JPS5632142A - Multichip constitution reticle - Google Patents

Multichip constitution reticle

Info

Publication number
JPS5632142A
JPS5632142A JP10739579A JP10739579A JPS5632142A JP S5632142 A JPS5632142 A JP S5632142A JP 10739579 A JP10739579 A JP 10739579A JP 10739579 A JP10739579 A JP 10739579A JP S5632142 A JPS5632142 A JP S5632142A
Authority
JP
Japan
Prior art keywords
reticle
pattern
manufacturing
patterns
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10739579A
Other languages
Japanese (ja)
Inventor
Nobuki Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10739579A priority Critical patent/JPS5632142A/en
Publication of JPS5632142A publication Critical patent/JPS5632142A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Abstract

PURPOSE:To improve the manufacturing workability of masks by forming the reticles for manufacturing the pattern printing masks used at the manufacture of semiconductor integrated circuits by forming plural kinds of chip patterns on one reticle. CONSTITUTION:A reticle for manufacturing the printing masks used at the manufacture of semiconductor integrated circuits is constituted by a assuring plural pattern regions 3, 4, 5, 6, etc. on one sheet of a glass plate 1, and forming respectively plural kinds of patterns in these pattern regions. For example, 3 forms a pattern for device chips, and 4 a pattern for monitor chips. 5, 6 form patterns for wafer aligners. Hence, at the time of manufacturing master masks, reticle exchanging works are decreased to a fraction of those by conventional 1 chip pattern/1 reticle type, and the steps of reticle cleaning at the setting of reticles are considerably reduced.
JP10739579A 1979-08-23 1979-08-23 Multichip constitution reticle Pending JPS5632142A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10739579A JPS5632142A (en) 1979-08-23 1979-08-23 Multichip constitution reticle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10739579A JPS5632142A (en) 1979-08-23 1979-08-23 Multichip constitution reticle

Publications (1)

Publication Number Publication Date
JPS5632142A true JPS5632142A (en) 1981-04-01

Family

ID=14458046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10739579A Pending JPS5632142A (en) 1979-08-23 1979-08-23 Multichip constitution reticle

Country Status (1)

Country Link
JP (1) JPS5632142A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6275636A (en) * 1985-09-30 1987-04-07 Hoya Corp Transfer mask and pattern forming method
WO2004040372A1 (en) * 2002-11-01 2004-05-13 Systems On Silicon Manufacturing Co. Pte. Ltd. Multi-image reticles

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5226902A (en) * 1975-08-25 1977-02-28 Hitachi Ltd Method of making photomask pattern
JPS5339075A (en) * 1976-09-22 1978-04-10 Hitachi Ltd Step and repeat exposure method of masks

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5226902A (en) * 1975-08-25 1977-02-28 Hitachi Ltd Method of making photomask pattern
JPS5339075A (en) * 1976-09-22 1978-04-10 Hitachi Ltd Step and repeat exposure method of masks

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6275636A (en) * 1985-09-30 1987-04-07 Hoya Corp Transfer mask and pattern forming method
WO2004040372A1 (en) * 2002-11-01 2004-05-13 Systems On Silicon Manufacturing Co. Pte. Ltd. Multi-image reticles
WO2004040373A1 (en) * 2002-11-01 2004-05-13 Systems On Silicon Manufacturing Co. Pte. Ltd. Multi-image reticles

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