JP2007273749A5 - - Google Patents

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Publication number
JP2007273749A5
JP2007273749A5 JP2006098000A JP2006098000A JP2007273749A5 JP 2007273749 A5 JP2007273749 A5 JP 2007273749A5 JP 2006098000 A JP2006098000 A JP 2006098000A JP 2006098000 A JP2006098000 A JP 2006098000A JP 2007273749 A5 JP2007273749 A5 JP 2007273749A5
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JP
Japan
Prior art keywords
light source
source device
magnetic field
axis
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006098000A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007273749A (ja
JP4850558B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006098000A priority Critical patent/JP4850558B2/ja
Priority claimed from JP2006098000A external-priority patent/JP4850558B2/ja
Priority to TW096107547A priority patent/TWI373775B/zh
Priority to KR1020070027484A priority patent/KR100821948B1/ko
Priority to US11/691,852 priority patent/US7619233B2/en
Publication of JP2007273749A publication Critical patent/JP2007273749A/ja
Publication of JP2007273749A5 publication Critical patent/JP2007273749A5/ja
Application granted granted Critical
Publication of JP4850558B2 publication Critical patent/JP4850558B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2006098000A 2006-03-31 2006-03-31 光源装置、及びそれを用いた露光装置、デバイス製造方法 Expired - Fee Related JP4850558B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006098000A JP4850558B2 (ja) 2006-03-31 2006-03-31 光源装置、及びそれを用いた露光装置、デバイス製造方法
TW096107547A TWI373775B (en) 2006-03-31 2007-03-05 Light source
KR1020070027484A KR100821948B1 (ko) 2006-03-31 2007-03-21 광원
US11/691,852 US7619233B2 (en) 2006-03-31 2007-03-27 Light source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006098000A JP4850558B2 (ja) 2006-03-31 2006-03-31 光源装置、及びそれを用いた露光装置、デバイス製造方法

Publications (3)

Publication Number Publication Date
JP2007273749A JP2007273749A (ja) 2007-10-18
JP2007273749A5 true JP2007273749A5 (enExample) 2009-05-14
JP4850558B2 JP4850558B2 (ja) 2012-01-11

Family

ID=38557448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006098000A Expired - Fee Related JP4850558B2 (ja) 2006-03-31 2006-03-31 光源装置、及びそれを用いた露光装置、デバイス製造方法

Country Status (4)

Country Link
US (1) US7619233B2 (enExample)
JP (1) JP4850558B2 (enExample)
KR (1) KR100821948B1 (enExample)
TW (1) TWI373775B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
JP5098019B2 (ja) * 2007-04-27 2012-12-12 ギガフォトン株式会社 極端紫外光源装置
NL1036768A1 (nl) 2008-04-29 2009-10-30 Asml Netherlands Bv Radiation source.
EP2113813B1 (en) * 2008-04-29 2012-06-27 ASML Netherlands B.V. Radiation source and lithographic apparatus
JP5061069B2 (ja) * 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光を用いる半導体露光装置
JP5061063B2 (ja) * 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光用ミラーおよび極端紫外光源装置
KR101470528B1 (ko) * 2008-06-09 2014-12-15 삼성전자주식회사 적응 빔포밍을 위한 사용자 방향의 소리 검출 기반의 적응모드 제어 장치 및 방법
NL1036803A (nl) * 2008-09-09 2010-03-15 Asml Netherlands Bv Radiation system and lithographic apparatus.
CN102177470B (zh) * 2008-10-17 2014-03-12 Asml荷兰有限公司 收集器组件、辐射源、光刻设备和器件制造方法
NL2010274C2 (en) * 2012-02-11 2015-02-26 Media Lario Srl Source-collector modules for euv lithography employing a gic mirror and a lpp source.

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0933806A4 (en) * 1996-11-14 2003-01-22 Tokyo Electron Ltd CLEANING A PLASMA APPARATUS AND TREATMENT
JP3582287B2 (ja) * 1997-03-26 2004-10-27 株式会社日立製作所 エッチング装置
TW530189B (en) * 1998-07-01 2003-05-01 Asml Netherlands Bv Lithographic projection apparatus for imaging of a mask pattern and method of manufacturing a device using a lithographic projection apparatus
JP4329177B2 (ja) * 1999-08-18 2009-09-09 株式会社ニコン Ｘ線発生装置及びこれを備えた投影露光装置及び露光方法
TWI255394B (en) * 2002-12-23 2006-05-21 Asml Netherlands Bv Lithographic apparatus with debris suppression means and device manufacturing method
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
TWI237733B (en) * 2003-06-27 2005-08-11 Asml Netherlands Bv Laser produced plasma radiation system with foil trap
DE10337667B4 (de) * 2003-08-12 2012-03-22 Xtreme Technologies Gmbh Plasma-Strahlungsquelle und Anordnung zur Erzeugung eines Gasvorhangs für Plasma-Strahlungsquellen
JP4458330B2 (ja) * 2003-12-26 2010-04-28 キヤノン株式会社 光源ユニットの多層膜ミラーを交換する方法
US7251012B2 (en) * 2003-12-31 2007-07-31 Asml Netherlands B.V. Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris
JP4535732B2 (ja) * 2004-01-07 2010-09-01 株式会社小松製作所 光源装置及びそれを用いた露光装置
JP4578901B2 (ja) * 2004-09-09 2010-11-10 株式会社小松製作所 極端紫外光源装置
JP4937643B2 (ja) * 2006-05-29 2012-05-23 株式会社小松製作所 極端紫外光源装置
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
JP5277496B2 (ja) * 2007-04-27 2013-08-28 ギガフォトン株式会社 極端紫外光源装置および極端紫外光源装置の光学素子汚染防止装置

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