JPS5546576A - Device for preventing semiconductor device from contaminating - Google Patents
Device for preventing semiconductor device from contaminatingInfo
- Publication number
- JPS5546576A JPS5546576A JP12076578A JP12076578A JPS5546576A JP S5546576 A JPS5546576 A JP S5546576A JP 12076578 A JP12076578 A JP 12076578A JP 12076578 A JP12076578 A JP 12076578A JP S5546576 A JPS5546576 A JP S5546576A
- Authority
- JP
- Japan
- Prior art keywords
- trap
- inlet
- wafer
- furnace
- polluted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To prevent polluted material from adhering onto the inner wall of the inlet of a high temperature furnace for wafers mounting a trap having a low temperature portion within the inlet to adhere the polluted material evaporated from the interior of the furnace onto the surface of the trap.
CONSTITUTION: A high temeperature furnace 1 is provided at one end with a gas inlet 5 and at the other with an opening as a wafer inlet 8, and contains a wafer 2 carried on a boat 3 at a high temperature unit 6 of heater 7 provided externally. A trap 9 is engaged instead of a cap at the wafer inlet 8 to adhere the polluted material evaporated to the outer wall communicating with the outer atmosphere provided in the trap 9. Thus, the inner surface of the inlet 8 is cleaned when the trap 9 is removed to thereby prevent the wafer from being polluted when the wafer 2 is charged or discharged at the furnace. Or, inlet and outlet nozzles 11 and 12 are provided at the trap to forcibly cool the trap 10.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12076578A JPS5546576A (en) | 1978-09-30 | 1978-09-30 | Device for preventing semiconductor device from contaminating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12076578A JPS5546576A (en) | 1978-09-30 | 1978-09-30 | Device for preventing semiconductor device from contaminating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5546576A true JPS5546576A (en) | 1980-04-01 |
Family
ID=14794435
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12076578A Pending JPS5546576A (en) | 1978-09-30 | 1978-09-30 | Device for preventing semiconductor device from contaminating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5546576A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5876954U (en) * | 1981-11-16 | 1983-05-24 | 株式会社日立製作所 | terminal device |
JPS62130520A (en) * | 1985-12-02 | 1987-06-12 | Fuji Electric Co Ltd | Diffusion with sealed pipe |
US5571333A (en) * | 1994-06-02 | 1996-11-05 | Shin-Etsu Handotai Co. Ltd. | Heat treatment furnace with an exhaust baffle |
US7025855B2 (en) * | 2001-12-04 | 2006-04-11 | Anelva Corporation | Insulation-film etching system |
US11326697B2 (en) | 2018-06-12 | 2022-05-10 | Marco Systemanalyse Und Entwicklung Gmbh | Jet valve |
-
1978
- 1978-09-30 JP JP12076578A patent/JPS5546576A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5876954U (en) * | 1981-11-16 | 1983-05-24 | 株式会社日立製作所 | terminal device |
JPS62130520A (en) * | 1985-12-02 | 1987-06-12 | Fuji Electric Co Ltd | Diffusion with sealed pipe |
US5571333A (en) * | 1994-06-02 | 1996-11-05 | Shin-Etsu Handotai Co. Ltd. | Heat treatment furnace with an exhaust baffle |
US7025855B2 (en) * | 2001-12-04 | 2006-04-11 | Anelva Corporation | Insulation-film etching system |
US11326697B2 (en) | 2018-06-12 | 2022-05-10 | Marco Systemanalyse Und Entwicklung Gmbh | Jet valve |
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