DE69712253T2 - Positiv-arbeitende fotoempfindliche Zusammensetzung - Google Patents

Positiv-arbeitende fotoempfindliche Zusammensetzung

Info

Publication number
DE69712253T2
DE69712253T2 DE69712253T DE69712253T DE69712253T2 DE 69712253 T2 DE69712253 T2 DE 69712253T2 DE 69712253 T DE69712253 T DE 69712253T DE 69712253 T DE69712253 T DE 69712253T DE 69712253 T2 DE69712253 T2 DE 69712253T2
Authority
DE
Germany
Prior art keywords
photosensitive composition
positive working
working photosensitive
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69712253T
Other languages
English (en)
Other versions
DE69712253D1 (de
Inventor
Toshiaki Aoai
Kunihiko Kodama
Kazuya Uenishi
Tsukasa Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69712253D1 publication Critical patent/DE69712253D1/de
Publication of DE69712253T2 publication Critical patent/DE69712253T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
DE69712253T 1996-03-11 1997-03-10 Positiv-arbeitende fotoempfindliche Zusammensetzung Expired - Lifetime DE69712253T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP5331696 1996-03-11
JP13891896 1996-05-31
JP16797696 1996-06-27
JP2711197 1997-02-10

Publications (2)

Publication Number Publication Date
DE69712253D1 DE69712253D1 (de) 2002-06-06
DE69712253T2 true DE69712253T2 (de) 2002-12-19

Family

ID=27458623

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69712253T Expired - Lifetime DE69712253T2 (de) 1996-03-11 1997-03-10 Positiv-arbeitende fotoempfindliche Zusammensetzung

Country Status (3)

Country Link
US (2) US6010820A (de)
EP (1) EP0795786B1 (de)
DE (1) DE69712253T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US6677390B1 (en) * 1999-08-02 2004-01-13 Nippon Soda Co., Ltd. Photocurable composition containing iodonium salt compound
US6638684B2 (en) * 1999-08-31 2003-10-28 Tokyo Ohka Kogyo Co., Ltd. Photosensitive laminate, process for forming resist pattern using same and positive resist composition
WO2001055789A2 (en) * 2000-01-25 2001-08-02 Infineon Technologies Ag Chemically amplified short wavelength resist
US6514664B1 (en) 2000-07-20 2003-02-04 Arch Specialty Chemicals, Inc. Radiation sensitive compositions containing image quality and profile enhancement additives
TWI288299B (en) * 2002-05-21 2007-10-11 Sumitomo Chemical Co Chemical amplification type positive resist composition
AU2005231979B2 (en) 2004-04-07 2011-02-03 Basf Se Method of coloring a coating composition
US7521170B2 (en) 2005-07-12 2009-04-21 Az Electronic Materials Usa Corp. Photoactive compounds
JP2007041200A (ja) * 2005-08-02 2007-02-15 Fujifilm Corp ポジ型感光性組成物及びそれを用いたパターン形成方法
JP2007108581A (ja) * 2005-10-17 2007-04-26 Fujifilm Corp ポジ型感光性組成物及びそれを用いたパターン形成方法
US7678528B2 (en) 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
US7491482B2 (en) 2006-12-04 2009-02-17 Az Electronic Materials Usa Corp. Photoactive compounds
US7390613B1 (en) * 2006-12-04 2008-06-24 Az Electronic Materials Usa Corp. Photoactive compounds
US20080187868A1 (en) * 2007-02-07 2008-08-07 Munirathna Padmanaban Photoactive Compounds
KR20090066161A (ko) * 2007-12-18 2009-06-23 주식회사 동진쎄미켐 감광성 화합물 및 이를 포함하는 포토레지스트 조성물
JP5544098B2 (ja) * 2008-09-26 2014-07-09 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物、及び該感光性組成物を用いたパターン形成方法
JP5514583B2 (ja) * 2009-03-13 2014-06-04 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及び該組成物を用いたパターン形成方法
EP2539316B1 (de) 2010-02-24 2019-10-23 Basf Se Latente säuren und ihre verwendung
WO2015194910A1 (ko) * 2014-06-20 2015-12-23 주식회사 엘지화학 화학 증폭형 후막 포토레지스트용 용해 억제제, 이를 포함한 포토레지스트 조성물, 및 이를 사용한 소자의 패터닝 방법
CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05152717A (ja) * 1991-11-28 1993-06-18 Hitachi Chem Co Ltd ポジ型感光性アニオン型電着塗料樹脂組成物、これを用いた電着塗装浴、電着塗装法及びプリント回路板の製造法
JP3290234B2 (ja) * 1993-03-26 2002-06-10 富士写真フイルム株式会社 ポジ型感光性組成物
JP3317576B2 (ja) * 1994-05-12 2002-08-26 富士写真フイルム株式会社 ポジ型感光性樹脂組成物

Also Published As

Publication number Publication date
EP0795786B1 (de) 2002-05-02
EP0795786A2 (de) 1997-09-17
US6200729B1 (en) 2001-03-13
EP0795786A3 (de) 1998-05-06
DE69712253D1 (de) 2002-06-06
US6010820A (en) 2000-01-04

Similar Documents

Publication Publication Date Title
DE69705980D1 (de) Positiv-arbeitende fotoempfindliche Zusammensetzung
DE69800164D1 (de) Positiv-arbeitende photoempfindliche Zusammensetzung
DE69807760D1 (de) Positiv-arbeitende Photoresistzusammensetzung
DE69738464D1 (de) Photoempfindliche Zusammensetzung
DE69510519D1 (de) Positiv-arbeitende fotoempfindliche Zusammensetzung
DE69525883D1 (de) Positiv-photoresistzusammensetzung
DE69714502D1 (de) Positiv-arbeitende lichtempfindliche Zusammensetzung
DE69703310D1 (de) Positiv arbeitende photoempfindliche Zusammensetzung
DE69516018T2 (de) Verdickte persäurezusammensetzungen
IS5430A (is) Ný samsetning
DE69718508T2 (de) Antitraspirant zusammensetzung
DE69712253T2 (de) Positiv-arbeitende fotoempfindliche Zusammensetzung
ID18359A (id) Komposisi mikrokapsul
DE69431570D1 (de) Positivarbeitende resistzusammensetzung
DE69809633D1 (de) Photoresistzusammensetzung
DE69817687D1 (de) Positiv-Fotoresist-Zusammensetzung
ID19589A (id) Komposisi
DE69703641T2 (de) Entwicklerzusammensetzungen
DE69502645T2 (de) Fotoempfindliche Zusammensetzung
DE69513433T2 (de) Positiv arbeitende Photoresistzusammensetzung
DE69706214T2 (de) Photoresistzusammensetzung
BR9707835A (pt) Composiç
BR9709815A (pt) Composicão
DE69707722T2 (de) Positiv arbeitende Photoresistzusammensetzung
DE69709582D1 (de) Photolackzusammensetzung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP