CN101331587B - 在基底上沉积材料图案的装置及方法 - Google Patents

在基底上沉积材料图案的装置及方法 Download PDF

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Publication number
CN101331587B
CN101331587B CN2006800468477A CN200680046847A CN101331587B CN 101331587 B CN101331587 B CN 101331587B CN 2006800468477 A CN2006800468477 A CN 2006800468477A CN 200680046847 A CN200680046847 A CN 200680046847A CN 101331587 B CN101331587 B CN 101331587B
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CN
China
Prior art keywords
mask
substrate
deposition
jig
alignment
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Expired - Fee Related
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CN2006800468477A
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English (en)
Chinese (zh)
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CN101331587A (zh
Inventor
布赖恩·E·施赖伯
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
CN2006800468477A 2005-12-16 2006-12-12 在基底上沉积材料图案的装置及方法 Expired - Fee Related CN101331587B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/275,170 US20070137568A1 (en) 2005-12-16 2005-12-16 Reciprocating aperture mask system and method
US11/275,170 2005-12-16
PCT/US2006/047292 WO2007078694A1 (en) 2005-12-16 2006-12-12 Reciprocating aperture mask system and method

Publications (2)

Publication Number Publication Date
CN101331587A CN101331587A (zh) 2008-12-24
CN101331587B true CN101331587B (zh) 2010-06-23

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CN2006800468477A Expired - Fee Related CN101331587B (zh) 2005-12-16 2006-12-12 在基底上沉积材料图案的装置及方法

Country Status (5)

Country Link
US (1) US20070137568A1 (enExample)
EP (1) EP1961037A4 (enExample)
JP (1) JP2009520110A (enExample)
CN (1) CN101331587B (enExample)
WO (1) WO2007078694A1 (enExample)

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KR101723506B1 (ko) 2010-10-22 2017-04-19 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR101760897B1 (ko) 2011-01-12 2017-07-25 삼성디스플레이 주식회사 증착원 및 이를 구비하는 유기막 증착 장치
KR101852517B1 (ko) 2011-05-25 2018-04-27 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR20130004830A (ko) 2011-07-04 2013-01-14 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법
JP5804457B2 (ja) * 2011-10-06 2015-11-04 株式会社ブイ・テクノロジー マスク
JP5856839B2 (ja) * 2011-12-27 2016-02-10 日東電工株式会社 有機ｅｌ素子の製造方法及び製造装置
KR102081284B1 (ko) 2013-04-18 2020-02-26 삼성디스플레이 주식회사 증착장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법 및 유기발광 디스플레이 장치
KR20140130972A (ko) * 2013-05-02 2014-11-12 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
JP6347105B2 (ja) * 2013-06-28 2018-06-27 大日本印刷株式会社 蒸着マスクの製造方法、金属フレーム付き蒸着マスクの製造方法、及び有機半導体素子の製造方法
KR102124426B1 (ko) * 2013-07-08 2020-06-19 삼성디스플레이 주식회사 진공 증착 장치 및 이를 이용한 진공 증착 방법
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KR102696806B1 (ko) * 2016-09-22 2024-08-21 삼성디스플레이 주식회사 증착용 마스크, 표시 장치의 제조 장치 및 표시 장치의 제조 방법
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Also Published As

Publication number Publication date
US20070137568A1 (en) 2007-06-21
JP2009520110A (ja) 2009-05-21
CN101331587A (zh) 2008-12-24
WO2007078694A1 (en) 2007-07-12
EP1961037A1 (en) 2008-08-27
EP1961037A4 (en) 2009-07-08

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