JPS5496374A - Automatic positioning device - Google Patents

Automatic positioning device

Info

Publication number
JPS5496374A
JPS5496374A JP279878A JP279878A JPS5496374A JP S5496374 A JPS5496374 A JP S5496374A JP 279878 A JP279878 A JP 279878A JP 279878 A JP279878 A JP 279878A JP S5496374 A JPS5496374 A JP S5496374A
Authority
JP
Japan
Prior art keywords
reticle
positioning
set voltage
voltage
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP279878A
Other languages
Japanese (ja)
Other versions
JPS6238853B2 (en
Inventor
Shinji Kuniyoshi
Toshishige Kurosaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP279878A priority Critical patent/JPS5496374A/en
Publication of JPS5496374A publication Critical patent/JPS5496374A/en
Publication of JPS6238853B2 publication Critical patent/JPS6238853B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)

Abstract

PURPOSE: To secure a high-speed and high-accuracy positionding with the positioning device which is used in the reduction projection exposure device for the integrated circuit pattern, by comparing the output voltage which detected photoelectrically the position of the positioning mark on the reticle with the set voltage of a fixed amount to control the fine shifting mechanism.
CONSTITUTION: Set voltage width 2 is given corresponding to the positioning accuracy of the reticle, and output voltage 3 of photoelectric microscope 1 is compared 4 then with set voltage width 2. Shifting stage 7 is moved via amplifier circuit 5 and motor driving circuit 6 so that voltage 3 may be within the range of the set voltage, and reticle 8 is vacuum-absorbed to be fixed on stage 7. The positions are detected via photoelectric microscope 1' and 1" for positioning cross- shaped pattern 9 and 10 on reticle 8 respectively. And the positioning of the reticle in the three directions x, y and θ each is carried out through driving of fine shifting mechanism 11.
COPYRIGHT: (C)1979,JPO&Japio
JP279878A 1978-01-17 1978-01-17 Automatic positioning device Granted JPS5496374A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP279878A JPS5496374A (en) 1978-01-17 1978-01-17 Automatic positioning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP279878A JPS5496374A (en) 1978-01-17 1978-01-17 Automatic positioning device

Publications (2)

Publication Number Publication Date
JPS5496374A true JPS5496374A (en) 1979-07-30
JPS6238853B2 JPS6238853B2 (en) 1987-08-20

Family

ID=11539385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP279878A Granted JPS5496374A (en) 1978-01-17 1978-01-17 Automatic positioning device

Country Status (1)

Country Link
JP (1) JPS5496374A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59138908U (en) * 1983-03-08 1984-09-17 東北金属工業株式会社 Mark sense positioning device
JPS59170841A (en) * 1983-03-17 1984-09-27 Nippon Seiko Kk Positioning device of exposing device
JPH04299332A (en) * 1991-03-28 1992-10-22 Ushio Inc Film exposing method
EP1014229A2 (en) * 1998-12-14 2000-06-28 Seiko Epson Corporation Electronic apparatus and control method for electronic apparatus
EP1014228A2 (en) * 1998-12-14 2000-06-28 Seiko Epson Corporation Portable electronic device and control method for the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51120180A (en) * 1975-04-15 1976-10-21 Nippon Telegr & Teleph Corp <Ntt> Pattern printing device
JPS52143773A (en) * 1976-05-26 1977-11-30 Hitachi Ltd Reduction projecting and printing apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51120180A (en) * 1975-04-15 1976-10-21 Nippon Telegr & Teleph Corp <Ntt> Pattern printing device
JPS52143773A (en) * 1976-05-26 1977-11-30 Hitachi Ltd Reduction projecting and printing apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59138908U (en) * 1983-03-08 1984-09-17 東北金属工業株式会社 Mark sense positioning device
JPS59170841A (en) * 1983-03-17 1984-09-27 Nippon Seiko Kk Positioning device of exposing device
JPH04299332A (en) * 1991-03-28 1992-10-22 Ushio Inc Film exposing method
EP1014229A2 (en) * 1998-12-14 2000-06-28 Seiko Epson Corporation Electronic apparatus and control method for electronic apparatus
EP1014228A2 (en) * 1998-12-14 2000-06-28 Seiko Epson Corporation Portable electronic device and control method for the same
EP1014229A3 (en) * 1998-12-14 2003-04-16 Seiko Epson Corporation Electronic apparatus and control method for electronic apparatus
EP1014228A3 (en) * 1998-12-14 2003-04-16 Seiko Epson Corporation Portable electronic device and control method for the same

Also Published As

Publication number Publication date
JPS6238853B2 (en) 1987-08-20

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