JPS5397791A - Production of semiconductor integrated circuit device - Google Patents

Production of semiconductor integrated circuit device

Info

Publication number
JPS5397791A
JPS5397791A JP1276277A JP1276277A JPS5397791A JP S5397791 A JPS5397791 A JP S5397791A JP 1276277 A JP1276277 A JP 1276277A JP 1276277 A JP1276277 A JP 1276277A JP S5397791 A JPS5397791 A JP S5397791A
Authority
JP
Japan
Prior art keywords
production
integrated circuit
semiconductor integrated
circuit device
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1276277A
Other languages
Japanese (ja)
Inventor
Kunio Aomura
Kuniyuki Hamano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP1276277A priority Critical patent/JPS5397791A/en
Publication of JPS5397791A publication Critical patent/JPS5397791A/en
Pending legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To utilize remaining regions for resistor elements or wirings by selectively implanting O2 ions to the poly-Si thin film on substrate surface and converting said film to SiO2.
COPYRIGHT: (C)1978,JPO&Japio
JP1276277A 1977-02-07 1977-02-07 Production of semiconductor integrated circuit device Pending JPS5397791A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1276277A JPS5397791A (en) 1977-02-07 1977-02-07 Production of semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1276277A JPS5397791A (en) 1977-02-07 1977-02-07 Production of semiconductor integrated circuit device

Publications (1)

Publication Number Publication Date
JPS5397791A true JPS5397791A (en) 1978-08-26

Family

ID=11814401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1276277A Pending JPS5397791A (en) 1977-02-07 1977-02-07 Production of semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPS5397791A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55117264A (en) * 1979-03-01 1980-09-09 Nec Corp Semiconductor device
US4965214A (en) * 1987-07-31 1990-10-23 Samsung Electronics Co., Ltd. Method for manufacturing poly-crystal sillicon having high resistance

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55117264A (en) * 1979-03-01 1980-09-09 Nec Corp Semiconductor device
US4965214A (en) * 1987-07-31 1990-10-23 Samsung Electronics Co., Ltd. Method for manufacturing poly-crystal sillicon having high resistance

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