JPS54372B2 - - Google Patents

Info

Publication number
JPS54372B2
JPS54372B2 JP13579275A JP13579275A JPS54372B2 JP S54372 B2 JPS54372 B2 JP S54372B2 JP 13579275 A JP13579275 A JP 13579275A JP 13579275 A JP13579275 A JP 13579275A JP S54372 B2 JPS54372 B2 JP S54372B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13579275A
Other languages
Japanese (ja)
Other versions
JPS5259580A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP50135792A priority Critical patent/JPS5259580A/en
Publication of JPS5259580A publication Critical patent/JPS5259580A/en
Publication of JPS54372B2 publication Critical patent/JPS54372B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP50135792A 1975-11-11 1975-11-11 Photo etching method Granted JPS5259580A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50135792A JPS5259580A (en) 1975-11-11 1975-11-11 Photo etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50135792A JPS5259580A (en) 1975-11-11 1975-11-11 Photo etching method

Publications (2)

Publication Number Publication Date
JPS5259580A JPS5259580A (en) 1977-05-17
JPS54372B2 true JPS54372B2 (en) 1979-01-10

Family

ID=15159929

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50135792A Granted JPS5259580A (en) 1975-11-11 1975-11-11 Photo etching method

Country Status (1)

Country Link
JP (1) JPS5259580A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5437580A (en) * 1977-08-30 1979-03-20 Nec Corp Dry etching method and target film used for it
JPS55147796U (en) * 1979-04-11 1980-10-23
JPS56137634A (en) * 1980-03-29 1981-10-27 Rikagaku Kenkyusho Pattern forming
JPS6122625A (en) * 1984-07-10 1986-01-31 Toshiba Corp Pattern forming method
KR920004538B1 (en) * 1988-08-11 1992-06-08 삼성전자 주식회사 Manufacturing method of semiconductor device
JP4496631B2 (en) * 2000-09-27 2010-07-07 富士通株式会社 Manufacturing method of electronic device
JP4899871B2 (en) * 2007-01-09 2012-03-21 凸版印刷株式会社 Resist pattern forming method, electronic device manufacturing method, and semiconductor integrated circuit manufacturing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4940874A (en) * 1972-08-25 1974-04-17
JPS5255869A (en) * 1975-11-01 1977-05-07 Fujitsu Ltd Production of semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4940874A (en) * 1972-08-25 1974-04-17
JPS5255869A (en) * 1975-11-01 1977-05-07 Fujitsu Ltd Production of semiconductor device

Also Published As

Publication number Publication date
JPS5259580A (en) 1977-05-17

Similar Documents

Publication Publication Date Title
CH596345A5 (en)
JPS5343257B2 (en)
JPS54372B2 (en)
JPS5439881Y2 (en)
JPS5246429U (en)
JPS5548960B2 (en)
JPS5415253B2 (en)
JPS5542668Y2 (en)
JPS5547324B2 (en)
JPS5190170U (en)
JPS5272995U (en)
JPS5228343U (en)
JPS51100520U (en)
CH598501A5 (en)
CH605113A5 (en)
CH595613A5 (en)
CH595672A5 (en)
CH596591B5 (en)
CH596809A5 (en)
CH597004A5 (en)
CH597031A5 (en)
CH597786A5 (en)
CH598113A5 (en)
CH598409A5 (en)
CH601361A5 (en)