WO2018101023A8 - Ｘ線反射率測定装置 - Google Patents

Ｘ線反射率測定装置

Info

Publication number
WO2018101023A8
WO2018101023A8 PCT/JP2017/040880 JP2017040880W WO2018101023A8 WO 2018101023 A8 WO2018101023 A8 WO 2018101023A8 JP 2017040880 W JP2017040880 W JP 2017040880W WO 2018101023 A8 WO2018101023 A8 WO 2018101023A8
Authority
WO
WIPO (PCT)
Prior art keywords
angle
ray beam
reflected
irradiation
change
Prior art date
Application number
PCT/JP2017/040880
Other languages
English (en)
French (fr)
Other versions
WO2018101023A1 (ja
Inventor
智 村上
表　和彦
真也 菊田
昭弘 池下
Original Assignee
株式会社リガク
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社リガク filed Critical 株式会社リガク
Priority to EP17876115.1A priority Critical patent/EP3550292B1/en
Priority to JP2018553750A priority patent/JP6709448B2/ja
Priority to CN201780073230.2A priority patent/CN110036284B/zh
Priority to KR1020197018315A priority patent/KR102089232B1/ko
Publication of WO2018101023A1 publication Critical patent/WO2018101023A1/ja
Publication of WO2018101023A8 publication Critical patent/WO2018101023A8/ja
Priority to US16/420,370 priority patent/US10598616B2/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/201—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/052—Investigating materials by wave or particle radiation by diffraction, scatter or reflection reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/054—Investigating materials by wave or particle radiation by diffraction, scatter or reflection small angle scatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/10—Different kinds of radiation or particles
    • G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
    • G01N2223/1016—X-ray

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electromagnetism (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

本発明のＸ線反射率測定装置は、試料表面（８ａ）への集光Ｘ線ビーム（６）の照射角度を変化させる照射角度可変手段（１０）と、固定された位置敏感型検出器（１４）と、照射角度可変手段（１０）による集光Ｘ線ビーム（６）の照射角度（θ）の変化に同期して、位置敏感型検出器（１４）において反射Ｘ線ビーム（１２）の発散角度幅内に位置する検出素子（１１）のみについて、反射Ｘ線ビーム（１２）を構成する反射Ｘ線（１３）の反射角度ごとに、対応する検出素子（１１）の検出強度を積算する反射強度算出手段（１５）とを備える。
PCT/JP2017/040880 2016-11-29 2017-11-14 Ｘ線反射率測定装置 WO2018101023A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP17876115.1A EP3550292B1 (en) 2016-11-29 2017-11-14 X-ray reflectometer
JP2018553750A JP6709448B2 (ja) 2016-11-29 2017-11-14 Ｘ線反射率測定装置
CN201780073230.2A CN110036284B (zh) 2016-11-29 2017-11-14 X射线反射率测定装置
KR1020197018315A KR102089232B1 (ko) 2016-11-29 2017-11-14 X선 반사율 측정 장치
US16/420,370 US10598616B2 (en) 2016-11-29 2019-05-23 X-ray reflectometer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-231401 2016-11-29
JP2016231401 2016-11-29

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US16/420,370 Continuation US10598616B2 (en) 2016-11-29 2019-05-23 X-ray reflectometer

Publications (2)

Publication Number Publication Date
WO2018101023A1 WO2018101023A1 (ja) 2018-06-07
WO2018101023A8 true WO2018101023A8 (ja) 2019-05-02

Family

ID=62242037

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2017/040880 WO2018101023A1 (ja) 2016-11-29 2017-11-14 Ｘ線反射率測定装置

Country Status (6)

Country Link
US (1) US10598616B2 (ja)
EP (1) EP3550292B1 (ja)
JP (1) JP6709448B2 (ja)
KR (1) KR102089232B1 (ja)
CN (1) CN110036284B (ja)
WO (1) WO2018101023A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11579099B2 (en) 2019-10-14 2023-02-14 Industrial Technology Research Institute X-ray reflectometry apparatus and method thereof for measuring three dimensional nanostructures on flat substrate
CN111076900B (zh) * 2019-12-13 2021-10-22 北方夜视技术股份有限公司 测量平面龙虾眼光学器件聚焦性能的真空测试装置和方法
US11625844B2 (en) * 2020-05-11 2023-04-11 The Boeing Company Rapid effective case depth measurement of a metal component using physical surface conditioning

