DE69121475D1 - Positivresistzusammensetzung - Google Patents

Positivresistzusammensetzung

Info

Publication number
DE69121475D1
DE69121475D1 DE69121475T DE69121475T DE69121475D1 DE 69121475 D1 DE69121475 D1 DE 69121475D1 DE 69121475 T DE69121475 T DE 69121475T DE 69121475 T DE69121475 T DE 69121475T DE 69121475 D1 DE69121475 D1 DE 69121475D1
Authority
DE
Germany
Prior art keywords
resist composition
positive resist
positive
composition
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69121475T
Other languages
English (en)
Other versions
DE69121475T2 (de
Inventor
Yasunori Uetani
Haruyoshi Osaki
Naoki Takeyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of DE69121475D1 publication Critical patent/DE69121475D1/de
Publication of DE69121475T2 publication Critical patent/DE69121475T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/20—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69121475T 1990-06-05 1991-05-06 Positivresistzusammensetzung Expired - Fee Related DE69121475T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14773790 1990-06-05

Publications (2)

Publication Number Publication Date
DE69121475D1 true DE69121475D1 (de) 1996-09-26
DE69121475T2 DE69121475T2 (de) 1997-01-23

Family

ID=15437005

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69121475T Expired - Fee Related DE69121475T2 (de) 1990-06-05 1991-05-06 Positivresistzusammensetzung

Country Status (5)

Country Link
EP (1) EP0460416B1 (de)
KR (1) KR0170395B1 (de)
CA (1) CA2042788A1 (de)
DE (1) DE69121475T2 (de)
MX (1) MX171231B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2092774A1 (en) * 1992-04-10 1993-10-11 Yuji Ueda Positive photoresist composition
JP2944327B2 (ja) * 1992-09-14 1999-09-06 富士写真フイルム株式会社 ポジ型感光性平版印刷版
US5876895A (en) * 1992-12-24 1999-03-02 Sumitomo Chemical Company, Limited Photosensitive resin composition for color filter
WO1994014892A1 (en) * 1992-12-24 1994-07-07 Sumitomo Chemical Company, Limited Photosensitive resin composition for color filter
JP3230925B2 (ja) * 1994-04-12 2001-11-19 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
WO2019117479A1 (ko) 2017-12-12 2019-06-20 주식회사 엘지화학 공급 스페이서 및 이를 포함하는 역삼투압 필터 모듈

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57143329A (en) * 1981-03-03 1982-09-04 Nippon Telegr & Teleph Corp <Ntt> Photosensitive resin and its production

Also Published As

Publication number Publication date
DE69121475T2 (de) 1997-01-23
KR920001242A (ko) 1992-01-30
EP0460416A1 (de) 1991-12-11
MX171231B (es) 1993-10-12
KR0170395B1 (ko) 1999-03-20
EP0460416B1 (de) 1996-08-21
CA2042788A1 (en) 1991-12-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee