JPS55140839A - Mask and its preparation - Google Patents

Mask and its preparation

Info

Publication number
JPS55140839A
JPS55140839A JP4902979A JP4902979A JPS55140839A JP S55140839 A JPS55140839 A JP S55140839A JP 4902979 A JP4902979 A JP 4902979A JP 4902979 A JP4902979 A JP 4902979A JP S55140839 A JPS55140839 A JP S55140839A
Authority
JP
Japan
Prior art keywords
mask
reticle
pattern
printing
plural
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4902979A
Other languages
Japanese (ja)
Inventor
Soichi Tsuuzawa
Takao Kawanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4902979A priority Critical patent/JPS55140839A/en
Publication of JPS55140839A publication Critical patent/JPS55140839A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To prepare a mask for reduction mask water aligner with high precision and good yield, by using a reticle having a device pattern plural times as large as the final size and a reticle having a positioning mark in printing. CONSTITUTION:A pattern generator forms reticle 7 having device pattern 2 plural times (e.g., 10 times) as large as the final size corresponding to one pattern, and reticle 8 having pattern 3 of a positioning mark as same as pattern 2 in magnification. A mask preparing apparatus having 1:1 optical system and a step and repeat mechanism makes mask 9 by printing plural patterns as same as reticle 7 from this in a line, and then, prints patterns 3 for positioning on the scribed line of pattern 9 alreadly printed, by exchanging reticle 7 for reticle 8 to form mask 10 (mask for reduction mask wafer aligner).
JP4902979A 1979-04-23 1979-04-23 Mask and its preparation Pending JPS55140839A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4902979A JPS55140839A (en) 1979-04-23 1979-04-23 Mask and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4902979A JPS55140839A (en) 1979-04-23 1979-04-23 Mask and its preparation

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP60099568A Division JPS612155A (en) 1985-05-13 1985-05-13 Plate for exposure
JP62024501A Division JPS62247372A (en) 1987-02-06 1987-02-06 Method for reduced projection exposure

Publications (1)

Publication Number Publication Date
JPS55140839A true JPS55140839A (en) 1980-11-04

Family

ID=12819662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4902979A Pending JPS55140839A (en) 1979-04-23 1979-04-23 Mask and its preparation

Country Status (1)

Country Link
JP (1) JPS55140839A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61168227A (en) * 1985-01-21 1986-07-29 Mitsubishi Electric Corp Substrate for exposure of minute pattern and apparatus for exposing minute pattern
JPH02242251A (en) * 1989-03-15 1990-09-26 Fujitsu Ltd Production of reticle

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61168227A (en) * 1985-01-21 1986-07-29 Mitsubishi Electric Corp Substrate for exposure of minute pattern and apparatus for exposing minute pattern
JPH02242251A (en) * 1989-03-15 1990-09-26 Fujitsu Ltd Production of reticle

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