FI20000677A - Oksiimijohdannaiset ja niiden käyttö latentteina happoina - Google Patents
Oksiimijohdannaiset ja niiden käyttö latentteina happoina Download PDFInfo
- Publication number
- FI20000677A FI20000677A FI20000677A FI20000677A FI20000677A FI 20000677 A FI20000677 A FI 20000677A FI 20000677 A FI20000677 A FI 20000677A FI 20000677 A FI20000677 A FI 20000677A FI 20000677 A FI20000677 A FI 20000677A
- Authority
- FI
- Finland
- Prior art keywords
- oxime derivatives
- latent acids
- latent
- acids
- oxime
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G7/00—Selection of materials for use in image-receiving members, i.e. for reversal by physical contact; Manufacture thereof
- G03G7/0006—Cover layers for image-receiving members; Strippable coversheets
- G03G7/002—Organic components thereof
- G03G7/0026—Organic components thereof being macromolecular
- G03G7/004—Organic components thereof being macromolecular obtained by reactions only involving carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
- C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C317/00—Sulfones; Sulfoxides
- C07C317/26—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
- C07C317/32—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
- C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
- C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D319/10—1,4-Dioxanes; Hydrogenated 1,4-dioxanes
- C07D319/14—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems
- C07D319/16—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems condensed with one six-membered ring
- C07D319/18—Ethylenedioxybenzenes, not substituted on the hetero ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
- C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2602/00—Systems containing two condensed rings
- C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
- C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP99810273 | 1999-03-31 | ||
EP99810287 | 1999-04-07 | ||
EP99810779 | 1999-08-30 | ||
US09/533,952 US6261738B1 (en) | 1999-03-31 | 2000-03-23 | Oxime derivatives and the use thereof as latent acids |
DE10015255.4A DE10015255B4 (de) | 1999-03-31 | 2000-03-28 | Verfahren zur Herstellung von Oximderivaten und ihre Verwendung als latente Säuren in chemisch verstärkten Photoresistzusammensetzungen, sowie Verfahren zur Herstellung eines Photoresists |
Publications (2)
Publication Number | Publication Date |
---|---|
FI20000677A0 FI20000677A0 (fi) | 2000-03-23 |
FI20000677A true FI20000677A (fi) | 2000-09-30 |
Family
ID=27512369
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20000677A FI20000677A (fi) | 1999-03-31 | 2000-03-23 | Oksiimijohdannaiset ja niiden käyttö latentteina happoina |
Country Status (9)
Country | Link |
---|---|
US (1) | US6261738B1 (fi) |
JP (1) | JP4426050B2 (fi) |
BR (1) | BR0001509A (fi) |
DE (1) | DE10015255B4 (fi) |
DK (1) | DK200000533A (fi) |
FI (1) | FI20000677A (fi) |
FR (1) | FR2794252B1 (fi) |
GB (1) | GB2348644B (fi) |
SG (1) | SG78412A1 (fi) |
Families Citing this family (146)
Publication number | Priority date | Publication date | Assignee | Title |
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WO1998025853A1 (fr) * | 1996-12-09 | 1998-06-18 | Nippon Paper Industries Co., Ltd. | Procede de preparation de carbonate de calcium |
DE19729067A1 (de) * | 1997-07-08 | 1999-01-14 | Agfa Gevaert Ag | Infrarot-bebilderbares Aufzeichnungsmaterial und daraus hergestellte Offsetdruckplatte |
SG97168A1 (en) | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
US6635400B2 (en) * | 2000-04-17 | 2003-10-21 | Shin-Etsu Chemical Co., Ltd. | Resist composition and patterning process |
US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
JP4042142B2 (ja) * | 2000-09-08 | 2008-02-06 | Jsr株式会社 | El表示素子の隔壁形成用感放射線性樹脂組成物、隔壁およびel表示素子 |
TWI272451B (en) * | 2000-09-25 | 2007-02-01 | Ciba Sc Holding Ag | Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition |
JP2002202603A (ja) * | 2000-10-23 | 2002-07-19 | Jsr Corp | 感放射線性樹脂組成物 |
JP2002278053A (ja) | 2001-03-16 | 2002-09-27 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
