JPS52131474A - Wafer chuck for mask aligner - Google Patents

Wafer chuck for mask aligner

Info

Publication number
JPS52131474A
JPS52131474A JP4766576A JP4766576A JPS52131474A JP S52131474 A JPS52131474 A JP S52131474A JP 4766576 A JP4766576 A JP 4766576A JP 4766576 A JP4766576 A JP 4766576A JP S52131474 A JPS52131474 A JP S52131474A
Authority
JP
Japan
Prior art keywords
mask aligner
wafer chuck
mask
wafer
aligner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4766576A
Other languages
Japanese (ja)
Inventor
Susumu Komoriya
Hiroshi Maejima
Kiyoshi Yoshida
Hiroshi Nishizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4766576A priority Critical patent/JPS52131474A/en
Publication of JPS52131474A publication Critical patent/JPS52131474A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To eliminate the shift discrepancy between the mask and wafer at the contact-separation action time and also to reduce the action frequency, by supporting the chuck section of the mask aligner with an elastic disk.
COPYRIGHT: (C)1977,JPO&Japio
JP4766576A 1976-04-28 1976-04-28 Wafer chuck for mask aligner Pending JPS52131474A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4766576A JPS52131474A (en) 1976-04-28 1976-04-28 Wafer chuck for mask aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4766576A JPS52131474A (en) 1976-04-28 1976-04-28 Wafer chuck for mask aligner

Publications (1)

Publication Number Publication Date
JPS52131474A true JPS52131474A (en) 1977-11-04

Family

ID=12781543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4766576A Pending JPS52131474A (en) 1976-04-28 1976-04-28 Wafer chuck for mask aligner

Country Status (1)

Country Link
JP (1) JPS52131474A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57109330A (en) * 1980-12-26 1982-07-07 Hitachi Ltd Mask aliner
JPS605118U (en) * 1983-06-21 1985-01-14 日本電気株式会社 Alignment mechanism for exposure equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57109330A (en) * 1980-12-26 1982-07-07 Hitachi Ltd Mask aliner
JPS605118U (en) * 1983-06-21 1985-01-14 日本電気株式会社 Alignment mechanism for exposure equipment

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