JPS569742A - Developing method of photosensitive resin - Google Patents

Developing method of photosensitive resin

Info

Publication number
JPS569742A
JPS569742A JP8463679A JP8463679A JPS569742A JP S569742 A JPS569742 A JP S569742A JP 8463679 A JP8463679 A JP 8463679A JP 8463679 A JP8463679 A JP 8463679A JP S569742 A JPS569742 A JP S569742A
Authority
JP
Japan
Prior art keywords
substrate
ring
periphery
solvent
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8463679A
Other languages
Japanese (ja)
Other versions
JPS6053307B2 (en
Inventor
Kenzo Hatada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8463679A priority Critical patent/JPS6053307B2/en
Publication of JPS569742A publication Critical patent/JPS569742A/en
Publication of JPS6053307B2 publication Critical patent/JPS6053307B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a uniformly developed pattern inside a substrate with accuracy by placing a ring at a position near the periphery of the substrate and away from the substrate and dropping a developer into the ring. CONSTITUTION:Semiconductor substrate 12 with mask exposable resin 13 coated on the surface is set on wafer chuck 11, and ring 14 is placed near the periphery of substrate 12 at interval (x). The inside of ring 14 is about equal to the periphery of substrate 12 in size, and interval (x) between substrate 12 and ring 14 is adjusted to such an extent that solvent does not flow out of substrate 12 owing to the surface tension, e.g., about 3-7mm.. A developing solvent is dropped from nozzle 15. Since dropped solvent 16 stays inside ring 14, a developed pattern can be formed uniformly with accuracy.
JP8463679A 1979-07-04 1979-07-04 How to develop photosensitive resin Expired JPS6053307B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8463679A JPS6053307B2 (en) 1979-07-04 1979-07-04 How to develop photosensitive resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8463679A JPS6053307B2 (en) 1979-07-04 1979-07-04 How to develop photosensitive resin

Publications (2)

Publication Number Publication Date
JPS569742A true JPS569742A (en) 1981-01-31
JPS6053307B2 JPS6053307B2 (en) 1985-11-25

Family

ID=13836166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8463679A Expired JPS6053307B2 (en) 1979-07-04 1979-07-04 How to develop photosensitive resin

Country Status (1)

Country Link
JP (1) JPS6053307B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5732445A (en) * 1980-08-01 1982-02-22 Nec Corp Developing method for photoresist
JPS58102934A (en) * 1981-12-11 1983-06-18 デイスコビジヨン・アソシエイツ Development of photoresist layer
JPS5950440A (en) * 1982-09-16 1984-03-23 Fujitsu Ltd Developing method of resist film
JPH0210824A (en) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd Electron-beam resist developing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5732445A (en) * 1980-08-01 1982-02-22 Nec Corp Developing method for photoresist
JPS58102934A (en) * 1981-12-11 1983-06-18 デイスコビジヨン・アソシエイツ Development of photoresist layer
JPH0357542B2 (en) * 1981-12-11 1991-09-02 Discovision Ass
JPS5950440A (en) * 1982-09-16 1984-03-23 Fujitsu Ltd Developing method of resist film
JPH0210824A (en) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd Electron-beam resist developing method

Also Published As

Publication number Publication date
JPS6053307B2 (en) 1985-11-25

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