WO2016088721A8 - 基板監視装置、および、基板監視方法 - Google Patents

基板監視装置、および、基板監視方法 Download PDF

Info

Publication number
WO2016088721A8
WO2016088721A8 PCT/JP2015/083630 JP2015083630W WO2016088721A8 WO 2016088721 A8 WO2016088721 A8 WO 2016088721A8 JP 2015083630 W JP2015083630 W JP 2015083630W WO 2016088721 A8 WO2016088721 A8 WO 2016088721A8
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
unit
imaging
substrate monitoring
monitoring device
Prior art date
Application number
PCT/JP2015/083630
Other languages
English (en)
French (fr)
Other versions
WO2016088721A1 (ja
Inventor
弘敏 阪上
哲宏 大野
基従 東
Original Assignee
株式会社 アルバック
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社 アルバック filed Critical 株式会社 アルバック
Priority to CN201580065522.2A priority Critical patent/CN107110793B/zh
Priority to KR1020177017975A priority patent/KR101981182B1/ko
Priority to JP2016562619A priority patent/JP6483152B2/ja
Publication of WO2016088721A1 publication Critical patent/WO2016088721A1/ja
Publication of WO2016088721A8 publication Critical patent/WO2016088721A8/ja

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
    • G01N2203/0058—Kind of property studied
    • G01N2203/006—Crack, flaws, fracture or rupture

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Laser Beam Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

所定の撮像範囲を有する撮像部（２７）と、撮像範囲内に基板（Ｓ）を配置する配置部（２６ａ）と、撮像範囲内に配置された基板（Ｓｃ（Ｓｅ１））にレーザー光線（Ｌ）を当てることによって、基板の端部（Ｓｏ（Ｓｅ１））でレーザー光線の反射光および散乱光の少なくとも一方を生じさせて、端部（Ｓｅ１）の像を撮像部（２７）の受光面に形成するように構成された照射部（２９）と、撮像部（２７）の撮像結果を監視する監視部とを備える。
PCT/JP2015/083630 2014-12-05 2015-11-30 基板監視装置、および、基板監視方法 WO2016088721A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201580065522.2A CN107110793B (zh) 2014-12-05 2015-11-30 基板监视装置及基板监视方法
KR1020177017975A KR101981182B1 (ko) 2014-12-05 2015-11-30 기판 감시장치 및 기판 감시방법
JP2016562619A JP6483152B2 (ja) 2014-12-05 2015-11-30 基板監視装置、および、基板監視方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014246984 2014-12-05
JP2014-246984 2014-12-05

Publications (2)

Publication Number Publication Date
WO2016088721A1 WO2016088721A1 (ja) 2016-06-09
WO2016088721A8 true WO2016088721A8 (ja) 2017-06-22

Family

ID=56091663

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2015/083630 WO2016088721A1 (ja) 2014-12-05 2015-11-30 基板監視装置、および、基板監視方法

Country Status (5)

Country Link
JP (1) JP6483152B2 (ja)
KR (1) KR101981182B1 (ja)
CN (1) CN107110793B (ja)
TW (1) TWI682164B (ja)
WO (1) WO2016088721A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7010633B2 (ja) * 2017-09-19 2022-01-26 ファスフォードテクノロジ株式会社 半導体製造装置および半導体装置の製造方法
JP6963725B2 (ja) * 2017-10-13 2021-11-10 日本電気硝子株式会社 ガラス板の検査方法及び検査装置並びにガラス板の製造方法
CN108414518A (zh) * 2018-01-30 2018-08-17 珠海格力智能装备有限公司 覆膜机构及工业视觉检测装置
WO2019198537A1 (ja) * 2018-04-11 2019-10-17 株式会社アルバック 基板保持装置、基板保持方法及び成膜装置
JP7246774B2 (ja) * 2019-02-28 2023-03-28 吉野石膏株式会社 板状体の検査装置
CN111316090A (zh) * 2019-04-04 2020-06-19 合刃科技（深圳）有限公司 透明或半透明材料微观缺陷检测系统及方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07119781B2 (ja) * 1987-01-19 1995-12-20 名古屋電機工業株式会社 実装済プリント基板自動検査装置におけるフラットパッケージのブリッジ検査方法
JP3013903B2 (ja) * 1991-01-31 2000-02-28 セントラル硝子株式会社 板ガラスの欠点検出装置
JPH1030988A (ja) * 1996-07-15 1998-02-03 Hitachi Ltd 自動焦点補正方法及びその装置
JP3422935B2 (ja) * 1997-07-17 2003-07-07 Ｈｏｙａ株式会社 透光性物質の不均一性検査方法及びその装置並びに透明基板の選別方法
JPH11339042A (ja) * 1998-05-26 1999-12-10 Sanko:Kk 基板ウェハー判定装置及び判定方法
JP4312638B2 (ja) * 2003-04-03 2009-08-12 株式会社日立ハイテクノロジーズ 透光性ディスクの周面欠陥検出光学系、周面欠陥検出装置および周面欠陥検出方法
US20040196454A1 (en) * 2003-04-03 2004-10-07 Takayuki Ishiguro Optical system, detector and method for detecting peripheral surface defect of translucent disk
DE102009050711A1 (de) * 2009-10-26 2011-05-05 Schott Ag Verfahren und Vorrichtung zur Detektion von Rissen in Halbleitersubstraten
JP4884540B2 (ja) 2010-01-21 2012-02-29 東京エレクトロン株式会社 基板検査装置及び基板検査方法
US9635658B2 (en) 2012-02-27 2017-04-25 Samsung Electronics Co., Ltd. Adaptation of control signaling transmissions to variations in respective resources
JP6196078B2 (ja) * 2012-10-18 2017-09-13 株式会社アルバック 成膜装置

