JPS6455826A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6455826A JPS6455826A JP21336387A JP21336387A JPS6455826A JP S6455826 A JPS6455826 A JP S6455826A JP 21336387 A JP21336387 A JP 21336387A JP 21336387 A JP21336387 A JP 21336387A JP S6455826 A JPS6455826 A JP S6455826A
- Authority
- JP
- Japan
- Prior art keywords
- periphery
- photoresist
- forming chip
- patterned
- completely forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To improve uniformity of etching surface by patterning a photoresist of a part which does not become a completely forming chip at the periphery of a semiconductor substrate in the form of removing the photoresist at the part. CONSTITUTION:A photoresist at the periphery of a semiconductor substrate which does not become a completely forming chip is so patterned on the whole surface including the periphery as not to retain in the same shape or patterned to remove the photoresist of the periphery. A region 2 along the periphery of a substrate 1 in a predetermined width is a part in which the photoresist is removed by exposing through a mask in which the part corresponding to the periphery is transparent, and the inside of the periphery 2 is a region 3 in which the photoresist of the part not becoming a completely forming chip remains and a region 4 in which the completely forming chip is patterned. Thus, the quantity of the photoresist of the periphery is reduced to improve the uniformity of etching rate of the substrate surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21336387A JPS6455826A (en) | 1987-08-26 | 1987-08-26 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21336387A JPS6455826A (en) | 1987-08-26 | 1987-08-26 | Manufacture of semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6455826A true JPS6455826A (en) | 1989-03-02 |
Family
ID=16637939
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21336387A Pending JPS6455826A (en) | 1987-08-26 | 1987-08-26 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6455826A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6194312B1 (en) | 1997-07-10 | 2001-02-27 | Nec Corporation | Semiconductor device and method of manufacturing the same |
| WO2006028673A1 (en) * | 2004-09-03 | 2006-03-16 | Lam Research Corporation | Etch with uniformity control |
-
1987
- 1987-08-26 JP JP21336387A patent/JPS6455826A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6194312B1 (en) | 1997-07-10 | 2001-02-27 | Nec Corporation | Semiconductor device and method of manufacturing the same |
| WO2006028673A1 (en) * | 2004-09-03 | 2006-03-16 | Lam Research Corporation | Etch with uniformity control |
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