CN101331587B - 在基底上沉积材料图案的装置及方法 - Google Patents
在基底上沉积材料图案的装置及方法 Download PDFInfo
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- CN101331587B CN101331587B CN2006800468477A CN200680046847A CN101331587B CN 101331587 B CN101331587 B CN 101331587B CN 2006800468477 A CN2006800468477 A CN 2006800468477A CN 200680046847 A CN200680046847 A CN 200680046847A CN 101331587 B CN101331587 B CN 101331587B
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/275,170 US20070137568A1 (en) | 2005-12-16 | 2005-12-16 | Reciprocating aperture mask system and method |
| US11/275,170 | 2005-12-16 | ||
| PCT/US2006/047292 WO2007078694A1 (en) | 2005-12-16 | 2006-12-12 | Reciprocating aperture mask system and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101331587A CN101331587A (zh) | 2008-12-24 |
| CN101331587B true CN101331587B (zh) | 2010-06-23 |
Family
ID=38171959
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2006800468477A Expired - Fee Related CN101331587B (zh) | 2005-12-16 | 2006-12-12 | 在基底上沉积材料图案的装置及方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20070137568A1 (enExample) |
| EP (1) | EP1961037A4 (enExample) |
| JP (1) | JP2009520110A (enExample) |
| CN (1) | CN101331587B (enExample) |
| WO (1) | WO2007078694A1 (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20080111967A (ko) * | 2007-06-20 | 2008-12-24 | 삼성전기주식회사 | 섀도우 마스크 |
| WO2009085004A1 (en) * | 2007-12-28 | 2009-07-09 | Rolling Optics Ab | Method of producing a microstructured product |
| KR100992229B1 (ko) * | 2008-08-29 | 2010-11-05 | 삼성전기주식회사 | 롤투롤타입의 박막형성장치 |
| KR100992304B1 (ko) * | 2008-08-29 | 2010-11-05 | 삼성전기주식회사 | 롤투롤타입의 박막패턴 형성장치 |
| WO2010029492A1 (en) * | 2008-09-15 | 2010-03-18 | Nxp B.V. | Method of manufacturing a plurality of ics and transponders |
| US8252189B2 (en) * | 2009-05-19 | 2012-08-28 | Korea University Research And Business Foundation | Nano structure fabrication |
| JP2010280943A (ja) * | 2009-06-04 | 2010-12-16 | Sony Corp | 蒸着装置及び蒸着方法 |
| JP5677785B2 (ja) | 2009-08-27 | 2015-02-25 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法 |
| EP2479311B1 (en) * | 2009-09-15 | 2017-04-05 | Sharp Kabushiki Kaisha | Vapor deposition method |
| KR101084184B1 (ko) | 2010-01-11 | 2011-11-17 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 |
| DE102010000447A1 (de) * | 2010-02-17 | 2011-08-18 | Aixtron Ag, 52134 | Beschichtungsvorrichtung sowie Verfahren zum Betrieb einer Beschichtungsvorrichtung mit einer Schirmplatte |
| JP2011184738A (ja) * | 2010-03-09 | 2011-09-22 | Fujifilm Corp | ガスバリアフィルムの製造方法 |
| KR101223723B1 (ko) | 2010-07-07 | 2013-01-18 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
| KR101182448B1 (ko) * | 2010-07-12 | 2012-09-12 | 삼성디스플레이 주식회사 | 박막 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조 방법 |
| KR101723506B1 (ko) | 2010-10-22 | 2017-04-19 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
| KR101760897B1 (ko) | 2011-01-12 | 2017-07-25 | 삼성디스플레이 주식회사 | 증착원 및 이를 구비하는 유기막 증착 장치 |
| KR101852517B1 (ko) | 2011-05-25 | 2018-04-27 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
| KR20130004830A (ko) | 2011-07-04 | 2013-01-14 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
| JP5804457B2 (ja) * | 2011-10-06 | 2015-11-04 | 株式会社ブイ・テクノロジー | マスク |
| JP5856839B2 (ja) * | 2011-12-27 | 2016-02-10 | 日東電工株式会社 | 有機el素子の製造方法及び製造装置 |
| KR102081284B1 (ko) | 2013-04-18 | 2020-02-26 | 삼성디스플레이 주식회사 | 증착장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법 및 유기발광 디스플레이 장치 |
| KR20140130972A (ko) * | 2013-05-02 | 2014-11-12 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
