JPS55156949A - Screen printing method - Google Patents

Screen printing method

Info

Publication number
JPS55156949A
JPS55156949A JP6382279A JP6382279A JPS55156949A JP S55156949 A JPS55156949 A JP S55156949A JP 6382279 A JP6382279 A JP 6382279A JP 6382279 A JP6382279 A JP 6382279A JP S55156949 A JPS55156949 A JP S55156949A
Authority
JP
Japan
Prior art keywords
mask
positioning
wafer
substrate
moved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6382279A
Other languages
Japanese (ja)
Inventor
Masaaki Takahashi
Yutaka Misawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6382279A priority Critical patent/JPS55156949A/en
Publication of JPS55156949A publication Critical patent/JPS55156949A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To enable high precision positioning, by relatively positioning a screen mask to the substrate to be patterned in the presence of the second mask in patterning hybrid IC, etc. by the screen printing method.
CONSTITUTION: In the method for forming a pattern on a substrate by screen printing with positioning, the relative positions between screen mask 31 and emulsion mask 32 are determined with a microscope 33. Mask 32 as the second mask is moved in parallel to the wafer position to be positioned, fixed to the position of wafer holder 36 with semiconductor wafer 35 or the like on it, substrate 35 of wafer 35 to be patterned is positioned with microscope 33, and fixed to holder 36. Holder 36 is moved in parallel, and fixed to the mask registering position, moved up and down to regulate the clearance between mask 31 and wafer 35. Pringing is carried out and substrate 35 is removed. The second print and following prints can be made only by positioning using mask 32, permitting operation to be made irrespective of positioning even when mask 31 is stained in printing ink.
COPYRIGHT: (C)1980,JPO&Japio
JP6382279A 1979-05-25 1979-05-25 Screen printing method Pending JPS55156949A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6382279A JPS55156949A (en) 1979-05-25 1979-05-25 Screen printing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6382279A JPS55156949A (en) 1979-05-25 1979-05-25 Screen printing method

Publications (1)

Publication Number Publication Date
JPS55156949A true JPS55156949A (en) 1980-12-06

Family

ID=13240434

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6382279A Pending JPS55156949A (en) 1979-05-25 1979-05-25 Screen printing method

Country Status (1)

Country Link
JP (1) JPS55156949A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61281583A (en) * 1985-06-07 1986-12-11 株式会社 小野測器 Lamination of circuit formation board and mask film
JPS62145248A (en) * 1985-12-19 1987-06-29 Sanee Giken Kk Automatic exposure device
JPH0347794A (en) * 1989-07-14 1991-02-28 Murata Mfg Co Ltd Screen printing method and method and apparatus for preparing printing plate
CN110306372A (en) * 2019-05-07 2019-10-08 苏州印丝特数码科技有限公司 A kind of production method of large format double-side different color silk broadcloth scarf

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61281583A (en) * 1985-06-07 1986-12-11 株式会社 小野測器 Lamination of circuit formation board and mask film
JPS62145248A (en) * 1985-12-19 1987-06-29 Sanee Giken Kk Automatic exposure device
JPH0347794A (en) * 1989-07-14 1991-02-28 Murata Mfg Co Ltd Screen printing method and method and apparatus for preparing printing plate
CN110306372A (en) * 2019-05-07 2019-10-08 苏州印丝特数码科技有限公司 A kind of production method of large format double-side different color silk broadcloth scarf
CN110306372B (en) * 2019-05-07 2021-10-22 苏州印丝特数码科技有限公司 Method for manufacturing large-width double-sided heterochromatic silk scarf

Similar Documents

Publication Publication Date Title
GB1479867A (en) Process for preparing waterless lithographic printing masters by ink jet printing means
SG103894A1 (en) Method of removing assist features utilized to improve process latitude
JPS55156949A (en) Screen printing method
JPS5384724A (en) Color printer
JPS5321576A (en) Mask for x-ray exposure
JPS5788451A (en) Photomask
JPS5748234A (en) Position adjusting method of semiconductor device
JPS57115389A (en) Printing method for minute pattern
JPS5511857A (en) Printing method
JPS5215266A (en) Pattern printing unit
JPS5582009A (en) Alignment system for tested printed board
JPS55140839A (en) Mask and its preparation
JPS54150977A (en) Double-side printing method for semiconductor substrate
JPS52143773A (en) Reduction projecting and printing apparatus
JPS5739978A (en) Printer
JPS5335377A (en) Marking method of semiconductor device
JPS55128477A (en) Preparing method for heat-sensitive head
JPS56160039A (en) Printing device
JPS55138841A (en) Method of forming pattern on semiconductor element
JPS5218176A (en) Production method of semiconductor device
JPS5254379A (en) Method of registering front and rear patterns
JPS56160037A (en) Printing device
JPS5628862A (en) Mark printer
JPS51140482A (en) Device for printing wafer index
JPS5497374A (en) Exposure method of semiconductor substrate