JP2004363571A5 - - Google Patents

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Publication number
JP2004363571A5
JP2004363571A5 JP2004141240A JP2004141240A JP2004363571A5 JP 2004363571 A5 JP2004363571 A5 JP 2004363571A5 JP 2004141240 A JP2004141240 A JP 2004141240A JP 2004141240 A JP2004141240 A JP 2004141240A JP 2004363571 A5 JP2004363571 A5 JP 2004363571A5
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JP
Japan
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mirror
plane
projected
mirror holding
center
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JP2004141240A
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English (en)
Japanese (ja)
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JP4590205B2 (ja
JP2004363571A (ja
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Priority to JP2004141240A priority Critical patent/JP4590205B2/ja
Priority claimed from JP2004141240A external-priority patent/JP4590205B2/ja
Publication of JP2004363571A publication Critical patent/JP2004363571A/ja
Publication of JP2004363571A5 publication Critical patent/JP2004363571A5/ja
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Publication of JP4590205B2 publication Critical patent/JP4590205B2/ja
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JP2004141240A 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法 Expired - Fee Related JP4590205B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004141240A JP4590205B2 (ja) 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003135931 2003-05-14
JP2004141240A JP4590205B2 (ja) 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2004363571A JP2004363571A (ja) 2004-12-24
JP2004363571A5 true JP2004363571A5 (enExample) 2007-06-21
JP4590205B2 JP4590205B2 (ja) 2010-12-01

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ID=34067226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004141240A Expired - Fee Related JP4590205B2 (ja) 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法

Country Status (1)

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JP (1) JP4590205B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006245374A (ja) * 2005-03-04 2006-09-14 Nikon Corp Ｅｕｖ露光装置の調整方法
WO2007010011A2 (en) * 2005-07-19 2007-01-25 Carl Zeiss Smt Ag Optical element module
TWI446365B (zh) * 2006-03-10 2014-07-21 尼康股份有限公司 投影光學系統、曝光裝置以及半導體元件的製造方法
JP5116726B2 (ja) 2009-06-01 2013-01-09 キヤノン株式会社 露光装置およびデバイス製造方法
KR101644213B1 (ko) 2009-09-08 2016-07-29 칼 짜이스 에스엠테 게엠베하 낮은 표면 형상 변형을 갖는 광학 요소
CN115629462B (zh) * 2022-12-07 2023-03-17 山西汉威激光科技股份有限公司 一种半自动化镜片安装调节结构及其方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19807094A1 (de) * 1998-02-20 1999-08-26 Zeiss Carl Fa Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation
JP2003218023A (ja) * 2002-01-28 2003-07-31 Nikon Corp Ｘ線反射鏡、ｘ線露光転写装置及び半導体デバイスの製造方法
US20030235682A1 (en) * 2002-06-21 2003-12-25 Sogard Michael R. Method and device for controlling thermal distortion in elements of a lithography system

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