JPS5413778A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5413778A
JPS5413778A JP7935077A JP7935077A JPS5413778A JP S5413778 A JPS5413778 A JP S5413778A JP 7935077 A JP7935077 A JP 7935077A JP 7935077 A JP7935077 A JP 7935077A JP S5413778 A JPS5413778 A JP S5413778A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
blurs
eliminate
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7935077A
Other languages
Japanese (ja)
Inventor
Hiroshi Koshimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP7935077A priority Critical patent/JPS5413778A/en
Publication of JPS5413778A publication Critical patent/JPS5413778A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To eliminate blurs of photo resist pattern edges by treating a substrate in inert gas plasma while heating the same.
COPYRIGHT: (C)1979,JPO&Japio
JP7935077A 1977-07-01 1977-07-01 Production of semiconductor device Pending JPS5413778A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7935077A JPS5413778A (en) 1977-07-01 1977-07-01 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7935077A JPS5413778A (en) 1977-07-01 1977-07-01 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5413778A true JPS5413778A (en) 1979-02-01

Family

ID=13687443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7935077A Pending JPS5413778A (en) 1977-07-01 1977-07-01 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5413778A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5895826A (en) * 1981-12-02 1983-06-07 Toppan Printing Co Ltd Forming method for pattern
JP2013149934A (en) * 2011-12-22 2013-08-01 Dainippon Screen Mfg Co Ltd Substrate processing method and substrate processing apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5895826A (en) * 1981-12-02 1983-06-07 Toppan Printing Co Ltd Forming method for pattern
JP2013149934A (en) * 2011-12-22 2013-08-01 Dainippon Screen Mfg Co Ltd Substrate processing method and substrate processing apparatus

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