JP2009239286A - 液浸システム、露光装置、露光方法、及びデバイス製造方法 - Google Patents

液浸システム、露光装置、露光方法、及びデバイス製造方法 Download PDF

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Publication number
JP2009239286A
JP2009239286A JP2009074674A JP2009074674A JP2009239286A JP 2009239286 A JP2009239286 A JP 2009239286A JP 2009074674 A JP2009074674 A JP 2009074674A JP 2009074674 A JP2009074674 A JP 2009074674A JP 2009239286 A JP2009239286 A JP 2009239286A
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Japan
Prior art keywords
liquid
substrate
liquid recovery
immersion system
distance
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Pending
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JP2009074674A
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English (en)
Japanese (ja)
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JP2009239286A5 (enExample
Inventor
Yasufumi Nishii
康文 西井
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Nikon Corp
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Nikon Corp
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Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JP2009239286A publication Critical patent/JP2009239286A/ja
Publication of JP2009239286A5 publication Critical patent/JP2009239286A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H10P76/2042—Photolithographic processes using lasers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2009074674A 2008-03-27 2009-03-25 液浸システム、露光装置、露光方法、及びデバイス製造方法 Pending JP2009239286A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6481008P 2008-03-27 2008-03-27
US12/382,742 US8233139B2 (en) 2008-03-27 2009-03-23 Immersion system, exposure apparatus, exposing method, and device fabricating method

Publications (2)

Publication Number Publication Date
JP2009239286A true JP2009239286A (ja) 2009-10-15
JP2009239286A5 JP2009239286A5 (enExample) 2013-03-14

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ID=40793250

Family Applications (1)

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JP2009074674A Pending JP2009239286A (ja) 2008-03-27 2009-03-25 液浸システム、露光装置、露光方法、及びデバイス製造方法

Country Status (5)

Country Link
US (2) US8233139B2 (enExample)
JP (1) JP2009239286A (enExample)
KR (1) KR20100133446A (enExample)
TW (1) TW200947145A (enExample)
WO (1) WO2009119898A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150005603A (ko) * 2012-04-10 2015-01-14 가부시키가이샤 니콘 액침 부재 및 노광 장치
JPWO2014057925A1 (ja) * 2012-10-12 2016-09-05 株式会社ニコン 防振装置を備えた露光装置
JPWO2014104159A1 (ja) * 2012-12-27 2017-01-12 株式会社ニコン 液浸部材及び露光装置

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EP2023378B1 (en) * 2006-05-10 2013-03-13 Nikon Corporation Exposure apparatus and device manufacturing method
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP2523210A1 (en) * 2010-01-08 2012-11-14 Nikon Corporation Liquid-immersion member, exposing device, exposing method, and device manufacturing method
NL2009692A (en) * 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
KR20170026563A (ko) 2014-07-01 2017-03-08 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 리소그래피 장치를 제조하는 방법

Citations (5)

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WO2006030902A1 (ja) * 2004-09-17 2006-03-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
JP2007053329A (ja) * 2005-01-31 2007-03-01 Nikon Corp 露光装置及びデバイス製造方法
JP2007053193A (ja) * 2005-08-17 2007-03-01 Nikon Corp 露光装置及びデバイス製造方法
JP2007335662A (ja) * 2006-06-15 2007-12-27 Canon Inc 露光装置
JP2008034801A (ja) * 2006-06-30 2008-02-14 Canon Inc 露光装置およびデバイス製造方法

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CN1144263C (zh) 1996-11-28 2004-03-31 株式会社尼康 曝光装置以及曝光方法
DE69829614T2 (de) 1997-03-10 2006-03-09 Asml Netherlands B.V. Lithographiegerät mit einer positioniervorrichtung mit zwei objekthaltern
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
KR100819239B1 (ko) 1998-03-11 2008-04-03 가부시키가이샤 니콘 자외 레이저 장치, 레이저 장치, 노광 장치와 노광 방법, 디바이스 제조 방법, 자외광 조사 장치, 물체 패턴 검출 장치, 자외광 조사 방법 및 물체 패턴 검출 방법
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
WO2002069049A2 (en) 2001-02-27 2002-09-06 Asml Us, Inc. Simultaneous imaging of two reticles
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
JP2005536775A (ja) 2002-08-23 2005-12-02 株式会社ニコン 投影光学系、フォトリソグラフィ方法および露光装置、並びに露光装置を用いた方法
EP3352015A1 (en) 2003-04-10 2018-07-25 Nikon Corporation Environmental system including a transport region for an immersion lithography apparatus
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
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JP4378136B2 (ja) 2003-09-04 2009-12-02 キヤノン株式会社 露光装置及びデバイス製造方法
KR101504445B1 (ko) * 2004-03-25 2015-03-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1768169B9 (en) 2004-06-04 2013-03-06 Nikon Corporation Exposure apparatus, exposure method, and device producing method
JP4543767B2 (ja) 2004-06-10 2010-09-15 株式会社ニコン 露光装置及びデバイス製造方法
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US7411654B2 (en) 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7751026B2 (en) 2005-08-25 2010-07-06 Nikon Corporation Apparatus and method for recovering fluid for immersion lithography
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804577B2 (en) 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
EP2023378B1 (en) 2006-05-10 2013-03-13 Nikon Corporation Exposure apparatus and device manufacturing method
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US20090122282A1 (en) 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006030902A1 (ja) * 2004-09-17 2006-03-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
JP2007053329A (ja) * 2005-01-31 2007-03-01 Nikon Corp 露光装置及びデバイス製造方法
JP2007053193A (ja) * 2005-08-17 2007-03-01 Nikon Corp 露光装置及びデバイス製造方法
JP2007335662A (ja) * 2006-06-15 2007-12-27 Canon Inc 露光装置
JP2008034801A (ja) * 2006-06-30 2008-02-14 Canon Inc 露光装置およびデバイス製造方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150005603A (ko) * 2012-04-10 2015-01-14 가부시키가이샤 니콘 액침 부재 및 노광 장치
JP2015515738A (ja) * 2012-04-10 2015-05-28 株式会社ニコン 液浸部材、及び、露光装置
US9810999B2 (en) 2012-04-10 2017-11-07 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
JP2018022198A (ja) * 2012-04-10 2018-02-08 株式会社ニコン 液浸部材、露光装置、及びデバイス製造方法
US10139736B2 (en) 2012-04-10 2018-11-27 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
JP2019191613A (ja) * 2012-04-10 2019-10-31 株式会社ニコン 液浸部材、及び、露光装置
US10520828B2 (en) 2012-04-10 2019-12-31 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
KR102158968B1 (ko) 2012-04-10 2020-09-23 가부시키가이샤 니콘 액침 부재 및 노광 장치
JPWO2014057925A1 (ja) * 2012-10-12 2016-09-05 株式会社ニコン 防振装置を備えた露光装置
JP2018092195A (ja) * 2012-10-12 2018-06-14 株式会社ニコン 露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体
US10599050B2 (en) 2012-10-12 2020-03-24 Nikon Corporation Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
JPWO2014104159A1 (ja) * 2012-12-27 2017-01-12 株式会社ニコン 液浸部材及び露光装置

Also Published As

Publication number Publication date
US20090280436A1 (en) 2009-11-12
WO2009119898A1 (en) 2009-10-01
US8233139B2 (en) 2012-07-31
TW200947145A (en) 2009-11-16
US20120300181A1 (en) 2012-11-29
KR20100133446A (ko) 2010-12-21

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