| JP6347105B2 (ja) * | 2013-06-28 | 2018-06-27 | 大日本印刷株式会社 | 蒸着マスクの製造方法、金属フレーム付き蒸着マスクの製造方法、及び有機半導体素子の製造方法 |
| KR102124426B1 (ko) * | 2013-07-08 | 2020-06-19 | 삼성디스플레이 주식회사 | 진공 증착 장치 및 이를 이용한 진공 증착 방법 |
| JP6163376B2 (ja) * | 2013-07-30 | 2017-07-12 | 株式会社ブイ・テクノロジー | 成膜マスクの製造方法及び成膜マスク |
| US9804310B2 (en) * | 2015-02-17 | 2017-10-31 | Materion Corporation | Method of fabricating anisotropic optical interference filter |
| TWI567512B (zh) * | 2015-11-06 | 2017-01-21 | 興城科技股份有限公司 | 治具調整方法 |
| KR102696806B1 (ko) * | 2016-09-22 | 2024-08-21 | 삼성디스플레이 주식회사 | 증착용 마스크, 표시 장치의 제조 장치 및 표시 장치의 제조 방법 |
| US10895011B2 (en) * | 2017-03-14 | 2021-01-19 | Eastman Kodak Company | Modular thin film deposition system |
| US11248292B2 (en) * | 2017-03-14 | 2022-02-15 | Eastman Kodak Company | Deposition system with moveable-position web guides |
| KR102217879B1 (ko) * | 2018-03-14 | 2021-02-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판을 프로세싱하기 위한 방법, 진공 프로세싱을 위한 장치, 및 진공 프로세싱 시스템 |
| KR102707691B1 (ko) * | 2018-12-28 | 2024-09-13 | 엘지디스플레이 주식회사 | 표시장치용 마스크 |
| TWI839613B (zh) * | 2020-06-04 | 2024-04-21 | 美商應用材料股份有限公司 | 用於蒸發源的溫度控制屏蔽、用於在基板上沉積材料的材料沉積設備及方法 |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2948261A (en) * | 1956-12-07 | 1960-08-09 | Western Electric Co | Apparatus for producing printed wiring by metal vaporization |
| US3669060A (en) * | 1970-09-24 | 1972-06-13 | Westinghouse Electric Corp | Mask changing mechanism for use in the evaporation of thin film devices |
| US3735728A (en) * | 1971-12-01 | 1973-05-29 | Andvari Inc | Apparatus for continuous vacuum deposition |
| US3866565A (en) * | 1973-12-21 | 1975-02-18 | David E U Ridout | Vapor deposition apparatus with rotating drum mask |
| US4096821A (en) * | 1976-12-13 | 1978-06-27 | Westinghouse Electric Corp. | System for fabricating thin-film electronic components |
| US4344988A (en) * | 1978-08-01 | 1982-08-17 | Nippon Sheet Glass Co., Ltd. | Method for forming patterned coating |
| US4945252A (en) * | 1980-07-07 | 1990-07-31 | Automated Packaging Systems, Inc. | Continuous web registration |
| US4335161A (en) * | 1980-11-03 | 1982-06-15 | Xerox Corporation | Thin film transistors, thin film transistor arrays, and a process for preparing the same |
| US4777909A (en) * | 1981-02-09 | 1988-10-18 | Applied Magnetics Corporation | Carriage apparatus for indexing and accurately registering a selected stabilized mask of a plurality of stabilizing masks between a substrate and a source |
| US4492180A (en) * | 1981-03-16 | 1985-01-08 | Applied Magnetics Corporation | Apparatus for indexing and registering a selected deposition mask to a substrate and method therefor |
| JPS57179952A (en) * | 1981-04-24 | 1982-11-05 | Fuji Photo Film Co Ltd | Method and apparatus for magnetic recording medium |
| US4549843A (en) * | 1983-03-15 | 1985-10-29 | Micronix Partners | Mask loading apparatus, method and cassette |
| US4681780A (en) * | 1983-12-01 | 1987-07-21 | Polaroid Corporation | Continuously cleaned rotary coating mask |
| US4746548A (en) * | 1985-10-23 | 1988-05-24 | Gte Products Corporation | Method for registration of shadow masked thin-film patterns |
| US4915057A (en) * | 1985-10-23 | 1990-04-10 | Gte Products Corporation | Apparatus and method for registration of shadow masked thin-film patterns |
| ES2032566T3 (es) * | 1987-10-07 | 1993-02-16 | Thorn Emi Plc | Aparato y metodo para revestir bandas. |
| US5026239A (en) * | 1988-09-06 | 1991-06-25 | Canon Kabushiki Kaisha | Mask cassette and mask cassette loading device |
