JP2009260352A5 - - Google Patents

Download PDF

Info

Publication number
JP2009260352A5
JP2009260352A5 JP2009097045A JP2009097045A JP2009260352A5 JP 2009260352 A5 JP2009260352 A5 JP 2009260352A5 JP 2009097045 A JP2009097045 A JP 2009097045A JP 2009097045 A JP2009097045 A JP 2009097045A JP 2009260352 A5 JP2009260352 A5 JP 2009260352A5
Authority
JP
Japan
Prior art keywords
liquid
exposure apparatus
exposure
supply port
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2009097045A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009260352A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2009260352A publication Critical patent/JP2009260352A/ja
Publication of JP2009260352A5 publication Critical patent/JP2009260352A5/ja
Withdrawn legal-status Critical Current

Links

JP2009097045A 2008-04-14 2009-04-13 露光装置、クリーニング方法、及びデバイス製造方法 Withdrawn JP2009260352A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7113208P 2008-04-14 2008-04-14

Publications (2)

Publication Number Publication Date
JP2009260352A JP2009260352A (ja) 2009-11-05
JP2009260352A5 true JP2009260352A5 (enExample) 2013-07-18

Family

ID=41387282

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009097045A Withdrawn JP2009260352A (ja) 2008-04-14 2009-04-13 露光装置、クリーニング方法、及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP2009260352A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036709A1 (nl) 2008-04-24 2009-10-27 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
NL2005610A (en) 2009-12-02 2011-06-06 Asml Netherlands Bv Lithographic apparatus and surface cleaning method.
US20120062858A1 (en) * 2010-04-02 2012-03-15 Nikon Corporation Cleaning method, device manufacturing method, exposure apparatus, and device manufacturing system

Similar Documents

Publication Publication Date Title
JP2012156539A5 (ja) 露光装置、デバイス製造方法、及びクリーニング方法
JP2010093298A5 (enExample)
JP2012044204A5 (ja) メンテナンス方法、露光装置、及びデバイス製造方法
JP2012134512A5 (ja) 露光装置、露光装置のメンテナンス方法、露光方法、及びデバイス製造方法
JP2017027088A5 (enExample)
JP2012142605A5 (ja) 液浸部材、液浸露光装置、及びデバイス製造方法。
JP2012134555A5 (ja) 液浸部材、液浸露光装置、液浸露光方法、及びデバイス製造方法
JP2010109391A5 (enExample)
JP2016053721A5 (enExample)
JP2011223036A5 (ja) 露光装置及びデバイス製造方法
JP2012044223A5 (ja) ノズル部材、露光装置、露光方法、及びデバイス製造方法
JP2010093302A5 (enExample)
JP2010177693A5 (enExample)
JP2010183109A5 (enExample)
JP2012164992A5 (enExample)
TW201614390A (en) Exposure equipment, exposure method and device manufacturing method
JP2009278124A5 (enExample)
JP2010251808A5 (ja) 流路形成部材、露光装置、露光方法、及びデバイス製造方法
JP2012129566A5 (ja) 露光装置、及びデバイス製造方法
CN109541890B (zh) 曝光装置、基板处理装置、曝光方法以及基板处理方法
JP2008288589A5 (ja) 露光装置、及びデバイス製造方法
JP2011258965A5 (ja) 露光装置
JP2012129563A5 (ja) 露光装置及び露光方法
DE602004027162D1 (de) Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
JP2007528115A5 (enExample)