JPS57154835A - Method and apparatus for drying tabular material - Google Patents

Method and apparatus for drying tabular material

Info

Publication number
JPS57154835A
JPS57154835A JP3930581A JP3930581A JPS57154835A JP S57154835 A JPS57154835 A JP S57154835A JP 3930581 A JP3930581 A JP 3930581A JP 3930581 A JP3930581 A JP 3930581A JP S57154835 A JPS57154835 A JP S57154835A
Authority
JP
Japan
Prior art keywords
cartridge
wafers
tabular material
water
onto
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3930581A
Other languages
Japanese (ja)
Inventor
Hiroto Nagatomo
Tetsuya Takagaki
Masayoshi Kanematsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Tokyo Electronics Co Ltd
Hitachi Ltd
Hitachi Ome Electronic Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Tokyo Electronics Co Ltd, Hitachi Ltd, Hitachi Ome Electronic Co Ltd filed Critical Hitachi Tokyo Electronics Co Ltd
Priority to JP3930581A priority Critical patent/JPS57154835A/en
Publication of JPS57154835A publication Critical patent/JPS57154835A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To prevent the adhesion of dust in air and the stain of a cartridge or the like onto a tabular material by a method wherein the cartridge encasing the tabular material is immersed in water, the tabular material is taken out one by one, dried and encased in another cartridge. CONSTITUTION:The cartridge 17 encasing a plurality of wafers 19, washing thereof is completed, is placed onto the cartridge supporter 11 of a loader 5. The cartridge 17 is immersed in clean water in a water tank 8. The wafers 19 are extruded from the cartridge 17, and moved onto a loader base 30 while moving in water. The wafers 19 are set to one supporting section 33 in rotary disks 6a through the groove 34a of a cover 34. Waterdrops adhering on the surfaces of the wafers 19 are scattered centrifugally by turning the rotary disks 6a at high speed, and the wafers are dried. The wafers 19 are moved onto an unloader base 39 from a rotary section 6 by means of a pusher 38.
JP3930581A 1981-03-20 1981-03-20 Method and apparatus for drying tabular material Pending JPS57154835A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3930581A JPS57154835A (en) 1981-03-20 1981-03-20 Method and apparatus for drying tabular material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3930581A JPS57154835A (en) 1981-03-20 1981-03-20 Method and apparatus for drying tabular material

Publications (1)

Publication Number Publication Date
JPS57154835A true JPS57154835A (en) 1982-09-24

Family

ID=12549400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3930581A Pending JPS57154835A (en) 1981-03-20 1981-03-20 Method and apparatus for drying tabular material

Country Status (1)

Country Link
JP (1) JPS57154835A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0245289A1 (en) * 1985-11-01 1987-11-19 Motorola Inc Polishing system with underwater bernoulli pickup.

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473475A (en) * 1977-11-24 1979-06-12 Hitachi Ltd Device for washing and drying
JPS5586116A (en) * 1978-12-25 1980-06-28 Hitachi Ltd Drier

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473475A (en) * 1977-11-24 1979-06-12 Hitachi Ltd Device for washing and drying
JPS5586116A (en) * 1978-12-25 1980-06-28 Hitachi Ltd Drier

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0245289A1 (en) * 1985-11-01 1987-11-19 Motorola Inc Polishing system with underwater bernoulli pickup.
EP0245289A4 (en) * 1985-11-01 1989-01-24 Motorola Inc Polishing system with underwater bernoulli pickup.

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