KR920001242A - 포지티브 레지스트 조성물 - Google Patents
포지티브 레지스트 조성물 Download PDFInfo
- Publication number
- KR920001242A KR920001242A KR1019910008749A KR910008749A KR920001242A KR 920001242 A KR920001242 A KR 920001242A KR 1019910008749 A KR1019910008749 A KR 1019910008749A KR 910008749 A KR910008749 A KR 910008749A KR 920001242 A KR920001242 A KR 920001242A
- Authority
- KR
- South Korea
- Prior art keywords
- resist composition
- positive resist
- hydroxyl group
- ortho
- aldehyde
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/20—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (1)
- 감방사선성 물질, 및 알데히드와 하기식의 화합물을 축합반응시켜 수득한 알칼리-용해성 수지를 함유하는 포지티브 레지스트 조성물 :(식중 R1∼R9는 동일하거나 상이하며 독립적으로 수소원자, 알킬기, 할로겐 원자 또는 히드록실기이다. 단 R1∼R9중 적어도 하나는 히드록실기이며 전술한 적어도 하나의 히드록실기의 오르토 및 파라위치에서 그들 중 적어도 둘은 수소 둘은 수소 원자이다)※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14773790 | 1990-06-05 | ||
JP2-147737 | 1990-06-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR920001242A true KR920001242A (ko) | 1992-01-30 |
KR0170395B1 KR0170395B1 (ko) | 1999-03-20 |
Family
ID=15437005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910008749A KR0170395B1 (ko) | 1990-06-05 | 1991-05-28 | 포지티브 레지스트 조성물 |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0460416B1 (ko) |
KR (1) | KR0170395B1 (ko) |
CA (1) | CA2042788A1 (ko) |
DE (1) | DE69121475T2 (ko) |
MX (1) | MX171231B (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2092774A1 (en) * | 1992-04-10 | 1993-10-11 | Yuji Ueda | Positive photoresist composition |
JP2944327B2 (ja) * | 1992-09-14 | 1999-09-06 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
EP0628599B1 (en) * | 1992-12-24 | 1998-12-09 | Sumitomo Chemical Company Limited | Photosensitive resin composition for color filter |
US5876895A (en) * | 1992-12-24 | 1999-03-02 | Sumitomo Chemical Company, Limited | Photosensitive resin composition for color filter |
JP3230925B2 (ja) * | 1994-04-12 | 2001-11-19 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
WO2019117479A1 (ko) | 2017-12-12 | 2019-06-20 | 주식회사 엘지화학 | 공급 스페이서 및 이를 포함하는 역삼투압 필터 모듈 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57143329A (en) * | 1981-03-03 | 1982-09-04 | Nippon Telegr & Teleph Corp <Ntt> | Photosensitive resin and its production |
-
1991
- 1991-05-06 EP EP91107338A patent/EP0460416B1/en not_active Expired - Lifetime
- 1991-05-06 DE DE69121475T patent/DE69121475T2/de not_active Expired - Fee Related
- 1991-05-07 MX MX025684A patent/MX171231B/es unknown
- 1991-05-16 CA CA002042788A patent/CA2042788A1/en not_active Abandoned
- 1991-05-28 KR KR1019910008749A patent/KR0170395B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69121475T2 (de) | 1997-01-23 |
EP0460416A1 (en) | 1991-12-11 |
KR0170395B1 (ko) | 1999-03-20 |
DE69121475D1 (de) | 1996-09-26 |
CA2042788A1 (en) | 1991-12-06 |
EP0460416B1 (en) | 1996-08-21 |
MX171231B (es) | 1993-10-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR910010239A (ko) | 방사선 감응성 수지 조성물 | |
KR830002827A (ko) | 감작되어진 방향성의 요오드늄 또는 설포늄 화합물을 함유한 광중합성 조성물의 제조방법 | |
KR840001484A (ko) | 제막(除膜) 조성물 및 내막식(耐膜蝕) 제거방법 | |
GB1381499A (en) | Dihydroxyspirochroman compounds and polyester compositions and colour photographic materials containing said compounds as the stabilizer | |
KR930010622A (ko) | 네가티브형 레지스터 조성물 | |
KR840004589A (ko) | 포지티브형(positive type) 감광성 내식막 조성물 | |
KR920001243A (ko) | 포지티브 감 방사선성 레지스트 조성물 | |
KR920015158A (ko) | 네거티브 포토레지스트 조성물 | |
KR920701869A (ko) | 포지티브 레지스트 조성물 | |
KR920001242A (ko) | 포지티브 레지스트 조성물 | |
KR900002125A (ko) | 내식막 조성물 | |
KR920702890A (ko) | 포지티브 레지스트 조성물 | |
KR880001764A (ko) | 열가소성 폴리에스테르 수지조성물 | |
KR920018040A (ko) | 다가 페놀 화합물 및 그것을 함유하는 포지티브 레지스트 조성물 | |
KR910020496A (ko) | 포지티브 레지스트 조성물 | |
KR920000010A (ko) | 방사선-감작 포지티브 레지스트 조성물 | |
KR840000626A (ko) | 자외선을 차단하는 수지 조성물 | |
KR910006779A (ko) | 감방사선성 포지티브 레지스트 조성물 | |
KR840004096A (ko) | 페녹시 프로판올아민 유도체 | |
KR930004806A (ko) | 포지티브 레지스트 조성물 | |
KR880014051A (ko) | 에폭시수지 조성물 | |
KR840000871A (ko) | 함수제(含嗽劑) 조성물 | |
KR880001744A (ko) | 내방사선성 폴리올레핀 조성물 | |
KR910002428A (ko) | 트로치 조성물 | |
KR920018523A (ko) | 포지티브 레지스트 조성물 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
LAPS | Lapse due to unpaid annual fee |