KR840004589A - 포지티브형(positive type) 감광성 내식막 조성물 - Google Patents

포지티브형(positive type) 감광성 내식막 조성물 Download PDF

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Publication number
KR840004589A
KR840004589A KR1019830002297A KR830002297A KR840004589A KR 840004589 A KR840004589 A KR 840004589A KR 1019830002297 A KR1019830002297 A KR 1019830002297A KR 830002297 A KR830002297 A KR 830002297A KR 840004589 A KR840004589 A KR 840004589A
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KR
South Korea
Prior art keywords
photoresist composition
positive type
type photoresist
methylstyrene
polyhydroxy
Prior art date
Application number
KR1019830002297A
Other languages
English (en)
Other versions
KR910004846B1 (ko
Inventor
마꼬또 하나바따 (외 3)
Original Assignee
쯔쯔가다 다께시
스미또모 가까꾸 고교 가부시기 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쯔쯔가다 다께시, 스미또모 가까꾸 고교 가부시기 가이샤 filed Critical 쯔쯔가다 다께시
Publication of KR840004589A publication Critical patent/KR840004589A/ko
Application granted granted Critical
Publication of KR910004846B1 publication Critical patent/KR910004846B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

내용 없음

Description

포지티브형(positive type) 감광성 내식막 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (2)

  1. 폴리하이드록시-α-메틸스티렌 또는 히드록시-α-메틸스티렌 공중합체와, 감광제로써 퀴논디아지드 화합물로 구성되어 있는 포지티브 형감광성내식막 조성물.
  2. 폴리하이드록시-α-메틸스티렌 또는 하이드록시-α-메틸스티렌 공중합체, 노볼락수지와, 감광제로써 퀴논디아지드 화합물로 구성되어 있는 포지티브형 감광성내식막 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019830002297A 1982-05-25 1983-05-25 양각형(positive type) 감광성 내식막 조성물 KR910004846B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP57089482A JPS58205147A (ja) 1982-05-25 1982-05-25 ポジ型フオトレジスト組成物
JP89482 1982-05-25
JP89,482 1982-05-25

Publications (2)

Publication Number Publication Date
KR840004589A true KR840004589A (ko) 1984-10-22
KR910004846B1 KR910004846B1 (ko) 1991-07-13

Family

ID=13971950

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019830002297A KR910004846B1 (ko) 1982-05-25 1983-05-25 양각형(positive type) 감광성 내식막 조성물

Country Status (10)

Country Link
US (1) US4696886A (ko)
EP (1) EP0095388B1 (ko)
JP (1) JPS58205147A (ko)
KR (1) KR910004846B1 (ko)
CA (1) CA1250776A (ko)
DE (1) DE3374610D1 (ko)
GB (1) GB2124400B (ko)
HK (1) HK8787A (ko)
MX (1) MX162307A (ko)
MY (1) MY8600663A (ko)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60162249A (ja) * 1984-02-01 1985-08-24 Japan Synthetic Rubber Co Ltd ポジ型レジスト組成物
DE3406927A1 (de) * 1984-02-25 1985-08-29 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen
JPS60189739A (ja) * 1984-03-09 1985-09-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
DE3421448A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
JPS62191850A (ja) * 1986-02-17 1987-08-22 Nec Corp ポジレジスト材料
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
JP2697039B2 (ja) * 1988-12-06 1998-01-14 住友化学工業株式会社 ポジ型レジスト組成物の製造方法
JPH02291559A (ja) * 1989-05-01 1990-12-03 Toyo Gosei Kogyo Kk 遠紫外光用ホトレジスト組成物
JP2849623B2 (ja) * 1989-08-15 1999-01-20 コニカ株式会社 画像形成方法
JP2567282B2 (ja) * 1989-10-02 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
DE69121790T2 (de) * 1990-05-24 1997-04-10 Sumitomo Chemical Co Positivresistzusammensetzung
JP2847321B2 (ja) * 1990-08-14 1999-01-20 日本石油株式会社 ポジ型フォトレジスト組成物
KR950004908B1 (ko) * 1992-09-09 1995-05-15 삼성전자주식회사 포토 레지스트 조성물 및 이를 이용한 패턴형성방법
JP3203995B2 (ja) * 1993-12-24 2001-09-04 ジェイエスアール株式会社 感放射線性樹脂組成物
US5561194A (en) * 1995-03-29 1996-10-01 International Business Machines Corporation Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene
WO1997034197A1 (en) * 1996-03-11 1997-09-18 Hoechst Celanese Corporation Resin compositions for photoresist applications
JP3633179B2 (ja) * 1997-01-27 2005-03-30 Ｊｓｒ株式会社 ポジ型フォトレジスト組成物
US6630285B2 (en) * 1998-10-15 2003-10-07 Mitsui Chemicals, Inc. Positive sensitive resin composition and a process for forming a resist pattern therewith
TWI417656B (zh) * 2010-04-08 2013-12-01 Founder Fine Chemical Industry Co Ltd 輻射敏感組成物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3551154A (en) * 1966-12-28 1970-12-29 Ferrania Spa Light sensitive article comprising a quinone diazide and polymeric binder
GB1375461A (ko) * 1972-05-05 1974-11-27
JPS5024641B2 (ko) * 1972-10-17 1975-08-18
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
JPS5236043B2 (ko) * 1974-02-21 1977-09-13
JPS51120713A (en) * 1975-04-15 1976-10-22 Toshiba Corp Positive type photo-resistant compound
JPS51120712A (en) * 1975-04-15 1976-10-22 Toshiba Corp Positive type photo-resistant compound
US4244181A (en) * 1977-12-22 1981-01-13 The Garrett Corporation Variable geometry gas turbine engine fuel and guide vane control
JPS5730829A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Micropattern formation method
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol

Also Published As

Publication number Publication date
EP0095388A2 (en) 1983-11-30
EP0095388B1 (en) 1987-11-19
MY8600663A (en) 1986-12-31
JPH0340379B2 (ko) 1991-06-18
GB8314459D0 (en) 1983-06-29
MX162307A (es) 1991-04-23
DE3374610D1 (en) 1987-12-23
HK8787A (en) 1987-01-28
US4696886A (en) 1987-09-29
KR910004846B1 (ko) 1991-07-13
CA1250776A (en) 1989-03-07
EP0095388A3 (en) 1984-05-30
GB2124400A (en) 1984-02-15
JPS58205147A (ja) 1983-11-30
GB2124400B (en) 1985-11-06

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