DE69220612D1 - Positivarbeitende Photoresistzusammensetzung - Google Patents

Positivarbeitende Photoresistzusammensetzung

Info

Publication number
DE69220612D1
DE69220612D1 DE69220612T DE69220612T DE69220612D1 DE 69220612 D1 DE69220612 D1 DE 69220612D1 DE 69220612 T DE69220612 T DE 69220612T DE 69220612 T DE69220612 T DE 69220612T DE 69220612 D1 DE69220612 D1 DE 69220612D1
Authority
DE
Germany
Prior art keywords
photoresist composition
positive working
working photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69220612T
Other languages
English (en)
Other versions
DE69220612T2 (de
Inventor
Kazuya Uenishi
Yasumasa Kawabe
Tadayoshi Kokubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69220612D1 publication Critical patent/DE69220612D1/de
Application granted granted Critical
Publication of DE69220612T2 publication Critical patent/DE69220612T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
    • C07C39/16—Bis-(hydroxyphenyl) alkanes; Tris-(hydroxyphenyl)alkanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
    • C07C43/23—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
DE69220612T 1991-04-26 1992-04-24 Positivarbeitende Photoresistzusammensetzung Expired - Lifetime DE69220612T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3122851A JPH04328555A (ja) 1991-04-26 1991-04-26 ポジ型フオトレジスト組成物

Publications (2)

Publication Number Publication Date
DE69220612D1 true DE69220612D1 (de) 1997-08-07
DE69220612T2 DE69220612T2 (de) 1997-12-18

Family

ID=14846213

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69220612T Expired - Lifetime DE69220612T2 (de) 1991-04-26 1992-04-24 Positivarbeitende Photoresistzusammensetzung

Country Status (5)

Country Link
US (1) US5290658A (de)
EP (1) EP0510672B1 (de)
JP (1) JPH04328555A (de)
KR (1) KR920020265A (de)
DE (1) DE69220612T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5362599A (en) * 1991-11-14 1994-11-08 International Business Machines Corporations Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
WO1993018438A1 (en) * 1992-03-06 1993-09-16 Hoechst Celanese Corporation Positive photoresist composition
US5384228A (en) * 1992-04-14 1995-01-24 Tokyo Ohka Kogyo Co., Ltd. Alkali-developable positive-working photosensitive resin composition
JPH06301203A (ja) * 1993-04-13 1994-10-28 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH07199455A (ja) * 1993-12-28 1995-08-04 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JP3365874B2 (ja) * 1994-10-05 2003-01-14 富士写真フイルム株式会社 キノンジアジドの合成法およびこれを含むポジ型レジスト
US5612164A (en) * 1995-02-09 1997-03-18 Hoechst Celanese Corporation Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone
JP3444562B2 (ja) * 1995-03-28 2003-09-08 東京応化工業株式会社 レジスト溶液の調製方法
US5672459A (en) * 1995-03-31 1997-09-30 Japan Synthetic Rubber Co., Ltd. Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups
US5618932A (en) * 1995-05-24 1997-04-08 Shipley Company, L.L.C. Photoactive compounds and compositions
US5514515A (en) * 1995-05-24 1996-05-07 Shipley Company, L.L.C. Photoactive compounds having a heterocyclic group used in photoresist compositions
US5821345A (en) * 1996-03-12 1998-10-13 Shipley Company, L.L.C. Thermodynamically stable photoactive compound
JP3076523B2 (ja) * 1996-03-25 2000-08-14 東京応化工業株式会社 ポジ型ホトレジスト組成物
US5919597A (en) * 1997-10-30 1999-07-06 Ibm Corporation Of Armonk Methods for preparing photoresist compositions
US7563556B2 (en) * 2006-11-17 2009-07-21 Kodak Graphic Communications Gmbh Multilayer element with low pH developer solubility
KR101560844B1 (ko) * 2007-06-04 2015-10-15 벤-구리온 유니버시티 오브 더 네게브 리서치 앤드 디벨럽먼트 어쏘러티 트라이-아릴계 화합물 및 이를 포함하는 조성물
EA201690938A1 (ru) 2013-11-05 2016-11-30 Бен-Гурион Юниверсити Оф Дзе Негев Рисерч Энд Дивелопмент Оторити Соединения для лечения диабета и осложнений, возникающих из-за этого заболевания
CN109456230A (zh) * 2018-11-14 2019-03-12 大晶信息化学品（徐州）有限公司 一种光敏剂的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH621416A5 (de) * 1975-03-27 1981-01-30 Hoechst Ag
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0654388B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
EP0358871B1 (de) * 1988-07-07 1998-09-30 Sumitomo Chemical Company, Limited Strahlungsempfindliche, positiv arbeitende Resistzusammensetzung
JP2571136B2 (ja) * 1989-11-17 1997-01-16 日本ゼオン株式会社 ポジ型レジスト組成物
KR0184870B1 (ko) * 1990-02-20 1999-04-01 아사구라 다기오 감방사선성 수지 조성물

Also Published As

Publication number Publication date
EP0510672A1 (de) 1992-10-28
JPH04328555A (ja) 1992-11-17
US5290658A (en) 1994-03-01
DE69220612T2 (de) 1997-12-18
KR920020265A (ko) 1992-11-20
EP0510672B1 (de) 1997-07-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

R071 Expiry of right

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