JP2008532228A5 - - Google Patents

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Publication number
JP2008532228A5
JP2008532228A5 JP2007557062A JP2007557062A JP2008532228A5 JP 2008532228 A5 JP2008532228 A5 JP 2008532228A5 JP 2007557062 A JP2007557062 A JP 2007557062A JP 2007557062 A JP2007557062 A JP 2007557062A JP 2008532228 A5 JP2008532228 A5 JP 2008532228A5
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JP
Japan
Prior art keywords
plasma source
source material
reservoir
droplet generator
supply
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JP2007557062A
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Japanese (ja)
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JP2008532228A (ja
JP5490362B2 (ja
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Priority claimed from US11/067,124 external-priority patent/US7405416B2/en
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Priority claimed from PCT/US2006/005541 external-priority patent/WO2006093687A1/en
Publication of JP2008532228A publication Critical patent/JP2008532228A/ja
Publication of JP2008532228A5 publication Critical patent/JP2008532228A5/ja
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Publication of JP5490362B2 publication Critical patent/JP5490362B2/ja
Expired - Fee Related legal-status Critical Current
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JP2007557062A 2005-02-25 2006-02-17 Ｅｕｖ光源ターゲット材料を処理する方法及び装置 Expired - Fee Related JP5490362B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US11/067,124 US7405416B2 (en) 2005-02-25 2005-02-25 Method and apparatus for EUV plasma source target delivery
US11/067,124 2005-02-25
US11/088,475 2005-03-23
US11/088,475 US7122816B2 (en) 2005-02-25 2005-03-23 Method and apparatus for EUV light source target material handling
PCT/US2006/005541 WO2006093687A1 (en) 2005-02-25 2006-02-17 Method and apparatus for euv light source target material handling

Publications (3)

Publication Number Publication Date
JP2008532228A JP2008532228A (ja) 2008-08-14
JP2008532228A5 true JP2008532228A5 (OSRAM) 2009-03-26
JP5490362B2 JP5490362B2 (ja) 2014-05-14

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ID=36931245

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2007557062A Expired - Fee Related JP5490362B2 (ja) 2005-02-25 2006-02-17 Ｅｕｖ光源ターゲット材料を処理する方法及び装置
JP2007557068A Expired - Fee Related JP5455308B2 (ja) 2005-02-25 2006-02-17 Ｅｕｖプラズマ源ターゲット供給方法及び装置
JP2012039168A Expired - Fee Related JP5643779B2 (ja) 2005-02-25 2012-02-24 Ｅｕｖプラズマ源ターゲット供給システム

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2007557068A Expired - Fee Related JP5455308B2 (ja) 2005-02-25 2006-02-17 Ｅｕｖプラズマ源ターゲット供給方法及び装置
JP2012039168A Expired - Fee Related JP5643779B2 (ja) 2005-02-25 2012-02-24 Ｅｕｖプラズマ源ターゲット供給システム

Country Status (5)

Country Link
US (3) US7405416B2 (OSRAM)
EP (1) EP1867218B1 (OSRAM)
JP (3) JP5490362B2 (OSRAM)
KR (1) KR101235023B1 (OSRAM)
WO (1) WO2006093693A2 (OSRAM)

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* Cited by examiner, † Cited by third party
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