KR101477681B1 - 기판 테이블을 포함한 리소그래피 장치 - Google Patents

기판 테이블을 포함한 리소그래피 장치 Download PDF

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KR101477681B1
KR101477681B1 KR1020120055865A KR20120055865A KR101477681B1 KR 101477681 B1 KR101477681 B1 KR 101477681B1 KR 1020120055865 A KR1020120055865 A KR 1020120055865A KR 20120055865 A KR20120055865 A KR 20120055865A KR 101477681 B1 KR101477681 B1 KR 101477681B1
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South Korea
Prior art keywords
substrate
substrate surface
radiation
actuator
controller
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Expired - Fee Related
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KR1020120055865A
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English (en)
Korean (ko)
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KR20120132409A (ko
Inventor
한스 버틀러
얀 반 아이크
스벤 안토인 요한 홀
요한네스 페트루스 마르티누스 베르나르두스 베르뮬렌
양-산 후앙
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에이에스엠엘 네델란즈 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020120055865A 2011-05-25 2012-05-25 기판 테이블을 포함한 리소그래피 장치 Expired - Fee Related KR101477681B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161489850P 2011-05-25 2011-05-25
US61/489,850 2011-05-25

Publications (2)

Publication Number Publication Date
KR20120132409A KR20120132409A (ko) 2012-12-05
KR101477681B1 true KR101477681B1 (ko) 2014-12-30

Family

ID=47198207

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120055865A Expired - Fee Related KR101477681B1 (ko) 2011-05-25 2012-05-25 기판 테이블을 포함한 리소그래피 장치

Country Status (6)

Country Link
US (1) US9110387B2 (enExample)
JP (2) JP5539440B2 (enExample)
KR (1) KR101477681B1 (enExample)
CN (1) CN102799071B (enExample)
NL (1) NL2008695A (enExample)
TW (1) TWI559092B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677869B2 (ja) 1990-02-07 1994-10-05 昭和アルミニウム株式会社 アルミニウム合金ろう材
NL2009692A (en) * 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
JP6087669B2 (ja) * 2013-03-06 2017-03-01 キヤノン株式会社 基板処理装置、リソグラフィ装置および物品の製造方法
US10095123B2 (en) * 2014-04-04 2018-10-09 Asml Netherlands B.V. Control system, positioning system, lithographic apparatus, control method, device manufacturing method and control program
KR102544701B1 (ko) * 2014-11-17 2023-06-16 에이에스엠엘 네델란즈 비.브이. 장치
DE102014225199A1 (de) 2014-12-09 2016-06-09 Carl Zeiss Smt Gmbh Verbindungsanordnung für eine Lithographieanlage
KR102037994B1 (ko) * 2015-07-20 2019-10-29 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 제어하는 방법, 리소그래피 장치 및 디바이스 제조 방법
NL2017682A (en) * 2015-11-30 2017-06-07 Asml Netherlands Bv Method and apparatus for processing a substrate in a lithographic apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6246520A (ja) * 1985-08-23 1987-02-28 Mitsubishi Electric Corp 露光装置
KR20070115644A (ko) * 2006-05-31 2007-12-06 에이에스엠엘 네델란즈 비.브이. 메트롤로지 툴, 리소그래피 장치 및 메트롤로지 툴을포함한 시스템, 및 기판의 파라미터를 결정하는 방법
KR20090097809A (ko) * 2008-03-11 2009-09-16 에이에스엠엘 네델란즈 비.브이. 기판 표면에 관한 높이 데이터를 측정하고 획득하는 리소그래피 장치 및 방법
JP2010267144A (ja) * 2009-05-15 2010-11-25 Nikon Corp 制御装置及び露光装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004111653A (ja) * 2002-09-18 2004-04-08 Canon Inc 位置決め装置及びそれを適用した露光装置並びに半導体デバイスの製造方法
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101931923B1 (ko) * 2003-06-19 2018-12-21 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
JP4710611B2 (ja) * 2004-01-15 2011-06-29 株式会社ニコン 露光装置及びデバイスの製造方法並びに露光方法
US7295283B2 (en) * 2004-04-02 2007-11-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005297109A (ja) * 2004-04-09 2005-10-27 Canon Inc 微動ステージ
US7057702B2 (en) 2004-06-23 2006-06-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4884708B2 (ja) * 2005-06-21 2012-02-29 株式会社ニコン 露光装置及びデバイス製造方法
JP2007273608A (ja) * 2006-03-30 2007-10-18 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
US8144310B2 (en) 2008-04-14 2012-03-27 Asml Netherlands B.V. Positioning system, lithographic apparatus and device manufacturing method
NL2004807A (en) 2009-06-30 2011-01-04 Asml Netherlands Bv Substrate table for a lithographic apparatus, litographic apparatus, method of using a substrate table and device manufacturing method.
NL2005013A (en) * 2009-07-31 2011-02-02 Asml Netherlands Bv Positioning system, lithographic apparatus and method.
NL2006804A (en) * 2010-06-24 2011-12-28 Asml Netherlands Bv Measurement system, method and lithographic apparatus.
NL2009692A (en) * 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6246520A (ja) * 1985-08-23 1987-02-28 Mitsubishi Electric Corp 露光装置
KR20070115644A (ko) * 2006-05-31 2007-12-06 에이에스엠엘 네델란즈 비.브이. 메트롤로지 툴, 리소그래피 장치 및 메트롤로지 툴을포함한 시스템, 및 기판의 파라미터를 결정하는 방법
KR20090097809A (ko) * 2008-03-11 2009-09-16 에이에스엠엘 네델란즈 비.브이. 기판 표면에 관한 높이 데이터를 측정하고 획득하는 리소그래피 장치 및 방법
JP2010267144A (ja) * 2009-05-15 2010-11-25 Nikon Corp 制御装置及び露光装置

Also Published As

Publication number Publication date
TWI559092B (zh) 2016-11-21
JP5539440B2 (ja) 2014-07-02
JP2012248832A (ja) 2012-12-13
KR20120132409A (ko) 2012-12-05
CN102799071A (zh) 2012-11-28
NL2008695A (en) 2012-11-27
CN102799071B (zh) 2014-10-15
JP2014170957A (ja) 2014-09-18
US9110387B2 (en) 2015-08-18
JP6013396B2 (ja) 2016-10-25
TW201303522A (zh) 2013-01-16
US20120300188A1 (en) 2012-11-29

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