DE69223083T2 - Positivarbeitende Resistzusammensetzung - Google Patents
Positivarbeitende ResistzusammensetzungInfo
- Publication number
- DE69223083T2 DE69223083T2 DE1992623083 DE69223083T DE69223083T2 DE 69223083 T2 DE69223083 T2 DE 69223083T2 DE 1992623083 DE1992623083 DE 1992623083 DE 69223083 T DE69223083 T DE 69223083T DE 69223083 T2 DE69223083 T2 DE 69223083T2
- Authority
- DE
- Germany
- Prior art keywords
- resist composition
- positive working
- working resist
- positive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9726391 | 1991-04-26 | ||
JP03316500A JP3064595B2 (ja) | 1991-04-26 | 1991-11-29 | ポジ型レジスト組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69223083D1 DE69223083D1 (de) | 1997-12-18 |
DE69223083T2 true DE69223083T2 (de) | 1998-07-02 |
Family
ID=26438446
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1992623083 Expired - Fee Related DE69223083T2 (de) | 1991-04-26 | 1992-04-24 | Positivarbeitende Resistzusammensetzung |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0510671B1 (de) |
CA (1) | CA2067042A1 (de) |
DE (1) | DE69223083T2 (de) |
MX (1) | MX9201930A (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3427562B2 (ja) * | 1995-05-09 | 2003-07-22 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
JP3488332B2 (ja) * | 1996-02-02 | 2004-01-19 | 東京応化工業株式会社 | ポジ型ホトレジスト塗布液 |
TWI234051B (en) * | 1998-10-14 | 2005-06-11 | Clariant Int Ltd | A mixed solvent system for positive photoresists |
JP2002148784A (ja) | 2000-11-07 | 2002-05-22 | Tokyo Ohka Kogyo Co Ltd | 化学増幅型ポジ型レジスト塗布液及びそれを用いたレジストパターン形成方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4845008A (en) * | 1986-02-20 | 1989-07-04 | Fuji Photo Film Co., Ltd. | Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent |
EP0273026B2 (de) * | 1986-12-23 | 2003-08-20 | Shipley Company Inc. | Lösungsmittel für Photolack-Zusammensetzungen |
DE68927140T2 (de) * | 1988-06-13 | 1997-04-30 | Sumitomo Chemical Co | Photolackzusammensetzung |
US5183722A (en) * | 1989-12-01 | 1993-02-02 | Tosoh Corporation | Positive photosensitive composition for forming lenses containing 1,2-naphthoquinone diazide sulfonate photosensitizer, alkali-soluble resin and thermosetting agent and process for producing the composition |
CA2031564A1 (en) * | 1989-12-18 | 1991-06-19 | Leonard E. Bogan, Jr. | Method of preparing high glass transition temperature novolak resin for use in high resolution photoresist compositions |
-
1992
- 1992-04-24 DE DE1992623083 patent/DE69223083T2/de not_active Expired - Fee Related
- 1992-04-24 EP EP92107034A patent/EP0510671B1/de not_active Expired - Lifetime
- 1992-04-24 MX MX9201930A patent/MX9201930A/es not_active IP Right Cessation
- 1992-04-24 CA CA002067042A patent/CA2067042A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
MX9201930A (es) | 1992-11-01 |
CA2067042A1 (en) | 1992-10-27 |
DE69223083D1 (de) | 1997-12-18 |
EP0510671B1 (de) | 1997-11-12 |
EP0510671A1 (de) | 1992-10-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |