JPS5419648A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS5419648A JPS5419648A JP8477477A JP8477477A JPS5419648A JP S5419648 A JPS5419648 A JP S5419648A JP 8477477 A JP8477477 A JP 8477477A JP 8477477 A JP8477477 A JP 8477477A JP S5419648 A JPS5419648 A JP S5419648A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- multilayers
- simplification
- improvement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
PURPOSE: To enable extremely thin impurity layers to be formed in multilayers and achieve the simplification of process and the improvement of characteristics by performing ion radiation to the thin film deposited in a substrate semiconductor.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8477477A JPS5419648A (en) | 1977-07-15 | 1977-07-15 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8477477A JPS5419648A (en) | 1977-07-15 | 1977-07-15 | Production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5419648A true JPS5419648A (en) | 1979-02-14 |
Family
ID=13840014
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8477477A Pending JPS5419648A (en) | 1977-07-15 | 1977-07-15 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5419648A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9023720B2 (en) | 2010-08-26 | 2015-05-05 | Sen Corporation | Manufacturing method of semiconductor device |
-
1977
- 1977-07-15 JP JP8477477A patent/JPS5419648A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9023720B2 (en) | 2010-08-26 | 2015-05-05 | Sen Corporation | Manufacturing method of semiconductor device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5246784A (en) | Process for production of semiconductor device | |
JPS5249772A (en) | Process for production of semiconductor device | |
JPS5253658A (en) | Method of introducing impurity into semiconductor | |
JPS5419648A (en) | Production of semiconductor device | |
JPS5331983A (en) | Production of semiconductor substrates | |
JPS5331964A (en) | Production of semiconductor substrates | |
JPS5420671A (en) | Production of semiconductor devices | |
JPS5363871A (en) | Production of semiconductor device | |
JPS5240977A (en) | Process for production of semiconductor device | |
JPS51118381A (en) | Manufacturing process for semiconductor unit | |
JPS5258473A (en) | Production of semiconductor device | |
JPS5441673A (en) | Semiconductor device and its manufacture | |
JPS5440073A (en) | Film forming method | |
JPS5386177A (en) | Production of semiconductor device | |
JPS5418670A (en) | Manufacture of semiconductor device | |
JPS53129982A (en) | Production of mos type semiconductor devices | |
JPS5273673A (en) | Production of semiconductor device | |
JPS5219967A (en) | Semiconductor manufacturing process | |
JPS5263668A (en) | Production of semiconductor | |
JPS53115183A (en) | Production of semiconductor device | |
JPS5211762A (en) | Method of manufacturing semiconductor devices | |
JPS51126775A (en) | Semiconductor unit manufacturing process | |
JPS53142870A (en) | Manufacture for semiconductor device | |
JPS533168A (en) | Semiconductor evaporating apparatus | |
JPS5434755A (en) | Manufacture of semiconductor device |