DE69232042D1 - Positiv-arbeitende lichtempfindliche Zusammensetzung - Google Patents

Positiv-arbeitende lichtempfindliche Zusammensetzung

Info

Publication number
DE69232042D1
DE69232042D1 DE69232042T DE69232042T DE69232042D1 DE 69232042 D1 DE69232042 D1 DE 69232042D1 DE 69232042 T DE69232042 T DE 69232042T DE 69232042 T DE69232042 T DE 69232042T DE 69232042 D1 DE69232042 D1 DE 69232042D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
positive working
working photosensitive
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69232042T
Other languages
English (en)
Other versions
DE69232042T2 (de
Inventor
Tsukasa Yamanaka
Toshiaki Aoai
Kazuya Uenichi
Shunichi Kondo
Tadayoshi Kokubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69232042D1 publication Critical patent/DE69232042D1/de
Publication of DE69232042T2 publication Critical patent/DE69232042T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
DE1992632042 1991-11-08 1992-11-06 Positiv-arbeitende lichtempfindliche Zusammensetzung Expired - Fee Related DE69232042T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP31960091 1991-11-08
JP4778292 1992-02-05
JP4770592 1992-02-05
JP16668592 1992-06-03
JP4299093A JP2655384B2 (ja) 1991-11-08 1992-10-13 ポジ型レジスト組成物

Publications (2)

Publication Number Publication Date
DE69232042D1 true DE69232042D1 (de) 2001-10-11
DE69232042T2 DE69232042T2 (de) 2002-05-02

Family

ID=27522657

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1992632042 Expired - Fee Related DE69232042T2 (de) 1991-11-08 1992-11-06 Positiv-arbeitende lichtempfindliche Zusammensetzung

Country Status (3)

Country Link
EP (1) EP0541112B1 (de)
JP (1) JP2655384B2 (de)
DE (1) DE69232042T2 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0692909A (ja) * 1992-04-10 1994-04-05 Sumitomo Chem Co Ltd 炭酸エステル環状化合物、その製造方法及びそれを用いてなるポジ型フォトレジスト組成物
JP2944327B2 (ja) * 1992-09-14 1999-09-06 富士写真フイルム株式会社 ポジ型感光性平版印刷版
JPH06214395A (ja) * 1993-01-18 1994-08-05 Sumitomo Chem Co Ltd ポジ型フォトレジスト組成物
TW288112B (de) * 1993-06-02 1996-10-11 Sumitomo Chemical Co
EP0659781A3 (de) * 1993-12-21 1995-09-27 Ciba Geigy Ag Maleinimidcopolymere, insbesonder für Photoresists.
DE69525883T2 (de) * 1994-07-04 2002-10-31 Fuji Photo Film Co Ltd Positiv-photoresistzusammensetzung
WO1996012216A1 (fr) * 1994-10-13 1996-04-25 Nippon Zeon Co., Ltd. Composition de reserve
JP3317597B2 (ja) * 1994-10-18 2002-08-26 富士写真フイルム株式会社 ポジ型感光性組成物
US5683856A (en) * 1994-10-18 1997-11-04 Fuji Photo Film Co., Ltd. Positive-working photosensitive composition
JP3340864B2 (ja) * 1994-10-26 2002-11-05 富士写真フイルム株式会社 ポジ型化学増幅レジスト組成物
EP0709410A3 (de) 1994-10-26 1997-03-26 Ocg Microelectronic Materials Polymere
EP0831370A4 (de) * 1995-01-17 1999-08-18 Nippon Zeon Co Positiv arbeitende photolackzusammensetzung
US5780483A (en) * 1995-02-17 1998-07-14 Smithkline Beecham Corporation IL-8 receptor antagonists
EP0809492A4 (de) * 1995-02-17 2007-01-24 Smithkline Beecham Corp Il-8 rezeptor antagonisten
JP3506817B2 (ja) * 1995-07-26 2004-03-15 クラリアント インターナショナル リミテッド 放射線感応性組成物
US6005008A (en) * 1996-02-16 1999-12-21 Smithkline Beecham Corporation IL-8 receptor antagonists
US6211373B1 (en) 1996-03-20 2001-04-03 Smithkline Beecham Corporation Phenyl urea antagonists of the IL-8 receptor
US6262113B1 (en) 1996-03-20 2001-07-17 Smithkline Beecham Corporation IL-8 receptor antagonists
TR199802695T2 (xx) 1996-06-27 1999-04-21 Smithkline Beecham Corporation IL-8 Resept�r kar��tlar�
US6133319A (en) * 1996-06-27 2000-10-17 Smithkline Beecham Corporation IL-8 receptor antagonists
US7534547B2 (en) 2001-03-29 2009-05-19 Osaka Gas Company Limited Optically active compound and photosensitive resin composition
TW200300772A (en) * 2001-12-11 2003-06-16 Kaneka Corp Polyimide precursor, manufacturing method thereof, and resin composition using polyimide precursor
JP4429620B2 (ja) * 2002-10-15 2010-03-10 出光興産株式会社 感放射線性有機化合物
JP4612999B2 (ja) 2003-10-08 2011-01-12 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4623260B2 (ja) * 2004-01-29 2011-02-02 三菱瓦斯化学株式会社 レジスト化合物および組成物
JP4524154B2 (ja) 2004-08-18 2010-08-11 富士フイルム株式会社 化学増幅型レジスト組成物及びそれを用いたパターン形成方法
US7741357B1 (en) * 2006-04-17 2010-06-22 Johns Hopkins University Heterocyclic and carbonate derivatives of NDGA and their use as new anti-HIV and anti-cancer agents
JP5036298B2 (ja) * 2006-12-27 2012-09-26 大阪瓦斯株式会社 フルオレン系化合物
WO2014021023A1 (ja) * 2012-07-31 2014-02-06 株式会社Adeka 潜在性添加剤及び該添加剤を含有する組成物
JP2019137612A (ja) * 2018-02-06 2019-08-22 公立大学法人大阪市立大学 化合物、感光性樹脂組成物およびレジスト膜の形成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3473359D1 (de) * 1983-06-29 1988-09-15 Fuji Photo Film Co Ltd Photosolubilizable composition
EP0249139B2 (de) * 1986-06-13 1998-03-11 MicroSi, Inc. (a Delaware corporation) Lackzusammensetzung und -anwendung
JP2574692B2 (ja) * 1988-09-07 1997-01-22 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
GB8923459D0 (en) * 1989-10-18 1989-12-06 Minnesota Mining & Mfg Positive-acting photoresist compositions
DE69132694T2 (de) * 1990-03-08 2002-06-20 Fuji Photo Film Co Ltd Positiv arbeitende Photolackzusammensetzung
JP2557748B2 (ja) * 1990-09-07 1996-11-27 日本電信電話株式会社 ポジ型レジスト材料
JPH06118649A (ja) * 1992-09-30 1994-04-28 Nippon Zeon Co Ltd レジスト組成物

Also Published As

Publication number Publication date
DE69232042T2 (de) 2002-05-02
EP0541112A1 (de) 1993-05-12
EP0541112B1 (de) 2001-09-05
JPH0651519A (ja) 1994-02-25
JP2655384B2 (ja) 1997-09-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee