DE69501429T2 - Positiv arbeitende, fotoempfindliche Zusammensetzungen - Google Patents
Positiv arbeitende, fotoempfindliche ZusammensetzungenInfo
- Publication number
- DE69501429T2 DE69501429T2 DE69501429T DE69501429T DE69501429T2 DE 69501429 T2 DE69501429 T2 DE 69501429T2 DE 69501429 T DE69501429 T DE 69501429T DE 69501429 T DE69501429 T DE 69501429T DE 69501429 T2 DE69501429 T2 DE 69501429T2
- Authority
- DE
- Germany
- Prior art keywords
- photosensitive compositions
- positive working
- positive
- working
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11144194 | 1994-05-25 | ||
JP06958695A JP3503839B2 (ja) | 1994-05-25 | 1995-03-28 | ポジ型感光性組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69501429D1 DE69501429D1 (de) | 1998-02-19 |
DE69501429T2 true DE69501429T2 (de) | 1998-04-23 |
Family
ID=26410761
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69501429T Expired - Fee Related DE69501429T2 (de) | 1994-05-25 | 1995-05-24 | Positiv arbeitende, fotoempfindliche Zusammensetzungen |
Country Status (4)
Country | Link |
---|---|
US (1) | US5609983A (de) |
EP (1) | EP0684521B1 (de) |
JP (1) | JP3503839B2 (de) |
DE (1) | DE69501429T2 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3290316B2 (ja) * | 1994-11-18 | 2002-06-10 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
US6063175A (en) * | 1998-02-17 | 2000-05-16 | Milliken & Company | Triphenylmethane polymeric colorant having sterically hindered amine counter ion |
US6660445B2 (en) | 2000-10-13 | 2003-12-09 | Fuji Photo Film Co., Ltd. | Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound |
US6451510B1 (en) | 2001-02-21 | 2002-09-17 | International Business Machines Corporation | Developer/rinse formulation to prevent image collapse in resist |
US6592364B2 (en) | 2001-11-30 | 2003-07-15 | David Zapata | Apparatus, method and system for independently controlling airflow in a conveyor oven |
US6645689B2 (en) | 2002-03-13 | 2003-11-11 | Kodak Polychrome Graphics Llc | Solvent resistant polymers with improved bakeability features |
US7766899B2 (en) * | 2003-09-17 | 2010-08-03 | Prostalund Operations Ab | Partial-length, indwelling prostatic catheter using coiled inflation tube as an anchor and methods of draining urine and flushing clots |
US8007754B2 (en) * | 2005-02-04 | 2011-08-30 | Mineral And Coal Technologies, Inc. | Separation of diamond from gangue minerals |
KR101232179B1 (ko) * | 2006-12-04 | 2013-02-12 | 엘지디스플레이 주식회사 | 박막 패턴의 제조장치 및 방법 |
US20090311494A1 (en) * | 2008-06-17 | 2009-12-17 | Fujifilm Corporation | Relief printing plate precursor for laser engraving, relief printing plate, and process for producing relief printing plate |
ES2533065T3 (es) | 2010-07-09 | 2015-04-07 | Pfizer Limited | Bencenosulfonamidas útiles como inhibidores de los canales de sodio |
US9102621B2 (en) | 2010-07-12 | 2015-08-11 | Pfizer Limited | Acyl sulfonamide compounds |
CA2804877A1 (en) | 2010-07-12 | 2012-01-19 | Pfizer Limited | Sulfonamide derivatives as nav1.7 inhibitors for the treatment of pain |
JP2013532186A (ja) | 2010-07-12 | 2013-08-15 | ファイザー・リミテッド | 化合物 |
CA2801032A1 (en) | 2010-07-12 | 2012-01-19 | Pfizer Limited | N-sulfonylbenzamide derivatives useful as voltage gated sodium channel inhibitors |
JP2013532185A (ja) | 2010-07-12 | 2013-08-15 | ファイザー・リミテッド | 化合物 |
JP6661212B2 (ja) * | 2017-02-22 | 2020-03-11 | 信越化学工業株式会社 | 導電性ポリマー複合体及び基板 |
JP6765988B2 (ja) * | 2017-02-22 | 2020-10-07 | 信越化学工業株式会社 | 導電性ポリマー用高分子化合物及びその製造方法 |
Family Cites Families (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE506677A (de) | 1950-10-31 | |||
GB742557A (en) * | 1952-10-01 | 1955-12-30 | Kalle & Co Ag | Light-sensitive material for photomechanical reproduction and process for the production of images |
BE539175A (de) | 1954-08-20 | |||
