JPS5534430A - Positioning method in electron beam exposure - Google Patents

Positioning method in electron beam exposure

Info

Publication number
JPS5534430A
JPS5534430A JP10646878A JP10646878A JPS5534430A JP S5534430 A JPS5534430 A JP S5534430A JP 10646878 A JP10646878 A JP 10646878A JP 10646878 A JP10646878 A JP 10646878A JP S5534430 A JPS5534430 A JP S5534430A
Authority
JP
Japan
Prior art keywords
electron beam
beam resist
positioning marks
positioning
positioning method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10646878A
Other languages
Japanese (ja)
Inventor
Shigeru Furuya
Osamu Wada
Sumio Yamamoto
Koichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10646878A priority Critical patent/JPS5534430A/en
Publication of JPS5534430A publication Critical patent/JPS5534430A/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To obtain sharp detecting signals, by beforehand removing electron beam resist located near positioning marks among electron beam resist applied to the whole wafer, to which the positioning marks are put.
CONSTITUTION: Electron beam resist 7 is applied on the whole surface of a semiconductor substrate 1, on which positioning marks 4 are formed by means of etching, etc., and only electron beam resist located at regions in the vicinity of the positioning marks 4 is removed. Thus, sharp detecting signals by the direct reflection of electron beams are obtained because electron beam resist located at positioning mark portions is beforehand removed, and the locations of the positioning marks 4 can accurately be measured. One portion of the electron beam resist 7 in the vicinity of the positioning marks 4 can simply be removed because accurate precision is not particularly needed.
COPYRIGHT: (C)1980,JPO&Japio
JP10646878A 1978-08-31 1978-08-31 Positioning method in electron beam exposure Pending JPS5534430A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10646878A JPS5534430A (en) 1978-08-31 1978-08-31 Positioning method in electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10646878A JPS5534430A (en) 1978-08-31 1978-08-31 Positioning method in electron beam exposure

Publications (1)

Publication Number Publication Date
JPS5534430A true JPS5534430A (en) 1980-03-11

Family

ID=14434369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10646878A Pending JPS5534430A (en) 1978-08-31 1978-08-31 Positioning method in electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5534430A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150228A (en) * 1979-05-10 1980-11-22 Nec Corp Method of detecting position of electron beam
JPS57139924A (en) * 1981-02-23 1982-08-30 Hitachi Ltd Drawing device by electron beam
JPS57186331A (en) * 1981-05-12 1982-11-16 Jeol Ltd Manufacture of semiconductor device
JPS5867027A (en) * 1981-10-19 1983-04-21 Hitachi Ltd Mark position detecting method for electronic beam exposing device
JPS5870554U (en) * 1981-11-09 1983-05-13 トヨタ自動車株式会社 damper pulley
JPS63161617A (en) * 1986-12-25 1988-07-05 Nec Corp Position sensing method using convergent ion beam

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150228A (en) * 1979-05-10 1980-11-22 Nec Corp Method of detecting position of electron beam
JPS57139924A (en) * 1981-02-23 1982-08-30 Hitachi Ltd Drawing device by electron beam
JPS57186331A (en) * 1981-05-12 1982-11-16 Jeol Ltd Manufacture of semiconductor device
JPH0345527B2 (en) * 1981-05-12 1991-07-11 Nippon Electron Optics Lab
JPS5867027A (en) * 1981-10-19 1983-04-21 Hitachi Ltd Mark position detecting method for electronic beam exposing device
JPH0261133B2 (en) * 1981-10-19 1990-12-19 Hitachi Seisakusho Kk
JPS5870554U (en) * 1981-11-09 1983-05-13 トヨタ自動車株式会社 damper pulley
JPS63161617A (en) * 1986-12-25 1988-07-05 Nec Corp Position sensing method using convergent ion beam

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