JPS558037A - Photo mask - Google Patents

Photo mask

Info

Publication number
JPS558037A
JPS558037A JP8012778A JP8012778A JPS558037A JP S558037 A JPS558037 A JP S558037A JP 8012778 A JP8012778 A JP 8012778A JP 8012778 A JP8012778 A JP 8012778A JP S558037 A JPS558037 A JP S558037A
Authority
JP
Japan
Prior art keywords
transparent
ranges
semi
mask
modes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8012778A
Other languages
Japanese (ja)
Inventor
Hiroyuki Shiraki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP8012778A priority Critical patent/JPS558037A/en
Publication of JPS558037A publication Critical patent/JPS558037A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: For decreasing mask consumption and operation rates in high-integration, to use, selectively depending on the modes of process, the transparent, non-transparent and semi-transparent ranges formed, by selective working, on the one mask substrate of the masks used in the manufacture of semiconductor integrated circuits.
CONSTITUTION: Of mask, the transparent range 6 is borne by a glass board 1, the semi- transparent ranges 5 and 5' by the portion covered with semi-transparent material 2 of said glass board 1, and the non-transparent section by the non-transparent ranges 5 and 5' made by covering said semi-transparent ranges 5 and 5' with non- transparent material 3. Said transparent, non-transparent and semi-transparent ranges 6, 4 and 4', as well as 5 snd 5' thus formed of the materials which require the selection of different working methods, on one glass plate 1, are used selectively depending on the modes of operation. Such selective use, dependent on the modes of process, of said ranges decreases mask consumption and operation rates in high- integration.
COPYRIGHT: (C)1980,JPO&Japio
JP8012778A 1978-06-30 1978-06-30 Photo mask Pending JPS558037A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8012778A JPS558037A (en) 1978-06-30 1978-06-30 Photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8012778A JPS558037A (en) 1978-06-30 1978-06-30 Photo mask

Publications (1)

Publication Number Publication Date
JPS558037A true JPS558037A (en) 1980-01-21

Family

ID=13709542

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8012778A Pending JPS558037A (en) 1978-06-30 1978-06-30 Photo mask

Country Status (1)

Country Link
JP (1) JPS558037A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05181258A (en) * 1992-06-19 1993-07-23 Hitachi Ltd Original plate for photomask
KR100298190B1 (en) * 1997-12-27 2002-01-15 박종섭 Method for measuring DOF in Lithography process
KR20030053683A (en) * 2001-12-22 2003-07-02 동부전자 주식회사 Photo Mask

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05181258A (en) * 1992-06-19 1993-07-23 Hitachi Ltd Original plate for photomask
JPH0715578B2 (en) * 1992-06-19 1995-02-22 株式会社日立製作所 Master plate for photomask
KR100298190B1 (en) * 1997-12-27 2002-01-15 박종섭 Method for measuring DOF in Lithography process
KR20030053683A (en) * 2001-12-22 2003-07-02 동부전자 주식회사 Photo Mask

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