NL2010679A - Lithographic apparatus and device manufacturing method. - Google Patents
Lithographic apparatus and device manufacturing method. Download PDFInfo
- Publication number
- NL2010679A NL2010679A NL2010679A NL2010679A NL2010679A NL 2010679 A NL2010679 A NL 2010679A NL 2010679 A NL2010679 A NL 2010679A NL 2010679 A NL2010679 A NL 2010679A NL 2010679 A NL2010679 A NL 2010679A
- Authority
- NL
- Netherlands
- Prior art keywords
- substrate
- actuator
- substrate table
- positioning member
- positioning
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title description 10
- 239000000758 substrate Substances 0.000 claims description 298
- 230000005855 radiation Effects 0.000 claims description 62
- 238000000059 patterning Methods 0.000 claims description 34
- 238000001459 lithography Methods 0.000 claims description 5
- 238000005286 illumination Methods 0.000 claims description 3
- 238000005259 measurement Methods 0.000 description 39
- 230000003287 optical effect Effects 0.000 description 27
- 230000005291 magnetic effect Effects 0.000 description 12
- 239000010410 layer Substances 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 7
- 238000007654 immersion Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000010287 polarization Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 210000003128 head Anatomy 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261650708P | 2012-05-23 | 2012-05-23 | |
| US201261650708 | 2012-05-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2010679A true NL2010679A (en) | 2013-11-26 |
Family
ID=49621357
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2010679A NL2010679A (en) | 2012-05-23 | 2013-04-22 | Lithographic apparatus and device manufacturing method. |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US9261798B2 (enExample) |
| JP (2) | JP5513658B2 (enExample) |
| NL (1) | NL2010679A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2010679A (en) | 2012-05-23 | 2013-11-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| CN105470186B (zh) * | 2015-12-11 | 2019-02-15 | 中国电子科技集团公司第四十八研究所 | 用于反应室内旋转石墨盘精确定位系统 |
| JP6739536B2 (ja) * | 2016-02-25 | 2020-08-12 | エーエスエムエル ネザーランズ ビー．ブイ． | アクチュエータシステムおよびリソグラフィ装置 |
| WO2020038661A1 (en) * | 2018-08-23 | 2020-02-27 | Asml Netherlands B.V. | Substrate support, lithographic apparatus, substrate inspection apparatus, device manufacturing method |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62266490A (ja) * | 1986-05-14 | 1987-11-19 | 株式会社東芝 | 精密位置決め装置 |
| JPH0917848A (ja) * | 1995-06-30 | 1997-01-17 | Nikon Corp | 磁気浮上型ステージ |
| JPH10209030A (ja) * | 1997-01-20 | 1998-08-07 | Nikon Corp | 投影露光方法及び投影露光装置 |
| JPH1169764A (ja) * | 1997-08-21 | 1999-03-09 | Nikon Corp | 位置決め装置及び該装置を備えた露光装置 |
| JP2001313241A (ja) | 2000-04-28 | 2001-11-09 | Canon Inc | 露光装置および露光方法 |
| TWI307526B (en) * | 2002-08-06 | 2009-03-11 | Nikon Corp | Supporting device and the mamufacturing method thereof, stage device and exposure device |
| JP2004087593A (ja) * | 2002-08-23 | 2004-03-18 | Nikon Corp | ステージ装置および露光装置 |
| JP4307872B2 (ja) * | 2003-03-18 | 2009-08-05 | オリンパス株式会社 | 基板検査装置 |
| TWI295414B (en) * | 2003-05-13 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| JP4266713B2 (ja) * | 2003-06-03 | 2009-05-20 | キヤノン株式会社 | 位置決め装置及び露光装置 |
| EP1664587B1 (en) | 2003-09-05 | 2010-11-24 | Koninklijke Philips Electronics N.V. | Actuator arrangement for active vibration isolation comprising an inertial reference mass |
| US7486381B2 (en) * | 2004-05-21 | 2009-02-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JPWO2005124832A1 (ja) * | 2004-06-17 | 2008-04-17 | 株式会社ニコン | 露光装置 |
| US7440081B2 (en) * | 2004-11-05 | 2008-10-21 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and substrate table |
| US7442476B2 (en) * | 2004-12-27 | 2008-10-28 | Asml Netherlands B.V. | Method and system for 3D alignment in wafer scale integration |
| JP4699071B2 (ja) * | 2005-04-01 | 2011-06-08 | 株式会社安川電機 | ステージ装置およびその露光装置 |
| US20070236854A1 (en) * | 2006-04-11 | 2007-10-11 | Lee Martin E | Anti-Gravity Device for Supporting Weight and Reducing Transmissibility |
| JP2007331041A (ja) * | 2006-06-13 | 2007-12-27 | Hitachi High-Technologies Corp | 平板状ワークの作業装置 |
| US20080067968A1 (en) * | 2006-09-12 | 2008-03-20 | Nikon Corporation | Identifying and compensating force-ripple and side-forces produced by linear actuators |
| US7999918B2 (en) * | 2006-09-29 | 2011-08-16 | Nikon Corporation | Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method |
| JP2008147411A (ja) * | 2006-12-08 | 2008-06-26 | Canon Inc | 露光装置及びデバイス製造方法 |
| JP5170077B2 (ja) * | 2007-03-06 | 2013-03-27 | 株式会社安川電機 | 精密位置決め装置 |
| JP2009038258A (ja) * | 2007-08-02 | 2009-02-19 | Canon Inc | 露光装置及びデバイス製造方法 |
| WO2009050675A2 (en) * | 2007-10-19 | 2009-04-23 | Koninklijke Philips Electronics N.V. | Displacement device with precision position measurement |
| JP5241276B2 (ja) * | 2008-03-10 | 2013-07-17 | キヤノン株式会社 | 露光装置 |
| US8659746B2 (en) * | 2009-03-04 | 2014-02-25 | Nikon Corporation | Movable body apparatus, exposure apparatus and device manufacturing method |
| JP2010245300A (ja) * | 2009-04-06 | 2010-10-28 | Canon Inc | 駆動装置、露光装置およびデバイス製造方法 |
| TW201100975A (en) * | 2009-04-21 | 2011-01-01 | Nikon Corp | Moving-object apparatus, exposure apparatus, exposure method, and device manufacturing method |
| US20110042874A1 (en) | 2009-08-20 | 2011-02-24 | Nikon Corporation | Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method |
| NL2010679A (en) | 2012-05-23 | 2013-11-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
-
2013
- 2013-04-22 NL NL2010679A patent/NL2010679A/en not_active Application Discontinuation
- 2013-04-26 JP JP2013093305A patent/JP5513658B2/ja active Active
- 2013-04-26 US US13/871,328 patent/US9261798B2/en active Active
-
2014
- 2014-03-27 JP JP2014066305A patent/JP6228878B2/ja active Active
-
2016
- 2016-01-21 US US15/003,768 patent/US9811005B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP5513658B2 (ja) | 2014-06-04 |
| US9811005B2 (en) | 2017-11-07 |
| JP2013247358A (ja) | 2013-12-09 |
| JP2014123778A (ja) | 2014-07-03 |
| US9261798B2 (en) | 2016-02-16 |
| US20130314684A1 (en) | 2013-11-28 |
| US20160154322A1 (en) | 2016-06-02 |
| JP6228878B2 (ja) | 2017-11-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WDAP | Patent application withdrawn |
Effective date: 20141105 |