JPS5598830A - Drawing device for pattern by electron beam - Google Patents

Drawing device for pattern by electron beam

Info

Publication number
JPS5598830A
JPS5598830A JP695679A JP695679A JPS5598830A JP S5598830 A JPS5598830 A JP S5598830A JP 695679 A JP695679 A JP 695679A JP 695679 A JP695679 A JP 695679A JP S5598830 A JPS5598830 A JP S5598830A
Authority
JP
Japan
Prior art keywords
circuit
pattern
electron beam
circuits
supplied
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP695679A
Other languages
Japanese (ja)
Inventor
Hisashi Sugiyama
Kyozo Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP695679A priority Critical patent/JPS5598830A/en
Publication of JPS5598830A publication Critical patent/JPS5598830A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To accurately and rapidly draw a pattern even for an LSI having a large number of patterns, by dynamically changing electron beam irradiation time and controlling the quantity of irradiated electrical current. CONSTITUTION:An electron beam pattern drawing device is provided with a beam current controller 9 for regulating the grid voltage of an electron gun 1, a beam deflection circuit 5 for controlling irradiation time and an electron beam intermission circuit 8. The controller 9 and the circuits 5, 8 are collectively regulated by a control circuit 10. Control signals are supplied from the circuits 8, 5 into a cylinder 2 containing the electron gun 1 and a workpiece 3 set on a workpiece carriage 4. A D/A conversion circuit 11, which is controlled by an elecrtonic computer 13, is connected to the circuit 10. Pattern drawing information is supplied to the computer 13 from a detection signal amplifier 6, a carriage control circut 7 and an interface 12. A pattern is thus drawn at high integration, accuracy and velocity.
JP695679A 1979-01-23 1979-01-23 Drawing device for pattern by electron beam Pending JPS5598830A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP695679A JPS5598830A (en) 1979-01-23 1979-01-23 Drawing device for pattern by electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP695679A JPS5598830A (en) 1979-01-23 1979-01-23 Drawing device for pattern by electron beam

Publications (1)

Publication Number Publication Date
JPS5598830A true JPS5598830A (en) 1980-07-28

Family

ID=11652667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP695679A Pending JPS5598830A (en) 1979-01-23 1979-01-23 Drawing device for pattern by electron beam

Country Status (1)

Country Link
JP (1) JPS5598830A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5856418A (en) * 1981-09-30 1983-04-04 Fujitsu Ltd Electron beam exposure apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117578A (en) * 1976-03-30 1977-10-03 Fujitsu Ltd Electron beam exposing method
JPS53120277A (en) * 1977-03-29 1978-10-20 Nec Corp Electron beam exposure device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117578A (en) * 1976-03-30 1977-10-03 Fujitsu Ltd Electron beam exposing method
JPS53120277A (en) * 1977-03-29 1978-10-20 Nec Corp Electron beam exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5856418A (en) * 1981-09-30 1983-04-04 Fujitsu Ltd Electron beam exposure apparatus

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