WO2016103834A8 - 斜入射蛍光ｘ線分析装置および方法 - Google Patents

斜入射蛍光ｘ線分析装置および方法 Download PDF

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WO2016103834A8
WO2016103834A8 PCT/JP2015/078041 JP2015078041W WO2016103834A8 WO 2016103834 A8 WO2016103834 A8 WO 2016103834A8 JP 2015078041 W JP2015078041 W JP 2015078041W WO 2016103834 A8 WO2016103834 A8 WO 2016103834A8
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ray fluorescence
grazing incidence
slit
ray
sample
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PCT/JP2015/078041
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French (fr)
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WO2016103834A1 (ja
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表　和彦
山田　隆
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株式会社リガク
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Priority to JP2016550291A priority Critical patent/JP6142135B2/ja
Priority to CN201580069728.2A priority patent/CN107110798B/zh
Priority to EP15872403.9A priority patent/EP3239701B1/en
Publication of WO2016103834A1 publication Critical patent/WO2016103834A1/ja
Priority to US15/628,737 priority patent/US10302579B2/en
Publication of WO2016103834A8 publication Critical patent/WO2016103834A8/ja

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • G01N15/0211—Investigating a scatter or diffraction pattern
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/2055—Analysing diffraction patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

本発明の斜入射蛍光Ｘ線分析装置（１）は、Ｘ線源（２）と、Ｘ線源（２）からのＸ線（３）を分光し、試料（Ｓ）の表面の一定位置（１５）に集光するＸ線ビーム（５）を形成する湾曲分光素子（４）と、湾曲分光素子（４）と試料（Ｓ）との間に配置され、線状開口（６１）を有するスリット（６）と、線状開口（６１）を通過するＸ線ビーム（５）と交叉する方向へスリット（６）を移動させるスリット移動手段（７）と、スリット移動手段（７）によってスリット（６）を移動させてＸ線ビーム（５）の視射角（α）を所望の角度に設定する視射角設定手段（８）と、Ｘ線ビーム（５）を照射された試料（Ｓ）から発生する蛍光Ｘ線（９）の強度を測定する検出器（１０）と、を備える。
PCT/JP2015/078041 2014-12-25 2015-10-02 斜入射蛍光ｘ線分析装置および方法 WO2016103834A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2016550291A JP6142135B2 (ja) 2014-12-25 2015-10-02 斜入射蛍光ｘ線分析装置および方法
CN201580069728.2A CN107110798B (zh) 2014-12-25 2015-10-02 掠入射荧光x射线分析装置和方法
EP15872403.9A EP3239701B1 (en) 2014-12-25 2015-10-02 Grazing incidence x-ray fluorescence spectrometer and grazing incidence x-ray fluorescence analyzing method
US15/628,737 US10302579B2 (en) 2014-12-25 2017-06-21 Grazing incidence x-ray fluorescence spectrometer and grazing incidence x-ray fluorescence analyzing method

Applications Claiming Priority (2)

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JP2014262464 2014-12-25
JP2014-262464 2014-12-25

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US15/628,737 Continuation US10302579B2 (en) 2014-12-25 2017-06-21 Grazing incidence x-ray fluorescence spectrometer and grazing incidence x-ray fluorescence analyzing method

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WO2016103834A8 true WO2016103834A8 (ja) 2017-06-29

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CN (1) CN107110798B (ja)
WO (1) WO2016103834A1 (ja)

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Publication number Publication date
EP3239701A1 (en) 2017-11-01
EP3239701A4 (en) 2018-08-22
CN107110798B (zh) 2019-08-16
JP6142135B2 (ja) 2017-06-07
EP3239701B1 (en) 2019-05-15
CN107110798A (zh) 2017-08-29
JPWO2016103834A1 (ja) 2017-04-27
US20170284949A1 (en) 2017-10-05
WO2016103834A1 (ja) 2016-06-30
US10302579B2 (en) 2019-05-28

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