JPS5518663A - Negative type metallic image formation method - Google Patents

Negative type metallic image formation method

Info

Publication number
JPS5518663A
JPS5518663A JP9220878A JP9220878A JPS5518663A JP S5518663 A JPS5518663 A JP S5518663A JP 9220878 A JP9220878 A JP 9220878A JP 9220878 A JP9220878 A JP 9220878A JP S5518663 A JPS5518663 A JP S5518663A
Authority
JP
Japan
Prior art keywords
negative type
type metallic
metallic image
amorphous chalcogenide
image formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9220878A
Other languages
Japanese (ja)
Other versions
JPS6261134B2 (en
Inventor
Hidekazu Inoue
Isamu Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP9220878A priority Critical patent/JPS5518663A/en
Publication of JPS5518663A publication Critical patent/JPS5518663A/en
Publication of JPS6261134B2 publication Critical patent/JPS6261134B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/58Processes for obtaining metallic images by vapour deposition or physical development

Abstract

PURPOSE:To form a negative type metallic image of high photosensitivity, by uniformly adding metallic ions to the thin film of an amorphous chalcogenide substance, exposing it to light to form an imagewise metal nucleus pattern, and physically developing the pattern using these nuclei as a catalyst. CONSTITUTION:The thin film of an amorphous chalcogenide substance, such as As2S3 is vapor deposited on a proper substrate to a thickness 300 to 3,000Angstrom by a vacuum evaporation method, this negative type metallic image formation material is immersed in a solution containing ions of a metal such as silver and an organic reductant such as hydroquinone, and exposed to a light in the wavelength region of optical absorption of the amorphous chalcogenide substance with an ultra-high pressure mercury lamp or the like. At the same time as this exposure, physical development proceeds to form a negative type metallic image, permitting also application to a print wiring plate.
JP9220878A 1978-07-28 1978-07-28 Negative type metallic image formation method Granted JPS5518663A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9220878A JPS5518663A (en) 1978-07-28 1978-07-28 Negative type metallic image formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9220878A JPS5518663A (en) 1978-07-28 1978-07-28 Negative type metallic image formation method

Publications (2)

Publication Number Publication Date
JPS5518663A true JPS5518663A (en) 1980-02-08
JPS6261134B2 JPS6261134B2 (en) 1987-12-19

Family

ID=14048018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9220878A Granted JPS5518663A (en) 1978-07-28 1978-07-28 Negative type metallic image formation method

Country Status (1)

Country Link
JP (1) JPS5518663A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0291440U (en) * 1988-12-29 1990-07-19

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS506322A (en) * 1972-11-15 1975-01-23

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS506322A (en) * 1972-11-15 1975-01-23

Also Published As

Publication number Publication date
JPS6261134B2 (en) 1987-12-19

Similar Documents

Publication Publication Date Title
GB1523535A (en) Selfsupporting masks
ES326362A1 (en) A procedure for the preparation of a plate in offset. (Machine-translation by Google Translate, not legally binding)
US4240737A (en) Processing of radiation sensitive devices
JPS5692536A (en) Pattern formation method
FR1548401A (en)
GB1323349A (en) Coloured transparent photo-mask and a method for producing the same
SE8104565L (en) IMPROVED BRIGHTNESS MATERIAL
JPS5630129A (en) Manufacture of photomask
JPS5518663A (en) Negative type metallic image formation method
FR2232781A1 (en) Prc5printing pla0e prodn. using laser beam - to form image by perforation of metallised plastic sheet, followed by photopolymsn.
US3222175A (en) Process for forming metallic nonsilver images
JPS5636648A (en) Photosensitive material and pattern forming method using it
ES326326A1 (en) A procedure for the preparation of a plate for printing in offset. (Machine-translation by Google Translate, not legally binding)
JPS5443681A (en) Electron beam light-exposing method
FR2637428A1 (en) FORBIDDEN ELECTRODE FOR SURFACE WAVE DEVICE AND METHOD FOR THE PRODUCTION THEREOF
JPS5492527A (en) Manufacture of metal foil having apertures
JPS5654440A (en) Photosensitive lithographic material and plate making method
JPS56149042A (en) Manufacture of gravure cylinder made of synthetic resin
JPS5594491A (en) Forming method for thick minute metal pattern
JPS6154212B2 (en)
JPS6481964A (en) Electrophotographic sensitive body
JPS57105739A (en) Production of mask
JPS5794750A (en) Formation of micropattern
ES449318A1 (en) Radiation sensitive materials
JPS561941A (en) Image forming method