitive information of the substrate
Determine whether the substrate stops in development zone；If so, when the development duration for determining the substrate reaches the development of setting
When long, the control mobile air drying system starts；
The mobile air drying system, for removing the developer solution on the substrate according to the control of the signal processing system.
2. developing apparatus as described in claim 1, which is characterized in that the multiple sensor is according to apart from the developing apparatus
The far and near development zone in the developing apparatus of substrate holding areas be arranged in order, and, the adjacent sensor phase of any two
Horizontal distance between mutually is the horizontal distance of setting；
The signal processing system, specifically for from the time of n-th sensor primary detection is to the substrate, however, it is determined that position
The substrate is not detected in the N+1 adjacent sensor after the n-th sensor within the set duration, it is determined that
The substrate is stopped in development zone, wherein the N is positive integer.
3. developing apparatus as described in claim 1, which is characterized in that
The signal processing system, specifically for being generated according to the multiple sensor and the relevant location sensitive of the substrate
Information determines the substrate in the stop place of development zone, and is moved to the stop place controlling the mobile air drying system
It postpones, starts the mobile air drying system.
4. developing apparatus as claimed in claim 3, which is characterized in that the mobile air drying system includes mobile air knife and movement
Air knife transmission device, wherein the mobile air knife is located at development zone close to water wash zone side, the mobile air knife transmission device position
The both sides above and below development zone；
The signal processing system is specifically used for controlling the mobile air knife in the stop place of development zone according to the substrate
After the mobile air knife is moved to the stop place by transmission device, start the mobile air knife.
5. developing apparatus as described in claim 1, which is characterized in that
The signal processing system, specifically for being generated according to the multiple sensor and the relevant location sensitive of the substrate
Information is determined in the development duration for determining substrate substrate at the time of development zone stops, and according to the setting
Development duration and the duration that developed determine the duration that do not develop of the substrate, and, developing from the determination substrate
From at the time of area stops, however, it is determined that have been subjected to the duration that do not develop, then control the mobile air drying system and start.
6. a kind of developing method based on developing apparatus described in claim 1, which is characterized in that including：
It is that signal processing system is generated according to multiple sensors with the relevant location sensitive information of substrate that is developing, determine institute
State whether substrate stops in development zone；
If so, when the development duration for determining the substrate reaches the development duration of setting, controls mobile air drying system and start.
7. developing method as claimed in claim 6, which is characterized in that the multiple sensor is according to apart from the developing apparatus
The far and near development zone in the developing apparatus of substrate holding areas be arranged in order, and, the adjacent sensor phase of any two
Horizontal distance between mutually is the horizontal distance of setting；Generated according to multiple sensors with the relevant position of substrate developed
Induction information is set, determines whether the substrate stops in development zone, including：
From at the time of n-th sensor primary detection is to the substrate, however, it is determined that the phase being located at after the n-th sensor
The substrate is not detected in the N+1 adjacent sensor within the set duration, it is determined that and the substrate is stopped in development zone,
In, the N is positive integer.
8. developing method as claimed in claim 6, which is characterized in that the mobile air drying system of control starts, including：
According to the generation of the multiple sensor and the relevant location sensitive information of the substrate, determine the substrate in development zone
Stop place, and after controlling the mobile air drying system and being moved to the stop place, start the mobile air drying system.
9. developing method as claimed in claim 8, which is characterized in that the mobile air drying system includes mobile air knife and movement
Air knife transmission device, wherein the mobile air knife is located at development zone close to water wash zone side, the mobile air knife transmission device position
The both sides above and below development zone；
The mobile air drying system of control starts, including：
According to the substrate in the stop place of development zone, the mobile air knife transmission device controlled in the mobile air drying system will
After mobile air knife in the mobile air drying system is moved to the stop place, start the mobile air knife.
10. developing method as claimed in claim 6, which is characterized in that reach setting in the development duration for determining the substrate
Development duration when, control mobile air drying system and start, including：
Generated according to the multiple sensor and relevant location sensitive information of the substrate determines and is determining that the substrate exists
The development duration of development zone substrate at the time of stop, and according to the development duration of the setting and the duration that developed
Determine the duration that do not develop of the substrate, and, from the determination substrate is at the time of development zone stops, however, it is determined that have been subjected to
After the duration that do not develop, then controls the mobile air drying system and start.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201510154683.0A CN104714376B (en) | 2015-04-02 | 2015-04-02 | A kind of developing apparatus and developing method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510154683.0A CN104714376B (en) | 2015-04-02 | 2015-04-02 | A kind of developing apparatus and developing method |
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| CN104714376B true CN104714376B (en) | 2018-09-18 |
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| CN108333885A (en) * | 2018-02-08 | 2018-07-27 | 武汉华星光电技术有限公司 | Apparatus for coating |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59145525A (en) * | 1983-02-09 | 1984-08-21 | Matsushita Electronics Corp | Resist development |
| JP2006350076A (en) * | 2005-06-17 | 2006-12-28 | Konica Minolta Medical & Graphic Inc | Automatic developing apparatus and planographic printing plate |
| KR20070034833A (en) * | 2005-09-26 | 2007-03-29 | 엘지.필립스 엘시디 주식회사 | Developing apparatus and developing method |
| CN102163009A (en) * | 2010-02-15 | 2011-08-24 | 东京毅力科创株式会社 | Developing apparatus and developing method |
| CN102645854A (en) * | 2011-04-20 | 2012-08-22 | 京东方科技集团股份有限公司 | Developing solution spraying system and method and substrate product |
-
2015
- 2015-04-02 CN CN201510154683.0A patent/CN104714376B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59145525A (en) * | 1983-02-09 | 1984-08-21 | Matsushita Electronics Corp | Resist development |
| JP2006350076A (en) * | 2005-06-17 | 2006-12-28 | Konica Minolta Medical & Graphic Inc | Automatic developing apparatus and planographic printing plate |
| KR20070034833A (en) * | 2005-09-26 | 2007-03-29 | 엘지.필립스 엘시디 주식회사 | Developing apparatus and developing method |
| CN102163009A (en) * | 2010-02-15 | 2011-08-24 | 东京毅力科创株式会社 | Developing apparatus and developing method |
| CN102645854A (en) * | 2011-04-20 | 2012-08-22 | 京东方科技集团股份有限公司 | Developing solution spraying system and method and substrate product |
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