JPS52130288A - Patterning method - Google Patents

Patterning method

Info

Publication number
JPS52130288A
JPS52130288A JP4658776A JP4658776A JPS52130288A JP S52130288 A JPS52130288 A JP S52130288A JP 4658776 A JP4658776 A JP 4658776A JP 4658776 A JP4658776 A JP 4658776A JP S52130288 A JPS52130288 A JP S52130288A
Authority
JP
Japan
Prior art keywords
patterning method
less
hindrances
patters
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4658776A
Other languages
Japanese (ja)
Other versions
JPS6153849B2 (en
Inventor
Norikazu Tsumita
Masaki Takahashi
Hideki Nishida
Koji Yamada
Yutaka Sugita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4658776A priority Critical patent/JPS52130288A/en
Publication of JPS52130288A publication Critical patent/JPS52130288A/en
Publication of JPS6153849B2 publication Critical patent/JPS6153849B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To make patters which have less foreign matter and defects and give less hindrances in later processes by shielding the outside circumferential part of a wafer having mask patterns of resist, at the time of ion processing.
COPYRIGHT: (C)1977,JPO&Japio
JP4658776A 1976-04-26 1976-04-26 Patterning method Granted JPS52130288A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4658776A JPS52130288A (en) 1976-04-26 1976-04-26 Patterning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4658776A JPS52130288A (en) 1976-04-26 1976-04-26 Patterning method

Publications (2)

Publication Number Publication Date
JPS52130288A true JPS52130288A (en) 1977-11-01
JPS6153849B2 JPS6153849B2 (en) 1986-11-19

Family

ID=12751418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4658776A Granted JPS52130288A (en) 1976-04-26 1976-04-26 Patterning method

Country Status (1)

Country Link
JP (1) JPS52130288A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS554937A (en) * 1978-06-27 1980-01-14 Fujitsu Ltd Dry etching method
JPS6042832A (en) * 1983-08-18 1985-03-07 Matsushita Electric Ind Co Ltd Ion beam device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS554937A (en) * 1978-06-27 1980-01-14 Fujitsu Ltd Dry etching method
JPS6350854B2 (en) * 1978-06-27 1988-10-12 Fujitsu Ltd
JPS6042832A (en) * 1983-08-18 1985-03-07 Matsushita Electric Ind Co Ltd Ion beam device
JPH0347573B2 (en) * 1983-08-18 1991-07-19 Matsushita Electric Ind Co Ltd

Also Published As

Publication number Publication date
JPS6153849B2 (en) 1986-11-19

Similar Documents

Publication Publication Date Title
JPS5371563A (en) Automatic inspection correcting method for mask
JPS5276088A (en) System for inspecting defects of pattern having directivity
JPS5332759A (en) Precision coordinate position detection and position control unit by composite diffration grating method
JPS5211774A (en) Method of detecting relative position of patterns
JPS5339075A (en) Step and repeat exposure method of masks
JPS5223263A (en) Method of manufacturing semiconductor device
JPS52130288A (en) Patterning method
JPS51126073A (en) Pattern printing equpment made available by photo-etching method
JPS5228267A (en) Minute processing
JPS5373073A (en) Treatment method for photo resist
JPS5251870A (en) Electron bean exposure method
JPS5362474A (en) Cleaning method of metal photo mask
JPS5431282A (en) Pattern formation method
JPS52143772A (en) Alignment method of masks using special reference marks
JPS51139267A (en) Photo-mask
JPS51148370A (en) Electron ray exposure method
JPS5380168A (en) Exposure method for electronic beam
JPS52152171A (en) Wafer alignment method
JPS5299775A (en) Pattern exposing method
JPS51126779A (en) Fine pattern processing method
JPS5330799A (en) Resist exposure
JPS5381083A (en) Focusing method of projection exposure apparatus
JPS5244571A (en) Method of forming fine pattern
JPS5240072A (en) Atmosphere gas substitution method at exposure of photoresist
JPS52119079A (en) Electron beam exposure