JPS52147974A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS52147974A
JPS52147974A JP3566176A JP3566176A JPS52147974A JP S52147974 A JPS52147974 A JP S52147974A JP 3566176 A JP3566176 A JP 3566176A JP 3566176 A JP3566176 A JP 3566176A JP S52147974 A JPS52147974 A JP S52147974A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
secure
reading
information
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3566176A
Other languages
Japanese (ja)
Inventor
Hisashi Muraoka
Teruo Yoneyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3566176A priority Critical patent/JPS52147974A/en
Priority to US05/782,757 priority patent/US4095095A/en
Priority to GB13358/77A priority patent/GB1534248A/en
Publication of JPS52147974A publication Critical patent/JPS52147974A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To secure the manufacturing process control through the control equipment driving by reading the manufacturing conditions based on the information which is obtained through an optical scanning of the reflection intensity difference pattern formed on part of the wafer substrate.
COPYRIGHT: (C)1977,JPO&Japio
JP3566176A 1976-03-31 1976-03-31 Manufacture of semiconductor device Pending JPS52147974A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP3566176A JPS52147974A (en) 1976-03-31 1976-03-31 Manufacture of semiconductor device
US05/782,757 US4095095A (en) 1976-03-31 1977-03-30 Apparatus for manufacturing semiconductor devices
GB13358/77A GB1534248A (en) 1976-03-31 1977-03-30 Apparatus for manufacturing semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3566176A JPS52147974A (en) 1976-03-31 1976-03-31 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS52147974A true JPS52147974A (en) 1977-12-08

Family

ID=12448046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3566176A Pending JPS52147974A (en) 1976-03-31 1976-03-31 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS52147974A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5943524A (en) * 1982-09-06 1984-03-10 Hitachi Ltd Method and device for manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5943524A (en) * 1982-09-06 1984-03-10 Hitachi Ltd Method and device for manufacture of semiconductor device

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