JP2014123778A5 - - Google Patents

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Publication number
JP2014123778A5
JP2014123778A5 JP2014066305A JP2014066305A JP2014123778A5 JP 2014123778 A5 JP2014123778 A5 JP 2014123778A5 JP 2014066305 A JP2014066305 A JP 2014066305A JP 2014066305 A JP2014066305 A JP 2014066305A JP 2014123778 A5 JP2014123778 A5 JP 2014123778A5
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JP
Japan
Prior art keywords
lithographic apparatus
substrate table
actuator
positioning
measurement system
Prior art date
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Application number
JP2014066305A
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English (en)
Japanese (ja)
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JP2014123778A (ja
JP6228878B2 (ja
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Publication of JP2014123778A publication Critical patent/JP2014123778A/ja
Publication of JP2014123778A5 publication Critical patent/JP2014123778A5/ja
Application granted granted Critical
Publication of JP6228878B2 publication Critical patent/JP6228878B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014066305A 2012-05-23 2014-03-27 リソグラフィ装置およびデバイス製造方法 Active JP6228878B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261650708P 2012-05-23 2012-05-23
US61/650,708 2012-05-23

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2013093305A Division JP5513658B2 (ja) 2012-05-23 2013-04-26 リソグラフィ装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2014123778A JP2014123778A (ja) 2014-07-03
JP2014123778A5 true JP2014123778A5 (enExample) 2016-06-02
JP6228878B2 JP6228878B2 (ja) 2017-11-08

Family

ID=49621357

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2013093305A Active JP5513658B2 (ja) 2012-05-23 2013-04-26 リソグラフィ装置およびデバイス製造方法
JP2014066305A Active JP6228878B2 (ja) 2012-05-23 2014-03-27 リソグラフィ装置およびデバイス製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2013093305A Active JP5513658B2 (ja) 2012-05-23 2013-04-26 リソグラフィ装置およびデバイス製造方法

Country Status (3)

Country Link
US (2) US9261798B2 (enExample)
JP (2) JP5513658B2 (enExample)
NL (1) NL2010679A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2010679A (en) 2012-05-23 2013-11-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
CN105470186B (zh) * 2015-12-11 2019-02-15 中国电子科技集团公司第四十八研究所 用于反应室内旋转石墨盘精确定位系统
JP6739536B2 (ja) * 2016-02-25 2020-08-12 エーエスエムエル ネザーランズ ビー．ブイ． アクチュエータシステムおよびリソグラフィ装置
WO2020038661A1 (en) * 2018-08-23 2020-02-27 Asml Netherlands B.V. Substrate support, lithographic apparatus, substrate inspection apparatus, device manufacturing method

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JPS62266490A (ja) * 1986-05-14 1987-11-19 株式会社東芝 精密位置決め装置
JPH0917848A (ja) * 1995-06-30 1997-01-17 Nikon Corp 磁気浮上型ステージ
JPH10209030A (ja) * 1997-01-20 1998-08-07 Nikon Corp 投影露光方法及び投影露光装置
JPH1169764A (ja) * 1997-08-21 1999-03-09 Nikon Corp 位置決め装置及び該装置を備えた露光装置
JP2001313241A (ja) 2000-04-28 2001-11-09 Canon Inc 露光装置および露光方法
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TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4266713B2 (ja) * 2003-06-03 2009-05-20 キヤノン株式会社 位置決め装置及び露光装置
EP1664587B1 (en) 2003-09-05 2010-11-24 Koninklijke Philips Electronics N.V. Actuator arrangement for active vibration isolation comprising an inertial reference mass
US7486381B2 (en) * 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JPWO2005124832A1 (ja) * 2004-06-17 2008-04-17 株式会社ニコン 露光装置
US7440081B2 (en) * 2004-11-05 2008-10-21 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and substrate table
US7442476B2 (en) * 2004-12-27 2008-10-28 Asml Netherlands B.V. Method and system for 3D alignment in wafer scale integration
JP4699071B2 (ja) * 2005-04-01 2011-06-08 株式会社安川電機 ステージ装置およびその露光装置
US20070236854A1 (en) * 2006-04-11 2007-10-11 Lee Martin E Anti-Gravity Device for Supporting Weight and Reducing Transmissibility
JP2007331041A (ja) * 2006-06-13 2007-12-27 Hitachi High-Technologies Corp 平板状ワークの作業装置
US20080067968A1 (en) * 2006-09-12 2008-03-20 Nikon Corporation Identifying and compensating force-ripple and side-forces produced by linear actuators
US7999918B2 (en) * 2006-09-29 2011-08-16 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
JP2008147411A (ja) * 2006-12-08 2008-06-26 Canon Inc 露光装置及びデバイス製造方法
JP5170077B2 (ja) * 2007-03-06 2013-03-27 株式会社安川電機 精密位置決め装置
JP2009038258A (ja) * 2007-08-02 2009-02-19 Canon Inc 露光装置及びデバイス製造方法
WO2009050675A2 (en) * 2007-10-19 2009-04-23 Koninklijke Philips Electronics N.V. Displacement device with precision position measurement
JP5241276B2 (ja) * 2008-03-10 2013-07-17 キヤノン株式会社 露光装置
US8659746B2 (en) * 2009-03-04 2014-02-25 Nikon Corporation Movable body apparatus, exposure apparatus and device manufacturing method
JP2010245300A (ja) * 2009-04-06 2010-10-28 Canon Inc 駆動装置、露光装置およびデバイス製造方法
TW201100975A (en) * 2009-04-21 2011-01-01 Nikon Corp Moving-object apparatus, exposure apparatus, exposure method, and device manufacturing method
US20110042874A1 (en) 2009-08-20 2011-02-24 Nikon Corporation Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
NL2010679A (en) 2012-05-23 2013-11-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.

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