| FR2662015B1 (fr) * | 1990-05-11 | 1995-02-17 | Europ Composants Electron | Dispositif de positionnement de bandes-cache dans une machine de metallisation. |
| DE19906676A1 (de) * | 1999-02-18 | 2000-08-24 | Leybold Systems Gmbh | Bedampfungsvorrichtung |
| AU3879500A (en) * | 1999-03-10 | 2000-09-28 | American Bank Note Holographics, Inc. | Techniques of printing micro-structure patterns such as holograms directly onto final documents or other substrates in discrete areas thereof |
| US6475287B1 (en) * | 2001-06-27 | 2002-11-05 | Eastman Kodak Company | Alignment device which facilitates deposition of organic material through a deposition mask |
| CA2356066A1 (en) * | 2001-08-28 | 2003-02-28 | John M. Goston | Arrangements for the de-icing and anti-icing of aircraft |
| JP4336869B2 (ja) * | 2001-11-27 | 2009-09-30 | 日本電気株式会社 | 真空成膜装置、真空成膜方法および電池用電極の製造方法 |
| US6756348B2 (en) * | 2001-11-29 | 2004-06-29 | Chevron Oronite Company Llc | Lubricating oil having enhanced resistance to oxidation, nitration and viscosity increase |
| US20030151118A1 (en) * | 2002-02-14 | 2003-08-14 | 3M Innovative Properties Company | Aperture masks for circuit fabrication |
| US6897164B2 (en) * | 2002-02-14 | 2005-05-24 | 3M Innovative Properties Company | Aperture masks for circuit fabrication |
| US6821348B2 (en) * | 2002-02-14 | 2004-11-23 | 3M Innovative Properties Company | In-line deposition processes for circuit fabrication |
| US6709962B2 (en) * | 2002-03-19 | 2004-03-23 | N. Edward Berg | Process for manufacturing printed circuit boards |
| US6746946B2 (en) * | 2002-03-19 | 2004-06-08 | N. Edward Berg | Process and apparatus for manufacturing printed circuit boards |
| US6943066B2 (en) * | 2002-06-05 | 2005-09-13 | Advantech Global, Ltd | Active matrix backplane for controlling controlled elements and method of manufacture thereof |
| US7132016B2 (en) * | 2002-09-26 | 2006-11-07 | Advantech Global, Ltd | System for and method of manufacturing a large-area backplane by use of a small-area shadow mask |
| US6926840B2 (en) * | 2002-12-31 | 2005-08-09 | Eastman Kodak Company | Flexible frame for mounting a deposition mask |
| KR100909422B1 (ko) * | 2002-12-31 | 2009-07-24 | 엘지디스플레이 주식회사 | 액정표시소자의 패턴 및 그 형성방법 |
| KR100534580B1 (ko) * | 2003-03-27 | 2005-12-07 | 삼성에스디아이 주식회사 | 표시장치용 증착 마스크 및 그의 제조방법 |
| US7121496B2 (en) * | 2003-10-23 | 2006-10-17 | Hewlett-Packard Development Company, L.P. | Method and system for correcting web deformation during a roll-to-roll process |
| US7153180B2 (en) * | 2003-11-13 | 2006-12-26 | Eastman Kodak Company | Continuous manufacture of flat panel light emitting devices |
-
2005
- 2005-12-16 US US11/275,170 patent/US20070137568A1/en not_active Abandoned
-
2006
- 2006-12-12 CN CN2006800468477A patent/CN101331587B/zh not_active Expired - Fee Related
- 2006-12-12 JP JP2008545723A patent/JP2009520110A/ja not_active Withdrawn
- 2006-12-12 WO PCT/US2006/047292 patent/WO2007078694A1/en not_active Ceased
- 2006-12-12 EP EP06839313A patent/EP1961037A4/en not_active Withdrawn
Non-Patent Citations (3)
| Title |
|---|
| JP特开2004-292863A 2004.10.21 |
| JP特开2005-314730A 2005.11.10 |
| JP特开2005-76089A 2005.03.24 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009520110A (ja) | 2009-05-21 |
| US20070137568A1 (en) | 2007-06-21 |
| EP1961037A4 (en) | 2009-07-08 |
| CN101331587A (zh) | 2008-12-24 |
| EP1961037A1 (en) | 2008-08-27 |
| WO2007078694A1 (en) | 2007-07-12 |
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