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2984232B2 (ja) 1996-10-25 1999-11-29 株式会社テクノス研究所 Ｘ線分析装置およびｘ線照射角設定方法
JP2001004909A (ja) 1999-06-18 2001-01-12 Olympus Optical Co Ltd 自動焦点調節装置を有するカメラ
US6891627B1 (en) * 2000-09-20 2005-05-10 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension and overlay of a specimen
US7062013B2 (en) * 2001-04-12 2006-06-13 Jordan Valley Applied Radiation Ltd. X-ray reflectometry of thin film layers with enhanced accuracy
US6947520B2 (en) 2002-12-06 2005-09-20 Jordan Valley Applied Radiation Ltd. Beam centering and angle calibration for X-ray reflectometry
JP2002365242A (ja) * 2001-06-06 2002-12-18 Ricoh Co Ltd 反射率測定装置およびその使用方法
JP2003202306A (ja) * 2002-01-08 2003-07-18 Japan Science & Technology Corp 試料基板と反射板を用いてｘ線が多重全反射して収束する構成にした全反射蛍光ｘ線分析法および該分析装置
JP4041808B2 (ja) 2004-03-22 2008-02-06 株式会社リガク Ｘ線反射率の測定方法
CN100485373C (zh) * 2004-07-14 2009-05-06 西南技术工程研究所 短波长x射线衍射测量装置和方法
US7113566B1 (en) * 2005-07-15 2006-09-26 Jordan Valley Applied Radiation Ltd. Enhancing resolution of X-ray measurements by sample motion
JP2007212260A (ja) * 2006-02-09 2007-08-23 Mitsubishi Electric Corp 反射率測定装置、反射率測定方法及び表示パネルの製造方法
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
JP5470525B2 (ja) * 2009-04-28 2014-04-16 株式会社リガク 全反射蛍光ｘ線分析装置
US8111807B2 (en) * 2009-09-16 2012-02-07 Rigaku Corporation Crystallite size analysis method and apparatus using powder X-ray diffraction
US8243878B2 (en) * 2010-01-07 2012-08-14 Jordan Valley Semiconductors Ltd. High-resolution X-ray diffraction measurement with enhanced sensitivity
US8687766B2 (en) * 2010-07-13 2014-04-01 Jordan Valley Semiconductors Ltd. Enhancing accuracy of fast high-resolution X-ray diffractometry
US9417195B2 (en) * 2010-07-30 2016-08-16 Rigaku Corporation Method and its apparatus for x-ray diffraction
US8437450B2 (en) * 2010-12-02 2013-05-07 Jordan Valley Semiconductors Ltd. Fast measurement of X-ray diffraction from tilted layers
JP2013096750A (ja) * 2011-10-28 2013-05-20 Hamamatsu Photonics Kk Ｘ線分光検出装置
CN102589452B (zh) * 2012-01-17 2014-09-24 华南师范大学 测量薄膜厚度和折射率的方法及装置
EP2778665B1 (en) * 2013-03-15 2019-05-08 Bruker AXS GmbH X-ray analyzing system for x-ray scattering analysis
CN205363813U (zh) * 2015-12-25 2016-07-06 天津滨海光热反射技术有限公司 反射率计快速测量辅助定位装置

Also Published As

Publication number Publication date
EP3550292A4 (en) 2020-09-02
JP6709448B2 (ja) 2020-06-17
CN110036284B (zh) 2020-09-18
US10598616B2 (en) 2020-03-24
EP3550292B1 (en) 2021-10-27
JPWO2018101023A1 (ja) 2019-10-17
CN110036284A (zh) 2019-07-19
US20190277781A1 (en) 2019-09-12
KR20190087561A (ko) 2019-07-24
EP3550292A1 (en) 2019-10-09
KR102089232B1 (ko) 2020-03-13
WO2018101023A1 (ja) 2018-06-07

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