US7393623B2 (en) * | 2001-06-06 | 2008-07-01 | Spectra Systems Corporation | Incorporation of markings in optical media |
US6641971B2 (en) * | 2001-06-15 | 2003-11-04 | International Business Machines Corporation | Resist compositions comprising silyl ketals and methods of use thereof |
US6949329B2 (en) * | 2001-06-22 | 2005-09-27 | Matsushita Electric Industrial Co., Ltd. | Pattern formation method |
US6824954B2 (en) * | 2001-08-23 | 2004-11-30 | Jsr Corporation | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same |
US7326511B2 (en) * | 2002-02-06 | 2008-02-05 | Ciba Specialty Chemicals Corporation | Sulfonate derivatives and the use thereof as latent acids |
US6916591B2 (en) * | 2002-03-22 | 2005-07-12 | Shin-Etsu Chemical Co., Ltd. | Photoacid generators, chemically amplified resist compositions, and patterning process |
US6858378B1 (en) | 2002-04-17 | 2005-02-22 | Sandia National Laboratories | Photoimageable composition |
TW200405128A (en) | 2002-05-01 | 2004-04-01 | Shinetsu Chemical Co | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process |
JP3991213B2 (ja) * | 2002-08-09 | 2007-10-17 | 信越化学工業株式会社 | 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法 |
US20040033440A1 (en) * | 2002-08-09 | 2004-02-19 | Kazunori Maeda | Photoacid generators, chemically amplified positive resist compositions, and patterning process |
JP4040392B2 (ja) * | 2002-08-22 | 2008-01-30 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
JP4371206B2 (ja) | 2002-09-30 | 2009-11-25 | 信越化学工業株式会社 | エステル化合物、高分子化合物、レジスト材料、及びパターン形成方法 |
JP3991223B2 (ja) | 2003-02-13 | 2007-10-17 | 信越化学工業株式会社 | 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法 |
JP3991222B2 (ja) * | 2003-02-13 | 2007-10-17 | 信越化学工業株式会社 | 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法 |
MXPA05008118A (es) * | 2003-02-19 | 2005-09-30 | Ciba Sc Holding Ag | Derivados de oxima halogenados y el uso de los mismos como acidos latentes. |
JP2004334060A (ja) * | 2003-05-12 | 2004-11-25 | Shin Etsu Chem Co Ltd | 化学増幅型レジスト用光酸発生剤及びそれを含有するレジスト材料並びにパターン形成方法 |
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JP4780586B2 (ja) * | 2006-05-08 | 2011-09-28 | 旭化成イーマテリアルズ株式会社 | ポジ型感光性樹脂組成物 |
JP4743426B2 (ja) * | 2006-05-12 | 2011-08-10 | 信越化学工業株式会社 | レジスト材料用重合体及びその製造方法、レジスト材料、パターン形成方法 |
JP4548616B2 (ja) | 2006-05-15 | 2010-09-22 | 信越化学工業株式会社 | 熱酸発生剤及びこれを含むレジスト下層膜材料、並びにこのレジスト下層膜材料を用いたパターン形成方法 |
JP4548617B2 (ja) * | 2006-06-09 | 2010-09-22 | 信越化学工業株式会社 | 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法 |
JP4623311B2 (ja) * | 2006-06-14 | 2011-02-02 | 信越化学工業株式会社 | 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法 |
JP2009541254A (ja) * | 2006-06-20 | 2009-11-26 | チバ ホールディング インコーポレーテッド | オキシムスルホネート及び潜酸としてのその使用 |
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-
2000
- 2000-03-14 SG SG200001505A patent/SG78412A1/en unknown
- 2000-03-23 US US09/533,952 patent/US6261738B1/en not_active Expired - Lifetime
- 2000-03-23 FI FI20000677A patent/FI20000677A/fi not_active IP Right Cessation
- 2000-03-28 GB GB0007353A patent/GB2348644B/en not_active Expired - Fee Related
- 2000-03-28 DE DE10015255.4A patent/DE10015255B4/de not_active Expired - Lifetime
- 2000-03-30 FR FR0004035A patent/FR2794252B1/fr not_active Expired - Fee Related
- 2000-03-30 DK DK200000533A patent/DK200000533A/da not_active Application Discontinuation
- 2000-03-30 JP JP2000092758A patent/JP4426050B2/ja not_active Expired - Lifetime
- 2000-03-31 BR BR0001509-1A patent/BR0001509A/pt not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
GB2348644B (en) | 2001-06-06 |
US6261738B1 (en) | 2001-07-17 |
FR2794252B1 (fr) | 2003-09-26 |
JP2000314956A (ja) | 2000-11-14 |
SG78412A1 (en) | 2001-02-20 |
DE10015255A1 (de) | 2000-10-05 |
DE10015255B4 (de) | 2020-06-04 |
FI20000677A0 (fi) | 2000-03-23 |
GB0007353D0 (en) | 2000-05-17 |
BR0001509A (pt) | 2001-04-03 |
JP4426050B2 (ja) | 2010-03-03 |
GB2348644A (en) | 2000-10-11 |
FR2794252A1 (fr) | 2000-12-01 |
DK200000533A (da) | 2000-10-01 |
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MA | Patent expired |