BR0001509A - Derivados de oxima e o seu uso como ácidos latentes - Google Patents

Derivados de oxima e o seu uso como ácidos latentes

Info

Publication number
BR0001509A
BR0001509A BR0001509-1A BR0001509A BR0001509A BR 0001509 A BR0001509 A BR 0001509A BR 0001509 A BR0001509 A BR 0001509A BR 0001509 A BR0001509 A BR 0001509A
Authority
BR
Brazil
Prior art keywords
substituted
unsubstituted
radicals
halogen
bond
Prior art date
Application number
BR0001509-1A
Other languages
English (en)
Inventor
Toshikage Asakura
Hitoshi Yamato
Masaki Ohwa
Jean-Luc Birbaum
Kurt Dietliker
Junichi Tanabe
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR0001509A publication Critical patent/BR0001509A/pt

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G7/00—Selection of materials for use in image-receiving members, i.e. for reversal by physical contact; Manufacture thereof
    • G03G7/0006—Cover layers for image-receiving members; Strippable coversheets
    • G03G7/002—Organic components thereof
    • G03G7/0026—Organic components thereof being macromolecular
    • G03G7/004—Organic components thereof being macromolecular obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/26—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C317/32—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
    • C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/10—1,4-Dioxanes; Hydrogenated 1,4-dioxanes
    • C07D319/14—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems
    • C07D319/16—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems condensed with one six-membered ring
    • C07D319/18—Ethylenedioxybenzenes, not substituted on the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00—Systems containing two condensed rings
    • C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

Patente de Invenção: <B>"DERIVADOS DE OXIMA E O SEU USO COMO áCIDOS LATENTES"<D>. Compostos da fórmula I, II e III, em que em que R~ 1~ é, por exemplo, hidrogênio, C~ 1~-C~ 12~ alquila, C~ 3~-C~ 30~ cicloalquila, C~ 2~-C~ 12~ alquenila, C~ 4~-C~ 8~ cicloalquenila, fenila, que está substituída ou não-substituída, naftila, antracila ou fenantrila, substituída ou não-substituída, radical de heteroarila que está substituído ou não-substituído; em que todos os radicais R~ 1~ com a exceção de hidrogênio podem adicionalmente estar substituídos por um grupo tendo uma ligação de -O-C ou uma ligação de -O-Si que cliva pela ação de um ácido; R'~ 1~ é, por exemplo, fenileno, naftileno, difenileno ou oxidifenileno, em que estes radicais estão substituídos ou não-substituídos; R~ 2~ é halogênio ou C~ 1~-C~ 10~ haloalquila; R~ 3~ é, por exemplo, C~ 1~-C~ 18~ alquilsulfonila, fenilsulfonila, naftilsulfonila, antracilsulfonila ou fenantrilsulfonila, em que os grupos estão substituídos ou não-substituídos, ou R~ 3~ é, por exemplo, C~ 2~-C~ 6~ haloalcanoíla ou halobenzoíla, R'~ 3~ é, por exemplo, fenilenodissulfonila, naftilenodissulfonila, difenilenodissulfonila, ou oxidifenilenodissulfonila, em que estes radicais estão substituídos ou não-substituídos, X é halogênio; são especialmente adequados como doadores de ácido fotossensíveis em formulações de "resist" quimicamente ampliadas.
BR0001509-1A 1999-03-31 2000-03-31 Derivados de oxima e o seu uso como ácidos latentes BR0001509A (pt)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP99810273 1999-03-31
EP99810287 1999-04-07
EP99810779 1999-08-30
US09/533,952 US6261738B1 (en) 1999-03-31 2000-03-23 Oxime derivatives and the use thereof as latent acids
DE10015255.4A DE10015255B4 (de) 1999-03-31 2000-03-28 Verfahren zur Herstellung von Oximderivaten und ihre Verwendung als latente Säuren in chemisch verstärkten Photoresistzusammensetzungen, sowie Verfahren zur Herstellung eines Photoresists

Publications (1)

Publication Number Publication Date
BR0001509A true BR0001509A (pt) 2001-04-03

Family

ID=27512369

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0001509-1A BR0001509A (pt) 1999-03-31 2000-03-31 Derivados de oxima e o seu uso como ácidos latentes

Country Status (9)

Country Link
US (1) US6261738B1 (pt)
JP (1) JP4426050B2 (pt)
BR (1) BR0001509A (pt)
DE (1) DE10015255B4 (pt)
DK (1) DK200000533A (pt)
FI (1) FI20000677A (pt)
FR (1) FR2794252B1 (pt)
GB (1) GB2348644B (pt)
SG (1) SG78412A1 (pt)

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JP2000314956A (ja) 2000-11-14
FI20000677A0 (fi) 2000-03-23
SG78412A1 (en) 2001-02-20
US6261738B1 (en) 2001-07-17
FR2794252B1 (fr) 2003-09-26
DK200000533A (da) 2000-10-01
GB0007353D0 (en) 2000-05-17
GB2348644A (en) 2000-10-11
FR2794252A1 (fr) 2000-12-01
JP4426050B2 (ja) 2010-03-03
DE10015255B4 (de) 2020-06-04
DE10015255A1 (de) 2000-10-05
GB2348644B (en) 2001-06-06
FI20000677A (fi) 2000-09-30

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