DE69707722T2 - Positiv arbeitende Photoresistzusammensetzung - Google Patents

Positiv arbeitende Photoresistzusammensetzung

Info

Publication number
DE69707722T2
DE69707722T2 DE69707722T DE69707722T DE69707722T2 DE 69707722 T2 DE69707722 T2 DE 69707722T2 DE 69707722 T DE69707722 T DE 69707722T DE 69707722 T DE69707722 T DE 69707722T DE 69707722 T2 DE69707722 T2 DE 69707722T2
Authority
DE
Germany
Prior art keywords
photoresist composition
positive working
working photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69707722T
Other languages
English (en)
Other versions
DE69707722D1 (de
Inventor
Shiro Tan
Shinji Sakaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69707722D1 publication Critical patent/DE69707722D1/de
Publication of DE69707722T2 publication Critical patent/DE69707722T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69707722T 1996-01-22 1997-01-21 Positiv arbeitende Photoresistzusammensetzung Expired - Lifetime DE69707722T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00838896A JP3562673B2 (ja) 1996-01-22 1996-01-22 ポジ型フォトレジスト組成物

Publications (2)

Publication Number Publication Date
DE69707722D1 DE69707722D1 (de) 2001-12-06
DE69707722T2 true DE69707722T2 (de) 2002-08-08

Family

ID=11691833

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69707722T Expired - Lifetime DE69707722T2 (de) 1996-01-22 1997-01-21 Positiv arbeitende Photoresistzusammensetzung

Country Status (4)

Country Link
US (1) US5683851A (de)
EP (1) EP0786699B1 (de)
JP (1) JP3562673B2 (de)
DE (1) DE69707722T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6506831B2 (en) 1998-12-20 2003-01-14 Honeywell International Inc. Novolac polymer planarization films with high temperature stability
JP2001264979A (ja) * 2000-03-22 2001-09-28 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
WO2005007719A2 (en) * 2003-07-16 2005-01-27 Tokyo Ohka Kogyo Co., Ltd. Positive photoresist composition and method of forming resist pattern
JP4308051B2 (ja) * 2004-03-22 2009-08-05 富士フイルム株式会社 感光性組成物及びそれを用いたパターン形成方法
KR20090109432A (ko) * 2008-04-15 2009-10-20 삼성전자주식회사 감광성 수지, 상기 감광성 수지를 사용한 패턴의 형성 방법및 표시판의 제조 방법
CN111183991A (zh) * 2020-03-03 2020-05-22 安徽金敦福农业科技有限公司 一种含有百里香酚的农药组合物

Family Cites Families (51)

