WO2015187219A8 - X-ray absorption measurement system - Google Patents

X-ray absorption measurement system Download PDF

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Publication number
WO2015187219A8
WO2015187219A8 PCT/US2015/018553 US2015018553W WO2015187219A8 WO 2015187219 A8 WO2015187219 A8 WO 2015187219A8 US 2015018553 W US2015018553 W US 2015018553W WO 2015187219 A8 WO2015187219 A8 WO 2015187219A8
Authority
WO
WIPO (PCT)
Prior art keywords
ray
flux
absorption
brightness
rays
Prior art date
Application number
PCT/US2015/018553
Other languages
French (fr)
Other versions
WO2015187219A1 (en
Inventor
Sylvia Jia Yun LEWIS
Wenbing Yun
Janos KIRZ
Alan Francis Lyon
Original Assignee
Sigray, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/465,816 external-priority patent/US20150092924A1/en
Priority claimed from US14/490,672 external-priority patent/US9390881B2/en
Priority claimed from US14/544,191 external-priority patent/US9449781B2/en
Application filed by Sigray, Inc. filed Critical Sigray, Inc.
Priority to CN201580033906.6A priority Critical patent/CN106605140B/en
Priority to EP15803316.7A priority patent/EP3152554B1/en
Priority to CN201910779963.9A priority patent/CN110530907B/en
Priority to JP2016564583A priority patent/JP2017523386A/en
Priority claimed from US14/636,994 external-priority patent/US9448190B2/en
Publication of WO2015187219A1 publication Critical patent/WO2015187219A1/en
Publication of WO2015187219A8 publication Critical patent/WO2015187219A8/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
    • G01N23/083—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the radiation being X-rays
    • G01N23/085—X-ray absorption fine structure [XAFS], e.g. extended XAFS [EXAFS]
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/086—Target geometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H01J35/116—Transmissive anodes

Abstract

This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems; for applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy. The higher brightness is achieved using designs for x-ray targets that comprise aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux. The high brightness x-ray source is coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy. Absorption spectra of samples using the high flux monochromatic x-rays can be made using standard detection techniques.
PCT/US2015/018553 2014-06-06 2015-03-03 X-ray absorption measurement system WO2015187219A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201580033906.6A CN106605140B (en) 2014-06-06 2015-03-03 X-ray absorption measuring system
EP15803316.7A EP3152554B1 (en) 2014-06-06 2015-03-03 X-ray absorption measurement system
CN201910779963.9A CN110530907B (en) 2014-06-06 2015-03-03 X-ray absorption measurement system
JP2016564583A JP2017523386A (en) 2014-06-06 2015-03-03 X-ray absorption measurement system

Applications Claiming Priority (14)

Application Number Priority Date Filing Date Title
US201462008856P 2014-06-06 2014-06-06
US62/008,856 2014-06-06
US14/465,816 US20150092924A1 (en) 2013-09-04 2014-08-21 Structured targets for x-ray generation
US14/465,816 2014-08-21
US14/490,672 2014-09-19
US14/490,672 US9390881B2 (en) 2013-09-19 2014-09-19 X-ray sources using linear accumulation
US201462086132P 2014-12-01 2014-12-01
US62/086,132 2014-12-01
US14/544,191 2014-12-05
US14/544,191 US9449781B2 (en) 2013-12-05 2014-12-08 X-ray illuminators with high flux and high flux density
US201562117062P 2015-02-17 2015-02-17
US62/117,062 2015-02-17
US14/636,994 US9448190B2 (en) 2014-06-06 2015-03-03 High brightness X-ray absorption spectroscopy system
US14/636,994 2015-03-03

Publications (2)

Publication Number Publication Date
WO2015187219A1 WO2015187219A1 (en) 2015-12-10
WO2015187219A8 true WO2015187219A8 (en) 2017-01-05

Family

ID=54768814

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2015/018553 WO2015187219A1 (en) 2014-06-06 2015-03-03 X-ray absorption measurement system

Country Status (1)

Country Link
WO (1) WO2015187219A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
CN106770392B (en) * 2016-12-16 2020-04-10 中国科学院长春光学精密机械与物理研究所 Near-edge X-ray absorption spectrometer
RU2645128C1 (en) * 2016-12-21 2018-02-15 Федеральное государственное бюджетное образовательное учреждение высшего образования "Оренбургский государственный университет" Method for x-ray absorption analysis of the substance
EP3602020B1 (en) * 2017-03-22 2023-12-27 Sigray Inc. Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
WO2018175570A1 (en) * 2017-03-22 2018-09-27 Sigray, Inc. Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
WO2019236384A1 (en) 2018-06-04 2019-12-12 Sigray, Inc. Wavelength dispersive x-ray spectrometer
WO2020023408A1 (en) 2018-07-26 2020-01-30 Sigray, Inc. High brightness x-ray reflection source
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN112638261A (en) 2018-09-04 2021-04-09 斯格瑞公司 System and method for utilizing filtered x-ray fluorescence
DE112019004478T5 (en) 2018-09-07 2021-07-08 Sigray, Inc. SYSTEM AND PROCEDURE FOR X-RAY ANALYSIS WITH SELECTABLE DEPTH
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
CN110850494A (en) * 2019-10-24 2020-02-28 武汉艾崴科技有限公司 double-X-light-source side-lighting type security inspection machine for large-sized automobile container
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
US11215572B2 (en) 2020-05-18 2022-01-04 Sigray, Inc. System and method for x-ray absorption spectroscopy using a crystal analyzer and a plurality of detector elements
US11549895B2 (en) 2020-09-17 2023-01-10 Sigray, Inc. System and method using x-rays for depth-resolving metrology and analysis
JP2024501623A (en) 2020-12-07 2024-01-15 シグレイ、インコーポレイテッド High-throughput 3D X-ray imaging system using transmission X-ray source
WO2023215204A1 (en) 2022-05-02 2023-11-09 Sigray, Inc. X-ray sequential array wavelength dispersive spectrometer
CN116256380A (en) * 2023-05-15 2023-06-13 安徽吸收谱仪器设备有限公司 Table XAFS testing device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0582419A (en) * 1991-09-20 1993-04-02 Fujitsu Ltd X-ray transmissive window and its manufacture
US7015467B2 (en) * 2002-10-10 2006-03-21 Applied Materials, Inc. Generating electrons with an activated photocathode
US7394890B1 (en) * 2003-11-07 2008-07-01 Xradia, Inc. Optimized x-ray energy for high resolution imaging of integrated circuits structures
US7170969B1 (en) * 2003-11-07 2007-01-30 Xradia, Inc. X-ray microscope capillary condenser system
US9129715B2 (en) * 2012-09-05 2015-09-08 SVXR, Inc. High speed x-ray inspection microscope

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