JPS52130288A - Patterning method - Google Patents
Patterning methodInfo
- Publication number
- JPS52130288A JPS52130288A JP4658776A JP4658776A JPS52130288A JP S52130288 A JPS52130288 A JP S52130288A JP 4658776 A JP4658776 A JP 4658776A JP 4658776 A JP4658776 A JP 4658776A JP S52130288 A JPS52130288 A JP S52130288A
- Authority
- JP
- Japan
- Prior art keywords
- patterning method
- less
- hindrances
- patters
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To make patters which have less foreign matter and defects and give less hindrances in later processes by shielding the outside circumferential part of a wafer having mask patterns of resist, at the time of ion processing.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4658776A JPS52130288A (en) | 1976-04-26 | 1976-04-26 | Patterning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4658776A JPS52130288A (en) | 1976-04-26 | 1976-04-26 | Patterning method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52130288A true JPS52130288A (en) | 1977-11-01 |
JPS6153849B2 JPS6153849B2 (en) | 1986-11-19 |
Family
ID=12751418
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4658776A Granted JPS52130288A (en) | 1976-04-26 | 1976-04-26 | Patterning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52130288A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS554937A (en) * | 1978-06-27 | 1980-01-14 | Fujitsu Ltd | Dry etching method |
JPS6042832A (en) * | 1983-08-18 | 1985-03-07 | Matsushita Electric Ind Co Ltd | Ion beam device |
-
1976
- 1976-04-26 JP JP4658776A patent/JPS52130288A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS554937A (en) * | 1978-06-27 | 1980-01-14 | Fujitsu Ltd | Dry etching method |
JPS6350854B2 (en) * | 1978-06-27 | 1988-10-12 | Fujitsu Ltd | |
JPS6042832A (en) * | 1983-08-18 | 1985-03-07 | Matsushita Electric Ind Co Ltd | Ion beam device |
JPH0347573B2 (en) * | 1983-08-18 | 1991-07-19 | Matsushita Electric Ind Co Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPS6153849B2 (en) | 1986-11-19 |
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