* Cited by examiner, † Cited by third party
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US4173470A (en) 1977-11-09 1979-11-06 Bell Telephone Laboratories, Incorporated Novolak photoresist composition and preparation thereof
JPS5817112A (ja) 1981-06-22 1983-02-01 フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン ポジ型ノボラツクホトレジスト組成物及びその調製物
US4424315A (en) * 1982-09-20 1984-01-03 Shipley Company Inc. Naphthol novolak resin blend
JPS6017603A (ja) 1983-07-08 1985-01-29 日東化工株式会社 蒸気ボイラの腐食防止方法
JPS6045238A (ja) 1983-08-23 1985-03-11 Fujitsu Ltd ポジ型レジスト材料とその製造方法
JPS6057339A (ja) 1983-09-08 1985-04-03 Sumitomo Chem Co Ltd ポジ型フォトレジスト組成物
JPS6097347A (ja) 1983-11-01 1985-05-31 Hitachi Chem Co Ltd 画像形成性感光性組成物
US4551409A (en) * 1983-11-07 1985-11-05 Shipley Company Inc. Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide
DE3344202A1 (de) 1983-12-07 1985-06-20 Merck Patent Gmbh, 6100 Darmstadt Positiv-fotoresistzusammensetzungen
JPS60164740A (ja) 1984-02-06 1985-08-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS60189739A (ja) 1984-03-09 1985-09-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS61141441A (ja) 1984-12-14 1986-06-28 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS6214148A (ja) 1985-07-11 1987-01-22 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPH0650396B2 (ja) 1985-08-09 1994-06-29 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0654384B2 (ja) 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP2626655B2 (ja) 1986-01-24 1997-07-02 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂の製造法
DE3608492A1 (de) 1986-03-14 1987-09-17 Hoechst Ag Verfahren zum abtrennen von hoehermolekularen bestandteilen aus phenolpolymeren
JPH0654389B2 (ja) 1986-06-23 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
JPH076869B2 (ja) 1986-03-28 1995-01-30 株式会社トプコン レンズメーター
JPH0656487B2 (ja) 1986-05-02 1994-07-27 東京応化工業株式会社 ポジ型ホトレジスト用組成物
JP2590342B2 (ja) 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物
JPS6414229A (en) 1987-07-08 1989-01-18 Hitachi Ltd Production of novolac phenolic resin for resist
DE3724791A1 (de) 1987-07-27 1989-02-09 Merck Patent Gmbh Positiv-fotoresist-zusammensetzungen
JP2555620B2 (ja) 1987-08-21 1996-11-20 日本合成ゴム株式会社 感放射線性樹脂組成物
JP2569669B2 (ja) 1987-12-28 1997-01-08 日本合成ゴム株式会社 感放射線性樹脂組成物
DE3811040A1 (de) 1988-03-31 1989-10-19 Ciba Geigy Ag Im nahen uv hochaufloesende positiv-fotoresists
JPH01280748A (ja) 1988-05-06 1989-11-10 Fuji Yakuhin Kogyo Kk ポジ型感光性組成物
JP2536600B2 (ja) 1988-08-29 1996-09-18 日本合成ゴム株式会社 ノボラック樹脂中の低核体の除去方法
CA2023791A1 (en) * 1989-08-24 1991-02-25 Ayako Ida Radiation-sensitive positive resist composition
US5322757A (en) * 1989-09-08 1994-06-21 Ocg Microelectronic Materials, Inc. Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present
JPH03155554A (ja) * 1989-11-14 1991-07-03 Japan Synthetic Rubber Co Ltd 放射線感応性樹脂組成物
JP2629990B2 (ja) 1989-12-20 1997-07-16 住友化学工業株式会社 ポジ型レジスト用組成物
JP2566172B2 (ja) 1989-12-28 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
JP2566169B2 (ja) 1989-12-28 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
JP2554759B2 (ja) 1990-01-11 1996-11-13 東京応化工業株式会社 新規なポジ型ホトレジスト組成物
TW202504B (de) * 1990-02-23 1993-03-21 Sumitomo Chemical Co
JPH03294861A (ja) * 1990-04-13 1991-12-26 Mitsubishi Petrochem Co Ltd ポジ型フォトレジスト組成物
JPH04101147A (ja) 1990-08-20 1992-04-02 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JP2711590B2 (ja) 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2987526B2 (ja) 1991-01-09 1999-12-06 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH04296755A (ja) 1991-03-26 1992-10-21 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JP3052412B2 (ja) 1991-03-28 2000-06-12 ジェイエスアール株式会社 感放射線性樹脂組成物
JPH05204144A (ja) 1991-08-21 1993-08-13 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JPH05142770A (ja) 1991-11-19 1993-06-11 Hitachi Chem Co Ltd ポジ型フオトレジスト組成物
US5437952A (en) * 1992-03-06 1995-08-01 Konica Corporation Lithographic photosensitive printing plate comprising a photoconductor and a naphtho-quinone diazide sulfonic acid ester of a phenol resin
JP3130188B2 (ja) * 1993-08-31 2001-01-31 富士写真フイルム株式会社 ポジ型感光性平版印刷版
EP0720057A4 (de) * 1994-07-11 1997-01-22 Konishiroku Photo Ind Lithographische druckform sowie verfahren zur herstellung einer druckplatte
EP0720052A1 (de) * 1994-12-27 1996-07-03 Mitsubishi Chemical Corporation Fotoempfindliche Zusammensetzung und fotolithographische Druckplatte
JPH0990622A (ja) * 1995-09-22 1997-04-04 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物

Also Published As

Publication number Publication date
JPH09197667A (ja) 1997-07-31
US5683851A (en) 1997-11-04
EP0786699A1 (de) 1997-07-30
JP3562673B2 (ja) 2004-09-08
DE69707722D1 (de) 2001-12-06
EP0786699B1 (de) 2001-10-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP