JPS54100263A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS54100263A JPS54100263A JP647978A JP647978A JPS54100263A JP S54100263 A JPS54100263 A JP S54100263A JP 647978 A JP647978 A JP 647978A JP 647978 A JP647978 A JP 647978A JP S54100263 A JPS54100263 A JP S54100263A
- Authority
- JP
- Japan
- Prior art keywords
- time
- irradiation
- sectional area
- cross
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
Abstract
PURPOSE:To shorten both the decision time and the exposure time by deciding the cross-sectional area of the beam or the length of the short side through the electric circuit and also varying the beam irradiation quantity. CONSTITUTION:Deflecting signals X1 and Y1 to decide the beam cross-sectional area are multiplied 22 and amplified 21 by electric computer 16 and via D/A conversion 20. The irradiation time is decided 18 by the multiplication signal, and the signal of irradiation optimum to the area is transmitted to data circuit 17 via A/D converter 19. Circuit 17 supplies the information of the pulse duration and interval based on the irradiation cut-off time signal given from the electric computer and then generates 17a the pulse to supply it to blanking electrode 15. Electrode 15 gives the ON/OFF control to the beam. Then the cross-sectional area of the electron beam is formed into a size equivalent to the product of deflecting signals X1 and Y1, securing irradiation onto test sample 6 with the optimum time. With this method, the pattern data quantity can be reduced greatly, and both the decision time and the exposure time can be shortened.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP647978A JPS54100263A (en) | 1978-01-24 | 1978-01-24 | Electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP647978A JPS54100263A (en) | 1978-01-24 | 1978-01-24 | Electron beam exposure device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54100263A true JPS54100263A (en) | 1979-08-07 |
JPS5549419B2 JPS5549419B2 (en) | 1980-12-11 |
Family
ID=11639602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP647978A Granted JPS54100263A (en) | 1978-01-24 | 1978-01-24 | Electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54100263A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56133825A (en) * | 1980-03-21 | 1981-10-20 | Toshiba Corp | Electron beam device |
JPS5793528A (en) * | 1980-11-28 | 1982-06-10 | Ibm | Electron beam device |
JPS57121229A (en) * | 1981-01-21 | 1982-07-28 | Nippon Telegr & Teleph Corp <Ntt> | Electron beam drawing system |
JPS6489515A (en) * | 1987-09-30 | 1989-04-04 | Sharp Kk | Beam exposure device |
-
1978
- 1978-01-24 JP JP647978A patent/JPS54100263A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56133825A (en) * | 1980-03-21 | 1981-10-20 | Toshiba Corp | Electron beam device |
JPH0450732B2 (en) * | 1980-03-21 | 1992-08-17 | Tokyo Shibaura Electric Co | |
JPS5793528A (en) * | 1980-11-28 | 1982-06-10 | Ibm | Electron beam device |
JPS57121229A (en) * | 1981-01-21 | 1982-07-28 | Nippon Telegr & Teleph Corp <Ntt> | Electron beam drawing system |
JPS6489515A (en) * | 1987-09-30 | 1989-04-04 | Sharp Kk | Beam exposure device |
Also Published As
Publication number | Publication date |
---|---|
JPS5549419B2 (en) | 1980-12-11 |
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