DE69121001T2 - Positiv arbeitende Fotolackzusammensetzung - Google Patents

Positiv arbeitende Fotolackzusammensetzung

Info

Publication number
DE69121001T2
DE69121001T2 DE69121001T DE69121001T DE69121001T2 DE 69121001 T2 DE69121001 T2 DE 69121001T2 DE 69121001 T DE69121001 T DE 69121001T DE 69121001 T DE69121001 T DE 69121001T DE 69121001 T2 DE69121001 T2 DE 69121001T2
Authority
DE
Germany
Prior art keywords
photoresist composition
positive working
working photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69121001T
Other languages
English (en)
Other versions
DE69121001D1 (de
Inventor
Yoshitomo Nakano
Masumi Kada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Application granted granted Critical
Publication of DE69121001D1 publication Critical patent/DE69121001D1/de
Publication of DE69121001T2 publication Critical patent/DE69121001T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69121001T 1990-04-13 1991-04-11 Positiv arbeitende Fotolackzusammensetzung Expired - Lifetime DE69121001T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2098084A JPH03294861A (ja) 1990-04-13 1990-04-13 ポジ型フォトレジスト組成物

Publications (2)

Publication Number Publication Date
DE69121001D1 DE69121001D1 (de) 1996-08-29
DE69121001T2 true DE69121001T2 (de) 1997-01-16

Family

ID=14210481

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69121001T Expired - Lifetime DE69121001T2 (de) 1990-04-13 1991-04-11 Positiv arbeitende Fotolackzusammensetzung

Country Status (4)

Country Link
US (1) US5225311A (de)
EP (1) EP0451850B1 (de)
JP (1) JPH03294861A (de)
DE (1) DE69121001T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6340552B1 (en) * 1990-12-27 2002-01-22 Kabushiki Kaisha Toshiba Photosensitive composition containing a dissolution inhibitor and an acid releasing compound
JPH05239166A (ja) * 1991-08-22 1993-09-17 Hoechst Celanese Corp 高いガラス転位点と高い光感度を有するフォトレジスト用ノボラック樹脂組成物
US5372909A (en) * 1991-09-24 1994-12-13 Mitsubishi Kasei Corporation Photosensitive resin composition comprising an alkali-soluble resin made from a phenolic compound and at least 2 different aldehydes
TW267219B (de) * 1991-12-27 1996-01-01 Sumitomo Chemical Co
JPH05257277A (ja) * 1992-03-16 1993-10-08 Pioneer Electron Corp 光ディスク用フォトレジスト
DE19530630A1 (de) * 1995-08-21 1997-02-27 Hoechst Ag Verfahren zur Herstellung von methylsubstituierten Polyalkylidenpolyphenolen
JP3562673B2 (ja) * 1996-01-22 2004-09-08 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5674657A (en) * 1996-11-04 1997-10-07 Olin Microelectronic Chemicals, Inc. Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers
US5985507A (en) * 1998-02-18 1999-11-16 Olin Microelectronic Chemicals, Inc. Selected high thermal novolaks and positive-working radiation-sensitive compositions
JP3453615B2 (ja) * 2000-04-14 2003-10-06 光陽化学工業株式会社 ポジ型ホトレジスト組成物
EP1794229B1 (de) * 2004-09-28 2016-03-23 Acquos PTY Ltd. Verbesserte redispergierungsmittel für redispergierbare polymerpulver und diese enthaltende redispergierbare polymerpulver
EP2277929B1 (de) * 2004-09-30 2012-11-21 JSR Corporation Copolymer und oberfilmbildende Zusammensetzung
US7255970B2 (en) * 2005-07-12 2007-08-14 Az Electronic Materials Usa Corp. Photoresist composition for imaging thick films
US20130108956A1 (en) 2011-11-01 2013-05-02 Az Electronic Materials Usa Corp. Nanocomposite positive photosensitive composition and use thereof
US8822123B2 (en) 2012-07-13 2014-09-02 Momentive Specialty Chemicals Inc. Polymeric materials and methods for making the polymeric materials

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1227602A (de) * 1967-11-24 1971-04-07
US4499171A (en) * 1982-04-20 1985-02-12 Japan Synthetic Rubber Co., Ltd. Positive type photosensitive resin composition with at least two o-quinone diazides
EP0136110A3 (de) * 1983-08-30 1986-05-28 Mitsubishi Kasei Corporation Positive lichtempfindliche Zusammensetzung und Verwendung für Photolacke
US4551409A (en) * 1983-11-07 1985-11-05 Shipley Company Inc. Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide
CA1279430C (en) * 1985-12-06 1991-01-22 Takashi Kubota High-molecular-weight soluble novolak resin and process for preparation thereof
EP0227487B1 (de) * 1985-12-27 1992-07-15 Japan Synthetic Rubber Co., Ltd. Strahlungsempfindliche positiv arbeitende Kunststoffzusammensetzung
JP2590342B2 (ja) * 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物
JPS63178228A (ja) * 1987-01-20 1988-07-22 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPS63305348A (ja) * 1987-06-05 1988-12-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JP2693472B2 (ja) * 1987-11-26 1997-12-24 株式会社東芝 レジスト
US4920028A (en) * 1988-03-31 1990-04-24 Morton Thiokol, Inc. High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone
NO891063L (no) * 1988-03-31 1989-10-02 Thiokol Morton Inc Novolakharpikser av blandede aldehyder og positive fotoresistmaterialer fremstilt fra slike harpikser.
US4959292A (en) * 1988-07-11 1990-09-25 Olin Hunt Specialty Products Inc. Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde

Also Published As

Publication number Publication date
JPH03294861A (ja) 1991-12-26
EP0451850A1 (de) 1991-10-16
US5225311A (en) 1993-07-06
DE69121001D1 (de) 1996-08-29
EP0451850B1 (de) 1996-07-24

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