US2975053A (en) * | 1958-10-06 | 1961-03-14 | Azoplate Corp | Reproduction material |
BE586713A (de) | 1959-01-21 | |||
GB1053866A (de) | 1964-08-05 | |||
JPS459610B1 (de) | 1965-07-19 | 1970-04-07 | ||
JPS4917481B1 (de) | 1970-02-17 | 1974-05-01 | ||
JPS5429922B2 (de) | 1971-12-13 | 1979-09-27 | ||
JPS5423571B2 (de) | 1971-12-13 | 1979-08-15 | ||
BE795809A (fr) | 1972-02-22 | 1973-08-22 | Eastman Kodak Co | Nouveaux polymeres photosensibles a groupes o-quinone diazide |
JPS51483B2 (de) | 1972-08-18 | 1976-01-08 | ||
JPS5024641B2 (de) * | 1972-10-17 | 1975-08-18 | ||
JPS5763526A (en) | 1980-10-04 | 1982-04-17 | Ricoh Co Ltd | Photosensitive material |
JPS60163043A (ja) | 1984-02-06 | 1985-08-24 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
JPS6210646A (ja) | 1985-07-09 | 1987-01-19 | Kanto Kagaku Kk | ポジ型フオトレジスト組成物 |
JPS6210645A (ja) | 1985-07-09 | 1987-01-19 | Kanto Kagaku Kk | ポジ型フオトレジスト組成物 |
JPH0654381B2 (ja) | 1985-12-24 | 1994-07-20 | 日本合成ゴム株式会社 | 集積回路作製用ポジ型レジスト |
KR920001450B1 (ko) | 1986-12-23 | 1992-02-14 | 쉬플리 캄파니 인코포레이티드 | 감광성 내식막의 제조방법, 감광성 내식막 조성물 및 이의 제조방법 |
JPH0814696B2 (ja) | 1987-09-17 | 1996-02-14 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
JP2552891B2 (ja) | 1988-01-26 | 1996-11-13 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
JP2947518B2 (ja) | 1988-10-03 | 1999-09-13 | コニカ株式会社 | 感光性平版印刷版 |
JPH0296163A (ja) | 1988-10-03 | 1990-04-06 | Konica Corp | 感光性組成物 |
JPH0296761A (ja) | 1988-10-04 | 1990-04-09 | Mitsubishi Kasei Corp | 感光性組成物 |
US5178986A (en) | 1988-10-17 | 1993-01-12 | Shipley Company Inc. | Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol |
US4957846A (en) | 1988-12-27 | 1990-09-18 | Olin Hunt Specialty Products Inc. | Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group |
US4992356A (en) | 1988-12-27 | 1991-02-12 | Olin Hunt Specialty Products Inc. | Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group |
JPH087433B2 (ja) | 1989-04-19 | 1996-01-29 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
JP2709507B2 (ja) | 1989-04-19 | 1998-02-04 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
JP2700918B2 (ja) | 1989-04-26 | 1998-01-21 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
JP2631744B2 (ja) | 1989-05-11 | 1997-07-16 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
JP2741243B2 (ja) | 1989-05-11 | 1998-04-15 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
JP2571136B2 (ja) | 1989-11-17 | 1997-01-16 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
JP2761786B2 (ja) | 1990-02-01 | 1998-06-04 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
US5151340A (en) | 1990-07-02 | 1992-09-29 | Ocg Microelectronic Materials, Inc. | Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures |
JPH04274431A (ja) * | 1991-03-01 | 1992-09-30 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
US5223373A (en) * | 1991-04-29 | 1993-06-29 | Industrial Technology Research Institute | Positive working photosensitive composition and photosensitive electrodeposition composition prepared therefrom |
US5296330A (en) | 1991-08-30 | 1994-03-22 | Ciba-Geigy Corp. | Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive |
-
1995
- 1995-03-28 JP JP06958695A patent/JP3503839B2/ja not_active Expired - Fee Related
- 1995-05-24 EP EP95108028A patent/EP0684521B1/de not_active Expired - Lifetime
- 1995-05-24 US US08/449,294 patent/US5609983A/en not_active Expired - Lifetime
- 1995-05-24 DE DE69501429T patent/DE69501429T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0844055A (ja) | 1996-02-16 |
EP0684521A1 (de) | 1995-11-29 |
JP3503839B2 (ja) | 2004-03-08 |
DE69501429D1 (de) | 1998-02-19 |
EP0684521B1 (de) | 1998-01-14 |
US5609983A (en) | 1997-03-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |
|
8339 | Ceased/non-payment of the annual fee |