JPS5636648A - Photosensitive material and pattern forming method using it - Google Patents

Photosensitive material and pattern forming method using it

Info

Publication number
JPS5636648A
JPS5636648A JP11265479A JP11265479A JPS5636648A JP S5636648 A JPS5636648 A JP S5636648A JP 11265479 A JP11265479 A JP 11265479A JP 11265479 A JP11265479 A JP 11265479A JP S5636648 A JPS5636648 A JP S5636648A
Authority
JP
Japan
Prior art keywords
photosensitive material
imidazole
methylimidazole
negative
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11265479A
Other languages
Japanese (ja)
Inventor
Hiromichi Tachikawa
Yonosuke Takahashi
Fumiaki Shinozaki
Tomoaki Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP11265479A priority Critical patent/JPS5636648A/en
Publication of JPS5636648A publication Critical patent/JPS5636648A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Abstract

PURPOSE:To enable an 0-quinone diazide type photosensitive material to be used in both negative and positive workings under the same processing conditions. CONSTITUTION:In the positive working of a photosensitive material contg. an o-quinone diazide compound and an imidazole deriv. in the photosensitive layer, the material is imagewise exposed and then developed with alkali. In the negative working, the material is heated to about 70-300 deg.C and irradiated with activated rays of light simultaneously with or after imagewise exposure, and then alkali development is carried out. Heating facilitates the insolubilization of the exposed part, and the irradiation enables the unexposed part to be removed by development. the imidazole deriv. includes imidazole, 2-methylimidazole, 2-ethylimidazole, 2,4-dimethylimidazole, N-methylimidazole and 2,4-diphenylimidazole.
JP11265479A 1979-09-03 1979-09-03 Photosensitive material and pattern forming method using it Pending JPS5636648A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11265479A JPS5636648A (en) 1979-09-03 1979-09-03 Photosensitive material and pattern forming method using it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11265479A JPS5636648A (en) 1979-09-03 1979-09-03 Photosensitive material and pattern forming method using it

Publications (1)

Publication Number Publication Date
JPS5636648A true JPS5636648A (en) 1981-04-09

Family

ID=14592130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11265479A Pending JPS5636648A (en) 1979-09-03 1979-09-03 Photosensitive material and pattern forming method using it

Country Status (1)

Country Link
JP (1) JPS5636648A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61200537A (en) * 1985-02-27 1986-09-05 イムテツク・プロダクツ・インコ−ポレ−テツド Method of elevating quality of picture for photoresist of positive by inversion of vapor diffusion image
JPS6235350A (en) * 1985-08-07 1987-02-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Photoresist with longer preservation life useful for image inversion
JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
US4904564A (en) * 1988-06-16 1990-02-27 International Business Machines Corporation Process for imaging multi-layer resist structure
US5320931A (en) * 1990-07-23 1994-06-14 Fuji Photo Film Co., Ltd. Light-sensitive composition

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108002A (en) * 1974-02-01 1975-08-26
JPS526528A (en) * 1975-06-30 1977-01-19 Ibm Method of forming resist film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108002A (en) * 1974-02-01 1975-08-26
JPS526528A (en) * 1975-06-30 1977-01-19 Ibm Method of forming resist film

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61200537A (en) * 1985-02-27 1986-09-05 イムテツク・プロダクツ・インコ−ポレ−テツド Method of elevating quality of picture for photoresist of positive by inversion of vapor diffusion image
JPS6235350A (en) * 1985-08-07 1987-02-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Photoresist with longer preservation life useful for image inversion
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method
US4904564A (en) * 1988-06-16 1990-02-27 International Business Machines Corporation Process for imaging multi-layer resist structure
US5320931A (en) * 1990-07-23 1994-06-14 Fuji Photo Film Co., Ltd. Light-sensitive composition

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