JPS5560949A - Positioning mark for radiation working - Google Patents

Positioning mark for radiation working

Info

Publication number
JPS5560949A
JPS5560949A JP13328178A JP13328178A JPS5560949A JP S5560949 A JPS5560949 A JP S5560949A JP 13328178 A JP13328178 A JP 13328178A JP 13328178 A JP13328178 A JP 13328178A JP S5560949 A JPS5560949 A JP S5560949A
Authority
JP
Japan
Prior art keywords
film
chalocogenite
amorphous
mark
photo mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13328178A
Other languages
Japanese (ja)
Other versions
JPS5760623B2 (en
Inventor
Kyozo Sekikawa
Korehito Matsuda
Akira Yoshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP13328178A priority Critical patent/JPS5560949A/en
Publication of JPS5560949A publication Critical patent/JPS5560949A/en
Publication of JPS5760623B2 publication Critical patent/JPS5760623B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To reduce the number of manufacturing steps, make the manufacture simple and improve detection signal SN ratios by using amorphous chalocogenite as a positioning mark material in the production of a photo mask for electron beam lithography.
CONSTITUTION: Amorphous chalocogenite of Se 70W95atom%, Ge30W5atom% is used as a mark material. For example, an amorphous chalocogenite thin film 22 is formed to thicknesses of 2500W5000 Å through high-frequency sputtering or the like to a substrate (glass plate) 21, thence it is dipped in a silver nitrate solution or the like to form a thin Ag film 23. Ultraviolet rays are radiated via photo mask to this film 23 to diffuse Ag into the film 22. The portions other than the diffused portions are treated with an aqua regia base processing solution to get rid of the film 23, whereby a positioning mark 24 is formed. Next, a Cr film or the like 25 is formed through vapor deposition or the like over the entire surface to complete the photo mask with mark. The thickness of the Ag film is preferably 80W120 Å. That of the Cr film 25 is preferably about 500 Å. Amorphous chalocogenite has high reflectance to make the detection of the mark 24 easy.
COPYRIGHT: (C)1980,JPO&Japio
JP13328178A 1978-10-31 1978-10-31 Positioning mark for radiation working Granted JPS5560949A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13328178A JPS5560949A (en) 1978-10-31 1978-10-31 Positioning mark for radiation working

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13328178A JPS5560949A (en) 1978-10-31 1978-10-31 Positioning mark for radiation working

Publications (2)

Publication Number Publication Date
JPS5560949A true JPS5560949A (en) 1980-05-08
JPS5760623B2 JPS5760623B2 (en) 1982-12-20

Family

ID=15100964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13328178A Granted JPS5560949A (en) 1978-10-31 1978-10-31 Positioning mark for radiation working

Country Status (1)

Country Link
JP (1) JPS5560949A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6049627A (en) * 1983-08-29 1985-03-18 Mitsubishi Electric Corp Photo mask

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51113572A (en) * 1975-03-31 1976-10-06 Hitachi Ltd Centering method for electronic ray picture and the unit using the sai d method
JPS51120180A (en) * 1975-04-15 1976-10-21 Nippon Telegr & Teleph Corp <Ntt> Pattern printing device
JPS5211319A (en) * 1975-06-20 1977-01-28 Daihatsu Diesel Kk Supply and exhausting gas device of internal combustion engine

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51113572A (en) * 1975-03-31 1976-10-06 Hitachi Ltd Centering method for electronic ray picture and the unit using the sai d method
JPS51120180A (en) * 1975-04-15 1976-10-21 Nippon Telegr & Teleph Corp <Ntt> Pattern printing device
JPS5211319A (en) * 1975-06-20 1977-01-28 Daihatsu Diesel Kk Supply and exhausting gas device of internal combustion engine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6049627A (en) * 1983-08-29 1985-03-18 Mitsubishi Electric Corp Photo mask

Also Published As

Publication number Publication date
JPS5760623B2 (en) 1982-12-20

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