JPS53116774A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS53116774A
JPS53116774A JP3193477A JP3193477A JPS53116774A JP S53116774 A JPS53116774 A JP S53116774A JP 3193477 A JP3193477 A JP 3193477A JP 3193477 A JP3193477 A JP 3193477A JP S53116774 A JPS53116774 A JP S53116774A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
insulation film
mask
requiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3193477A
Other languages
Japanese (ja)
Inventor
Hiroshi Koyama
Teruhiko Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP3193477A priority Critical patent/JPS53116774A/en
Publication of JPS53116774A publication Critical patent/JPS53116774A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To reduce production period and obtain elements of good characteristics without requiring any intricate process by radiating electron beams according to the required patterns on the insulation film deposited on a semiconductor substrate or on the surface protection film thereon and using the insulation film having caused the change in its composition for a mask for impurity diffusion.
COPYRIGHT: (C)1978,JPO&Japio
JP3193477A 1977-03-22 1977-03-22 Production of semiconductor device Pending JPS53116774A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3193477A JPS53116774A (en) 1977-03-22 1977-03-22 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3193477A JPS53116774A (en) 1977-03-22 1977-03-22 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS53116774A true JPS53116774A (en) 1978-10-12

Family

ID=12344787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3193477A Pending JPS53116774A (en) 1977-03-22 1977-03-22 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS53116774A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198623A (en) * 1981-05-30 1982-12-06 Dainippon Printing Co Ltd Selective diffusion

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198623A (en) * 1981-05-30 1982-12-06 Dainippon Printing Co Ltd Selective diffusion
JPH0350411B2 (en) * 1981-05-30 1991-08-01 Dainippon Printing Co Ltd

Similar Documents

Publication Publication Date Title
JPS5351970A (en) Manufacture for semiconductor substrate
JPS5331983A (en) Production of semiconductor substrates
JPS53116774A (en) Production of semiconductor device
JPS52117557A (en) Soft x-ray exposure mask and its manufacturing method
JPS53127266A (en) Forming method of marker
JPS534469A (en) Semiconductor device
JPS53123083A (en) Production of semiconductor device
JPS5267271A (en) Formation of through-hole onto semiconductor substrate
JPS5412265A (en) Production of semiconductor elements
JPS5385166A (en) Production of semiconductor device
JPS5419367A (en) Production of semiconductor device
JPS5421272A (en) Metal photo mask
JPS5258472A (en) Selective oxidation
JPS52111382A (en) Photo-mask producing for semi-conductor
JPS53108773A (en) Production of semiconductor device
JPS5251872A (en) Production of semiconductor device
JPS5267983A (en) Semiconductor unit
JPS52130292A (en) Patterning method
JPS53121466A (en) Manufacture for semiconductor device
JPS53121468A (en) Manufacture for semiconductor device
JPS5211762A (en) Method of manufacturing semiconductor devices
JPS53106575A (en) Production of photoetching mask for production of semiconductor device
JPS53118990A (en) Manufacture for resistor
JPS53124993A (en) Production of semiconductor device
JPS5428580A (en) Manufacture of semiconductor device