JPS54372B2 - - Google Patents
Info
- Publication number
- JPS54372B2 JPS54372B2 JP13579275A JP13579275A JPS54372B2 JP S54372 B2 JPS54372 B2 JP S54372B2 JP 13579275 A JP13579275 A JP 13579275A JP 13579275 A JP13579275 A JP 13579275A JP S54372 B2 JPS54372 B2 JP S54372B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50135792A JPS5259580A (en) | 1975-11-11 | 1975-11-11 | Photo etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50135792A JPS5259580A (en) | 1975-11-11 | 1975-11-11 | Photo etching method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5259580A JPS5259580A (en) | 1977-05-17 |
JPS54372B2 true JPS54372B2 (en) | 1979-01-10 |
Family
ID=15159929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50135792A Granted JPS5259580A (en) | 1975-11-11 | 1975-11-11 | Photo etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5259580A (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5437580A (en) * | 1977-08-30 | 1979-03-20 | Nec Corp | Dry etching method and target film used for it |
JPS55147796U (en) * | 1979-04-11 | 1980-10-23 | ||
JPS56137634A (en) * | 1980-03-29 | 1981-10-27 | Rikagaku Kenkyusho | Pattern forming |
JPS6122625A (en) * | 1984-07-10 | 1986-01-31 | Toshiba Corp | Pattern forming method |
KR920004538B1 (en) * | 1988-08-11 | 1992-06-08 | 삼성전자 주식회사 | Manufacturing method of semiconductor device |
JP4496631B2 (en) * | 2000-09-27 | 2010-07-07 | 富士通株式会社 | Manufacturing method of electronic device |
JP4899871B2 (en) * | 2007-01-09 | 2012-03-21 | 凸版印刷株式会社 | Resist pattern forming method, electronic device manufacturing method, and semiconductor integrated circuit manufacturing method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4940874A (en) * | 1972-08-25 | 1974-04-17 | ||
JPS5255869A (en) * | 1975-11-01 | 1977-05-07 | Fujitsu Ltd | Production of semiconductor device |
-
1975
- 1975-11-11 JP JP50135792A patent/JPS5259580A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4940874A (en) * | 1972-08-25 | 1974-04-17 | ||
JPS5255869A (en) * | 1975-11-01 | 1977-05-07 | Fujitsu Ltd | Production of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS5259580A (en) | 1977-05-17 |