Also Published As

Publication number Publication date
CN107110793A (zh) 2017-08-29
JPWO2016088721A1 (ja) 2017-09-14
TW201632876A (zh) 2016-09-16
JP6483152B2 (ja) 2019-03-13
KR101981182B1 (ko) 2019-05-22
WO2016088721A1 (ja) 2016-06-09
TWI682164B (zh) 2020-01-11
KR20170093174A (ko) 2017-08-14
CN107110793B (zh) 2021-12-10

Similar Documents

Publication Publication Date Title
WO2016088721A8 (ja) 基板監視装置、および、基板監視方法
WO2016010954A3 (en) System for and method of processing transparent materials using laser beam focal lines adjustable in length and diameter
WO2015116951A3 (en) Optical probe imaging method and system
WO2014205256A3 (en) Apparatus, devices and methods for obtaining omnidirectional viewing by a catheter
EP2963464A8 (en) Design of a refractive surface
WO2014205281A3 (en) Omni-directional viewing apparatus
EP2672290A3 (en) Apparatus depth image generating method and apparatus and depth image processing method and apparatus
MX2019009157A (es) Dispositivo de inspeccion y sistema de fundicion.
WO2015177784A3 (en) System for tomography and/or topography measurements of a layered object
WO2015189268A3 (en) Device and method for hybrid optoacoustic tomography and ultrasonography
AU2017220492A8 (en) System and method for a X-ray detector
WO2015189172A3 (en) Apparatus for determining information associated with reflection characteristics of a surface
MX2015008724A (es) Aparato de procesamiento de imagenes, metodo de procesamiento de imagenes y programa.
WO2014168802A3 (en) Apparatuses and methods for iris based biometric recognition
EP2805672A3 (en) Photoacousticbracket, photoacoustic probe and photoacoustic imaging apparatus having the same
WO2014187860A3 (en) Device and method for the decontamination of hollow objects such as container caps using uv radiations
EP2669739A3 (en) Measuring method, and exposure method and apparatus
EP2837460A3 (en) Laser irradiation apparatus
EP3796068A4 (en) DEVICE FOR GENERATION OF AN OPTICAL PULSE PAIR, LIGHT DETECTION DEVICE AND LIGHT DETECTION METHOD
WO2015124372A3 (en) Lithographic system
MY191252A (en) Laser processing apparatus
EP2752652A3 (en) Recording medium determining device and recording medium determination method
EP3438730A4 (en) PULSE LIGHT GENERATION DEVICE, LIGHT EMITTING DEVICE, OPTICAL PROCESSING DEVICE, OPTICAL REACTION MEASURING DEVICE, MICROSCOPE DEVICE AND PULSE LAYERING METHOD
EP3032338A3 (en) Optical apparatus and image forming apparatus including the optical apparatus
IL252177B (en) Illumination is based on a lens array for slice inspection

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15865640

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2016562619

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20177017975

Country of ref document: KR

Kind code of ref document: A

122 Ep: pct application non-entry in european phase

Ref document number: 15865640

Country of ref document: EP

Kind code of ref document: A1